Vacuum processing apparatus and oxidizing gas removal method

Patent metadata

Field	Value
Publication number	US-2022403509-A1
Application number	US-202117350125-A
Country	US
Kind code	A1
Filing date	Jun 17, 2021
Priority date	Jun 17, 2021
Publication date	Dec 22, 2022
Grant date	—

Abstract

According to one aspect of the present disclosure, a vacuum processing apparatus includes: a decompressable process container; a supply port that is formed on a side wall of the process container and that is configured to supply, to the process container, an ionic liquid that absorbs an oxidizing gas; and a discharge port configured to discharge the ionic liquid supplied to the process container.

First claim

What is claimed is:

1 . A vacuum processing apparatus comprising:
a decompressable process container; a supply port that is formed on a side wall of the process container and that is configured to supply, to the process container, an ionic liquid that absorbs an oxidizing gas; and a discharge port configured to discharge the ionic liquid supplied to the process container.

2 . The vacuum processing apparatus according to claim 1 , wherein the ionic liquid is supplied from the supply port to an inner wall of the process container.

3 . The vacuum processing apparatus according to claim 2 , wherein a spiral groove for flowing the ionic liquid is formed on the inner wall of the process container.

4 . The vacuum processing apparatus according to claim 1 , wherein the supply port includes:
an annular liquid flow path provided along a circumferential direction of the process container; and a plurality of liquid ejection ports connected to the liquid flow path and opened inside the process container.

5 . The vacuum processing apparatus according to claim 1 , wherein the discharge port is provided so as to penetrate a bottom of the process container.

6 . The vacuum processing apparatus according to claim 1 , further comprising:
a sealing material configured to seal a joint portion between members constituting the process container; and a recess that is provided on a vacuum side of the sealing material at the joint portion and that is in communication with the supply port and for flowing the ionic liquid supplied from the supply port along the sealing material.

7 . The vacuum processing apparatus according to claim 6 , wherein the discharge port is provided in communication with the recess.

8 . The vacuum processing apparatus according to claim 6 , wherein the ionic liquid flowing through the recess is in contact with both of the members constituting the process container.

9 . The vacuum processing apparatus according to claim 1 , further comprising:
a valve configured to stop discharge of the ionic liquid from the discharge port.

10 . The vacuum processing apparatus according to claim 1 , wherein the oxidizing gas contains H 2 O gas.

11 . The vacuum processing apparatus according to claim 1 , further comprising:
a liquid circulating section configured to introduce the ionic liquid discharged from the discharge port to the supply port and circulate the ionic liquid.

12 . The vacuum processing apparatus according to claim 1 , wherein the liquid circulating section includes
a tank configured to store the ionic liquid discharged from the discharge port; and a temperature control mechanism configured to control a temperature of the ionic liquid in the tank.

13 . The vacuum processing apparatus according to claim 1 , wherein a process of depositing a graphene film is performed in the process container.

14 . A method for removing an oxidizing gas, the method comprising:
suppling an ionic liquid that absorbs an oxidizing gas from a supply port formed on a side wall of a decompressable process container to the process container, thereby absorbing the oxidizing gas remaining in the process container by the ionic liquid; and discharging the ionic liquid supplied to the process container.

Assignees

• Tokyo Electron Ltd

Inventors

• Ueda Hirokazu
• Iizuka Yoji
• Iwashita Mitsuaki
• Rotondaro Antonio
• Aryal Dipak
• Nakano Takeo
• Asako Ryuichi
• Sekiguchi Kenji
• Akiyama Koji
• Umeshita Naoki
• Hayakawa Takashi

Classifications

• H10P72/0411

  for wet cleaning or washing · CPC title

• H10P72/0414 Primary

  using mainly spraying means, e.g. nozzles · CPC title

• C23C16/26 Primary

  Deposition of carbon only · CPC title

• C23C16/45587

  Mechanical means for changing the gas flow · CPC title

• C23C16/50

  using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} · CPC title