Electrostatically clamped edge ring

Patent metadata

Field	Value
Publication number	US-2018166312-A1
Application number	US-201815894670-A
Country	US
Kind code	A1
Filing date	Feb 12, 2018
Priority date	Nov 3, 2016
Publication date	Jun 14, 2018
Grant date	—

Abstract

An edge ring for use in a plasma processing chamber with a chuck is provided. An edge ring body has a first surface to be placed over and facing the chuck, wherein the first surface forms a ring around an aperture. A first elastomer ring is integrated to the first surface and extending around the aperture.

First claim

What is claimed is:

1 . An edge ring for use in a plasma processing chamber with a chuck, comprising:
an edge ring body with a first surface to be placed over and facing the chuck, wherein the first surface forms a ring around an aperture; and a first elastomer ring integrated to the first surface and extending around the aperture.

2 . The edge ring, as recited in claim 1 , further comprising a second elastomeric ring integrated to the first surface and extending around the aperture.

3 . The edge ring, as recited in claim 2 , wherein the first elastomeric ring is concentric with the second elastomeric ring.

4 . The edge ring, as recited in claim 2 , wherein the edge ring body, first elastomer ring and second elastomer ring are all concentric.

5 . The edge ring, as recited in claim 4 , wherein the edge ring body has an outer diameter between 200 mm to 400 mm.

6 . The edge ring, as recited in claim 5 , wherein the first surface of the edge ring body has an inner edge and an outer edge, wherein the first elastomer ring is within a distance of 10 mm from the inner edge of the first surface and the second elastomer ring is within a distance of 30 mm from the outer edge of the first surface.

7 . The edge ring, as recited in claim 1 , wherein the first elastomer ring has a height of between 0.25 mm and 2 mm.

8 . The edge ring, as recited in claim 1 , wherein a tolerance of the height of the first elastomer ring is 50 microns or better.

9 . The edge ring, as recited in claim 1 , wherein the first elastomer ring is formed from a material comprising silicone.

10 . The edge ring, as recited in claim 1 , wherein the first elastomer ring has a cross-section in the shape of a trapezoid, square, rectangle, triangle, or semicircle.

11 . The edge ring, as recited in claim 1 , wherein the edge ring body has an outer diameter between 200 mm to 400 mm.

12 . The edge ring, as recited in claim 1 , wherein the edge ring body comprises at least one of silicon, silicon carbide, or quartz.

13 . The edge ring, as recited in claim 1 , wherein the first elastomer ring is applied to the first surface as a liquid elastomer.

14 . A method for electrostatically clamping an edge ring in a plasma processing chamber with an electrostatic ring clamp with at least one ring backside temperature channel for providing a flow of gas to the edge ring to regulate the temperature; comprising:
providing a vacuum to the at least one ring backside temperature channel; measuring pressure in the at least one ring backside temperature channel; providing an electrostatic ring clamping voltage when the pressure in the at least one ring backside temperature channel reaches a threshold maximum pressure; discontinuing the vacuum to the at least one ring backside temperature channel; measuring pressure in the at least one ring backside temperature channel; if pressure in the at least one ring backside temperature channel rises faster than a threshold rate, indicating sealing failure; and if pressure in the at least one ring backside temperature channel does not rise faster than the threshold rate, providing a plasma process, using the at least one ring backside temperature channel to regulate a temperature of the edge ring.

15 . The method, as recited in claim 14 , wherein during the providing a vacuum to the at least one ring backside temperature channel, the plasma processing chamber is at atmospheric pressure.

16 . The method, as recited in claim 14 , further comprising reseating the edge ring if a sealing failure is indicated.

17 . The method, as recited in claim 14 , wherein the providing the plasma process, comprises:
plasma processing a substrate in the plasma processing chamber, while maintaining the electrostatic ring clamping voltage; and providing temperature control of the edge ring through the backside temperature channel, while plasma processing the substrate.

18 . The method, as recited in claim 17 , wherein the providing the plasma process, further comprises:
placing the substrate in the plasma processing chamber; providing a vacuum in the plasma processing chamber.

19 . The method, as recited in claim 14 , further comprising placing the edge ring on the electrostatic ring clamp before providing the vacuum to the at least one ring backside temperature channel

20 . The method, as recited in claim 19 , wherein the placing the edge ring on the electrostatic ring clamp causes the edge ring to be spaced 10 microns to 50 microns away from the electrostatic ring clamp before providing the vacuum to the at least one ring backside temperature channel.

21 . The method, as recited in claim 20 , wherein the providing the vacuum to the at least one ring backside temperature channel causes the edge ring to be spaced less than 20 microns away from the electrostatic ring clamp.

Assignees

• Lam Res Corp

Inventors

• Kimball Christopher
• Gaff Keith
• Wang Feng

Classifications

• H10P72/7624

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P74/238

  comprising acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection or in-situ thickness measurement · CPC title

• H10P72/7611

  characterised by edge profile or support profile · CPC title

• H10P72/0604

  Process monitoring, e.g. flow or thickness monitoring · CPC title

• H10P72/0602

  Temperature monitoring · CPC title