Inspection apparatus and method for inspecting a component

Patent metadata

Field	Value
Publication number	US-12560562-B2
Application number	US-202318506331-A
Country	US
Kind code	B2
Filing date	Nov 10, 2023
Priority date	Sep 15, 2023
Publication date	Feb 24, 2026
Grant date	Feb 24, 2026

Abstract

An apparatus and method for an inspection apparatus for inspecting a component. The inspection apparatus including a robotic arm. A micro-XRF instrument having an instrument head coupled to the robotic arm. A seat supporting the component within a scanning area during inspection; and a computer in communication with the robotic arm and the micro-XRF instrument.

First claim

The invention claimed is:

1 . An inspection apparatus for inspecting a component for surface connected chemical anomalies, the inspection apparatus comprising:
a robotic arm; a micro-XRF instrument comprising an instrument head coupled to the robotic arm, the instrument head including an X-ray excitation source and at least one X-ray detector; and a computer in communication with at least the robotic arm and micro-XRF instrument, the computer comprising:
at least one scan module comprising instructions to scan with the micro-XRF instrument a surface of the component, and to collect and assemble element maps output from the scan; and
a detection algorithm comprising instructions to assess the element maps collected from the micro-XRF instrument to identify possible chemical anomaly locations on the surface of the component while achieving a required set of detection metrics;
wherein the robotic arm moves the instrument head about the component to scan the component while maintaining a distance from a surface of the component.

2 . The inspection apparatus of claim 1 wherein the at least one scan module includes a local scan module comprising instructions to scan with the micro-XRF instrument the possible chemical anomaly locations on the surface of the component identified by the detection algorithm.

3 . The inspection apparatus of claim 2 wherein the at least one scan module includes a global scan module comprising instructions to scan at a high-speed with the micro-XRF instrument a surface of the component prior to the local scan module, and to collect and assemble element maps output from the scan for analyzing with the detection algorithm.

4 . The inspection apparatus of claim 3 where a set of micro-XRF parameters are chosen such that the local scan module occurs at a higher resolution than the global scan module.

5 . The inspection apparatus of claim 1 wherein the robotic arm is movable in at least one dimension about a scanning area.

6 . The inspection apparatus of claim 5 wherein the at least one scan module includes instructions to move the robotic arm back and forth over a stationary component.

7 . The inspection apparatus of claim 1 wherein the detection algorithm further comprises determining a presence of a surface chemical anomaly by identifying a set of pixels that lie outside a pre-defined threshold value based on an as-inspected state of the component surface as determined by the element maps.

8 . The inspection apparatus of claim 1 further comprising a user interface for viewing the set of element maps.

9 . The inspection apparatus of claim 1 further comprising a seat supporting the component within a scanning area during inspection.

10 . The inspection apparatus of claim 9 wherein the seat comprises a turn table rotatable in at least one plane.

11 . The inspection apparatus of claim 10 wherein the at least one scan module includes instructions to rotate the turn table in full revolutions while the robotic arm radially moves the micro-XRF instrument.

12 . The inspection apparatus of claim 10 wherein the at least one scan module includes instructions to rotate the turn table back and forth in short arcs while the robotic arm radially moves the micro-XRF instrument.

13 . A method of inspecting a component for surface connected chemical anomalies, the method comprising:
scanning the surface of the component with a micro-XRF instrument to define a data set, the micro-XRF instrument positioned on a robotic arm to maintain a distance with respect to the surface of the component during the scan; and processing the data set with a computer algorithm, the computer algorithm comprising: producing readable data as a set of element maps and assessing the set of element maps to determine whether a set of pixels on the set of element maps exceed a pre-defined threshold value and identifying at least one possible chemical anomaly location when the set of pixels exceeds the pre-defined threshold value.

14 . The method of claim 13 wherein scanning the surface comprises scanning the at least one possible chemical anomaly location with the micro-XRF instrument with a high-resolution scan to define a local data set.

15 . The method of claim 14 wherein scanning the surface comprises scanning the surface with a high-speed scan to define a global data set prior to scanning with the high-resolution scan.

16 . The method of claim 15 wherein the computer algorithm further comprises identifying the at least one possible chemical anomaly location from the global data set where the set of pixels on the set of element maps exceed the pre-defined threshold value.

17 . The method of claim 14 further comprising processing the local data set and marking any possible anomaly location with a flag to define a threshold map with at least one flag.

18 . The method of claim 17 further comprising determining whether a set of pixels in the threshold map with the at least one flag exceeds the pre-defined threshold value.

19 . The method of claim 18 further comprising, when the set of pixels exceed the pre-defined threshold value, sending the threshold map with the at least one flag to a user interface.

20 . The method of claim 13 further comprising moving the micro XRF-instrument while scanning.

21 . The method of claim 13 further comprising moving the component while scanning.

Assignees

• Gen Electric
• Bruker Nano Gmbh

Inventors

• Didomizio Richard
• Andersen Michael Christopher
• Dixon Iii Walter Vincent
• Hanlon Timothy
• Lawrence Wayne Lee
• Oruganti Ramkumar Kashyap
• Owens Jonathan Rutherford
• Ruscitto Daniel M
• SHUKLA Adarsh
• Telfeyan Eric John
• Crim Gregory Donald
• Krauss Michael Wylie
• Dziurla André
• Larisch Sven Martin Joachim
• Reinhardt Falk
• Tagle Berdan Roald Alberto
• Schroeder Henning

Classifications

• G01N35/0099

  comprising robots or similar manipulators (robots per se B25J) · CPC title

• G01N23/223 Primary

  by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence · CPC title