Reticle enclosure for lithography systems

Patent metadata

Field	Value
Publication number	US-12517425-B2
Application number	US-202117461433-A
Country	US
Kind code	B2
Filing date	Aug 30, 2021
Priority date	Aug 30, 2021
Publication date	Jan 6, 2026
Grant date	Jan 6, 2026

Abstract

A reticle enclosure includes a base including a first surface, a cover including a second surface and disposed on the base, wherein the base and the cover form an internal space therebetween that includes a reticle, and a layer of electrostatic discharge material disposed on the first surface, wherein the electrostatic discharge material reduces electrostatic charges on the reticle.

First claim

What is claimed is:

1 . A reticle enclosure, comprising:
a base including a first surface; a cover including a second surface and disposed on the base, wherein the base and the cover form an internal space therebetween in which a reticle is to be placed; a layer of electrostatic discharge material disposed on the second surface, wherein the layer of the electrostatic discharge material reduces electrostatic charges on the reticle when the reticle is placed in or removed from the reticle enclosure; and a plurality of restraining mechanisms on the cover and configured for securing the reticle in the reticle enclosure, wherein, in plan view, the layer of electrostatic discharge material is confined to a portion of the second surface of the cover between of the plurality of restraining mechanisms.

2 . The reticle enclosure of claim 1 , wherein the layer of electrostatic discharge material has a quadrilateral shape when viewed in plan view.

3 . The reticle enclosure of claim 1 , wherein the layer of electrostatic discharge material includes a material including one or more selected from the group consisting of conductive materials and static dissipative materials.

4 . The reticle enclosure of claim 1 , wherein the layer of the electrostatic discharge material includes a radioactive material.

5 . The reticle enclosure of claim 4 , wherein the radioactive material includes polonium (Po-210).

6 . The reticle enclosure of claim 1 , wherein the plurality of restraining mechanisms are selected from the group consisting of clamps, grooves, pins, fixation blocks, and springs.

7 . The reticle enclosure of claim 1 , wherein the layer of electrostatic discharge material faces the reticle.

8 . A reticle pod, comprising:
an outer reticle enclosure including an outer base and an outer cover disposed on the outer base and form a first internal space therebetween; an inner reticle enclosure positioned in the first internal space, the inner reticle enclosure including an inner base and an inner cover disposed on the inner base and forming a second internal space therebetween; a reticle arranged in the second internal space; a layer of electrostatic discharge material disposed on the inner cover; and a plurality of restraining mechanisms on the inner cover of the inner reticle enclosure, the plurality of restraining mechanisms are configured for securing the reticle in the inner reticle enclosure, wherein, in plan view, the layer of electrostatic discharge material is confined to a portion of the inner cover between the plurality of restraining mechanisms.

9 . The reticle pod of claim 8 , wherein the layer of electrostatic discharge material has a quadrilateral shape when viewed in plan view.

10 . The reticle pod of claim 8 , wherein the layer of the electrostatic discharge material includes a radioactive material.

11 . The reticle pod of claim 10 , wherein the radioactive material includes polonium (Po-210).

12 . The reticle pod of claim 8 , wherein the plurality of restraining mechanisms are selected from the group consisting of clamps, grooves, pins, fixation blocks, and springs.

13 . The reticle pod of claim 12 , wherein the plurality of restraining mechanisms contact first and second surfaces of the reticle.

14 . The reticle pod of claim 8 , wherein the layer of electrostatic discharge material faces the reticle.

15 . A reticle enclosure, comprising:
an inner base; an inner cover arranged on the inner base and forming an internal space therebetween, a reticle being positioned in the internal space; a plurality of restraining mechanisms on the inner cover and in the internal space, the plurality of restraining mechanisms securing the reticle in position in the internal space; and a coating of an electrostatic discharge material disposed on the inner cover, wherein the electrostatic discharge material reduces attraction of contaminants to the reticle, wherein, in plan view, the coating of electrostatic discharge material is confined to a portion of the inner cover between the plurality of restraining mechanisms.

16 . The reticle enclosure of claim 15 , wherein the coating reduces electrostatic charges on the reticle when the reticle is placed in or removed from the reticle enclosure.

17 . The reticle enclosure of claim 15 , wherein the coating has a quadrilateral shape when viewed in plan view.

18 . The reticle enclosure of claim 15 , wherein the coating includes polonium (Po-210).

19 . The reticle enclosure of claim 15 , wherein the coating is deposited on the inner cover and facing the reticle.

20 . The reticle enclosure of claim 15 , wherein the plurality of restraining mechanisms are selected from the group consisting of clamps, grooves, pins, fixation blocks, and springs.

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Liao Chi-Hung
• Shih Po-Ming

Classifications

• H10P72/1906

  specially adapted for containing masks, reticles or pellicles · CPC title

• G03F1/22

  Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof · CPC title

• G03F7/70033

  by plasma extreme ultraviolet [EUV] sources · CPC title

• H10P72/1928

  characterised by the presence of antistatic elements · CPC title

• H10P72/1902

  specially adapted for a single substrate · CPC title