Method of manufacturing mask, mask manufactured by the same, and method of manufacturing display apparatus by using the same

Patent metadata

Field	Value
Publication number	US-12448676-B2
Application number	US-202318160155-A
Country	US
Kind code	B2
Filing date	Jan 26, 2023
Priority date	Mar 6, 2020
Publication date	Oct 21, 2025
Grant date	Oct 21, 2025

Abstract

A method of manufacturing a mask, includes forming an organic material layer on a mask substrate and patterning a hard mask on the organic material layer, etching the organic material layer to form a mask sheet including through holes, removing the hard mask on the mask sheet, forming a conductive material layer on the mask sheet, and etching the conductive material layer to form a conductive layer.

First claim

What is claimed is:

1. A mask comprising:
a frame;
a mask sheet comprising through holes; and
an electrically conductive layer being spaced apart from the through holes on a plane, arranged between the frame and the mask sheet and fixed to the frame,
wherein the electrically conductive layer comprises at least one selected from Ti, Mo, Cu, ITO, IZO, and IGZO, and
wherein the electrically conductive layer is fixed to the frame by electrostatic force.

2. The mask of claim 1 , wherein the electrically conductive layer has a first thickness from a top surface of the mask sheet, and the first thickness is in a range of 1500 to 2500 Å.

3. The mask of claim 1 , wherein the electrically conductive layer has a mesh shape.

4. The mask of claim 1 , wherein at least part of the electrically conductive layer has an isolated pattern such that the electrically conductive layer does not overlap the through holes.

5. The mask of claim 1 , wherein the frame is spaced apart from the through holes on the plane and has a mesh shape.

6. The mask of claim 1 , wherein at least part of the frame is spaced apart from the through holes on the plane and has an electrically isolated pattern such that the electrically conductive layer does not overlap the through holes.

Assignees

• Samsung Display Co Ltd

Inventors

• Kim Taesung
• Yeo Yunjong
• Cho Hyunmin
• Son Jihee
• Im Sungsoon

Classifications

• H10P50/696

  Process specially adapted to improve the resolution of the mask · CPC title

• H10P50/695 Primary

  characterised by the process involved to create the mask, e.g. lift-off masks or sidewalls or to modify the mask · CPC title

• H10K59/12

  Active-matrix OLED [AMOLED] displays · CPC title

• H10K71/166 Primary

  using selective deposition, e.g. using a mask · CPC title

• C23C14/042 Primary

  using masks · CPC title