Method of manufacturing mask assembly using electroforming and laser processes and method of manufacturing display apparatus using mask assembly

Patent metadata

Field	Value
Publication number	US-9972810-B2
Application number	US-201615196055-A
Country	US
Kind code	B2
Filing date	Jun 29, 2016
Priority date	Dec 4, 2015
Publication date	May 15, 2018
Grant date	May 15, 2018

Abstract

A method of manufacturing a mask assembly includes forming, via an electroforming process, a base material including at least one opening on an electrode plate; and reprocessing the at least one opening using a laser to form at least one reprocessed opening.

First claim

What is claimed is:

1. A method of manufacturing a mask assembly, the method comprising:
forming, on an electrode plate, a photoresist pattern comprising at least one opening;
forming, via an electroforming process, a base material on the electrode plate in the at least one opening; and
reprocessing the at least one opening using a laser to form at least one reprocessed opening.

2. The method of claim 1 , wherein edges of the at least one reprocessed opening are sloped with respect to a surface of the electrode plate.

3. The method of claim 1 , wherein the photoresist pattern is formed using a positive photoresist process.

4. The method of claim 1 , wherein the photoresist pattern is formed using a negative photoresist process.

5. The method of claim 1 , wherein the forming of the base material on the electrode plate further comprises removing the photoresist pattern.

6. The method of claim 1 , wherein the base material comprises nanoscale particles.

7. A method of manufacturing a mask assembly, the method comprising:
forming, via an electroforming process, a base material comprising at least one opening on an electrode plate;
reprocessing the at least one opening using a laser to form at least one reprocessed opening;
separating the base material from the electrode plate; and
supporting the base material across an opening in a mask frame.

8. The method of claim 7 , wherein the base material is supported, under tension, across the opening in the mask frame.

9. The method of claim 7 , wherein:
the mask frame comprises a support frame extending across the opening in the mask frame; and
the base material is supported on the support frame.

10. A method of manufacturing a display apparatus, the method comprising:
manufacturing a mask assembly;
arranging a substrate of the display apparatus to face the mask assembly; and
depositing, on the substrate, a deposition material according to at least one first opening in the mask assembly,
wherein manufacturing the mask assembly comprises:
forming, via an electroforming process, a base material comprising at least one second opening on an electrode plate; and
reprocessing the at least one second opening using a laser to form the at least one first opening.

11. The method of claim 10 , wherein edges of the at least one first opening are sloped with respect to a surface of the electrode plate.

12. The method of claim 10 , wherein forming of the base material on the electrode plate comprises:
forming, on the electrode plate, a photoresist pattern comprising the at least one second opening; and
forming, using the electroforming process, the base material on the electrode plate in the at least one second opening.

13. The method of claim 12 , wherein the photoresist pattern is formed using a negative photoresist process.

14. The method of claim 12 , wherein the photoresist pattern is formed using a positive photoresist process.

15. The method of claim 12 , wherein forming the base material on the electrode plate further comprises removing the photoresist pattern.

16. The method of claim 10 , wherein the base material comprises nanoscale particles.

17. The method of claim 10 , wherein manufacturing the mask assembly further comprises:
separating the base material from the electrode plate; and
supporting the base material across an opening in a mask frame.

18. The method of claim 17 , wherein the base material is supported, under tension, across the opening in the mask frame.

19. The method of claim 17 , wherein:
the mask frame comprises a support frame extending across the opening in the mask frame; and
the base material is supported on the support frame.

Assignees

• Samsung Display Co Ltd

Inventors

• Moon Youngmin
• Im Sungsoon
• Hwang Kyuhwan
• Moon Minho

Classifications

• H01L51/56 Primary

  Electricity · mapped topic

• H01L2227/323

  Electricity · mapped topic

• C25D1/20

  Separation of the formed objects from the electrodes {with no destruction of said electrodes} · CPC title

• B23K26/382

  by boring · CPC title

• B23K2201/36

  Operations & Transport · mapped topic