Electrostatic chucks with hybrid pucks to improve thermal performance and leakage current stability

Patent metadata

Field	Value
Publication number	US-12412769-B2
Application number	US-202318198003-A
Country	US
Kind code	B2
Filing date	May 16, 2023
Priority date	May 16, 2023
Publication date	Sep 9, 2025
Grant date	Sep 9, 2025

Abstract

A device includes a hybrid puck corresponding to an electrostatic chuck. The hybrid puck includes a backing region and a chucking region disposed on the backing region. The backing region includes a first dielectric material to improve thermal performance of the hybrid puck. The chucking region includes a second dielectric material different from the first dielectric material to improve leakage current stability.

First claim

What is claimed is:

1. A device comprising:
a hybrid puck corresponding to an electrostatic chuck, the hybrid puck comprising:
a backing region;
a chucking region disposed on the backing region, wherein the backing region comprises a first dielectric material to improve thermal performance of the hybrid puck, and wherein the chucking region comprises a second dielectric material different from the first dielectric material to improve leakage current stability; and
a bond protection structure comprising an elastomer disposed between the backing region and the chucking region.

2. The device of claim 1 , wherein at least one of the first dielectric material or the second dielectric material is a ceramic material.

3. The device of claim 1 , wherein the first dielectric material is aluminum nitride, and wherein the second dielectric material is aluminum oxide.

4. The device of claim 1 , wherein the chucking region is bonded to the backing region via a bond, and wherein the bond is one of a diffusion bond or a metal bond.

5. The device of claim 1 , further comprising a set of electrodes embedded within the hybrid puck, wherein the set of electrodes comprises a chucking electrode embedded within the chucking region.

6. The device of claim 5 , wherein the set of electrodes further comprises an edge control electrode embedded within the chucking region.

7. The device of claim 5 , wherein the set of electrodes further comprises a heater electrode embedded within the backing region.

8. The device of claim 1 , further comprising at least one seal band defining at least one cooling zone.

9. The device of claim 8 , wherein the at least one seal band comprises an inner seal band defining an inner cooling zone and an outer seal band defining an outer cooling zone.

10. The device of claim 1 , further comprising a base structure comprising a cooling plate having a plurality of cooling channels, wherein the hybrid puck is disposed on the base structure.

11. The device of claim 1 , wherein the backing region and the chucking region each have a plateau shape defined by a respective center region elevated relative to a respective pair of end regions.

12. A substrate support assembly comprising:
a base structure comprising a cooling plate having a plurality of cooling channels; and
a hybrid puck corresponding to an electrostatic chuck and disposed on the base structure, the hybrid puck comprising a backing region disposed on the base structure, a chucking region disposed on the backing region, and a bond protection structure comprising an elastomer disposed between the backing region and the chucking region, wherein the backing region comprises a first dielectric material to improve thermal performance of the hybrid puck, and wherein the chucking region comprises a second dielectric material different from the first dielectric material to improve leakage current stability.

13. The substrate support assembly of claim 12 , wherein the first dielectric material is aluminum nitride, and wherein the second dielectric material is aluminum oxide.

14. The substrate support assembly of claim 12 , further comprising a bonding layer disposed between the base structure and the backing region.

15. The substrate support assembly of claim 12 , wherein the chucking region is bonded to the backing region via a bond, and wherein the bond is one of a diffusion bond or a metal bond.

16. The substrate support assembly of claim 12 , further comprising a set of electrodes embedded within the hybrid puck, wherein the set of electrodes comprises a chucking electrode embedded within the chucking region.

17. The substrate support assembly of claim 16 , wherein the set of electrodes further comprises an edge control electrode embedded within the chucking region.

18. The substrate support assembly of claim 16 , wherein the set of electrodes further comprises a heater electrode embedded within the backing region.

19. The substrate support assembly of claim 12 , further comprising an inner seal band defining an inner cooling zone and an outer seal band defining an outer cooling zone.

20. A method comprising:
obtaining a base structure comprising a cooling plate comprising a plurality of cooling channels; and
attaching, to the base structure, a hybrid puck comprising a backing region disposed on the base structure, a chucking region disposed on the backing region, and a bond protection structure comprising an elastomer disposed between the backing region and the chucking region, wherein the backing region comprises a first dielectric material to improve thermal performance of the hybrid puck, and wherein the chucking region comprises a second dielectric material different from the first dielectric material to improve leakage current stability.

Assignees

• Applied Materials Inc

Inventors

• Sarode Yogananda
• Kumar Anand
• Javali Prashant V

Classifications

• H10P72/7624

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P72/0434

  mainly by convection · CPC title

• H10P72/722 Primary

  Details of electrostatic chucks · CPC title

• H10P72/72

  using electrostatic chucks · CPC title

• H01L21/68785

  Electricity · mapped topic