Electroless copper plating and counteracting passivation

Patent metadata

Field	Value
Publication number	US-2021140052-A1
Application number	US-201916679373-A
Country	US
Kind code	A1
Filing date	Nov 11, 2019
Priority date	Nov 11, 2019
Publication date	May 13, 2021
Grant date	—

Abstract

Prior to electroless copper plating on substrates containing copper, an aqueous composition containing select imidazole compounds is applied to the substrate. The aqueous composition containing the select imidazole compounds counteract passivation of the copper on the substrate to improve the electroless copper plating process.

First claim

1 . (canceled)

2 . A method of electroless copper plating comprising:
a) providing a substrate comprising passivated copper; b) applying a catalyst to the passivated copper of the substrate; c) treating the catalyzed passivated copper of the substrate with an aqueous composition comprising a reducing agent and an imidazole compound selected from the group consisting of 2,2′-bis(4,5-dimethylimidazole), 2-guanidobenzimidazole, 2-(aminomethyl)benzimidazole dihydrochloride, 2-(2-aminophenyl)-1H-benzimidazole, 2-(2-hydroxyphenyl)-1H-benzimidazole, 1-(3-aminopropyl)imidazole, 2-(1-naphthylmethyl)imidazoline hydrochloride, benzotriazole-5-carboxylic acid, dimethyl-4,5-imidazoledicarboxylate and mixtures thereof; d) applying an electroless copper plating bath to the treated anti-passivated copper of the substrate; and e) electroless plating copper on the treated anti-passivated copper of the substrate with the electroless copper plating bath.

3 . The method of claim 2 , further comprising applying a conditioner to the substrate comprising the passivated copper prior to applying the catalyst.

4 . The method of claim 2 , further comprising rinsing the substrate with the catalyzed anti-passivated copper after the treatment with the aqueous composition comprising the reducing agent and the imidazole compound with a water rinse solution.

5 . The method of claim 4 , wherein the water rinse solution comprises an imidazole compound selected from the group consisting of 2,2′-bis(4,5-dimethylimidazole), 2-guanidobenzimidazole, 2-(aminomethyl)benzimidazole dihydrochloride, 2-(2-aminophenyl)-1H-benzimidazole, 2-(2-hydroxyphenyl)-1H-benzimidazole, 1-(3-aminopropyl)imidazole, 2-(1-naphthylmethyl)imidazoline hydrochloride, benzotriazole-5-carboxylic acid, dimethyl-4,5-imidazoledicarboxylate and mixtures thereof.

6 . The method of electroless copper plating of claim 2 , wherein the imidazole compound is at concentrations of 0.1 mg/L to 100 mg/L.

7 . The method of electroless copper plating of claim 2 , wherein the aqueous composition further comprises one or more acids.

8 - 9 . (canceled)

Assignees

• Rohm & Haas Elect Mat

Inventors

• Naab Benjamin

Classifications

• C23C18/1844 Primary

  with use of organic or inorganic compounds other than metals, first · CPC title

• C23C18/405 Primary

  Formaldehyde · CPC title

• C23C18/1834

  Use of organic or inorganic compounds other than metals, e.g. activation, sensitisation with polymers · CPC title

• C23C18/1841

  with use of metal first · CPC title

• C23C18/1831

  Use of metal, e.g. activation, sensitisation with noble metals · CPC title