Projection exposure system for semiconductor lithography having an optical arrangement
US-11415894-B2 · Aug 16, 2022 · US
US12360459B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12360459-B2 |
| Application number | US-202318453750-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 22, 2023 |
| Priority date | Feb 23, 2021 |
| Publication date | Jul 15, 2025 |
| Grant date | Jul 15, 2025 |
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An optical assembly has an optical element for influencing the beam path in a projection exposure apparatus and an actuator device for deforming the optical element. The actuator device has at least one photostrictive component and at least one light source. The photostrictive component is mechanically coupled to the optical element for the transmission of a tensile and/or compressive force in order to deform the optical element. The light source is configured for targeted illumination of the photostrictive component in order to induce the tensile and/or compressive force in the photostrictive component.
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What is claimed is: 1. An optical assembly, comprising: an optical element configured to influence a beam path in a projection exposure apparatus; and an actuator device configured to deform the optical element, the actuator device comprising a photostrictive component and a light source, wherein: the photostrictive component is mechanically coupled to the optical element to transmit a tensile force and/or a compressive force to deform the optical element; the light source is configured to targetedly illuminate the photostrictive component to induce the tensile and/or compressive force in the photostrictive component; the optical element comprises an optically active front side comprising a reflective layer configured to influence a beam path from a radiation source; the optical element comprises a back side facing away from the front side of the optical element; and at least one of the following holds: i) the photostrictive component is on the front side of the optical element next to the reflective layer; ii) the actuator device comprises a plurality of the photostrictive components distributed along the optical element and mechanically connected to the back side of the optical element. 2. The optical assembly of claim 1 , wherein the optical element comprises a main body extending from the back side of the optical element to the reflective layer, and the main body comprises a material that is at least partially transparent to the light from the light source. 3. The optical assembly of claim 1 , wherein the photostrictive component is in the optical element between the reflective layer and the back side ( 4 ) of the optical element. 4. The optical assembly of claim 1 , wherein the photostrictive component is parallel to the optical element. 5. The optical assembly of claim 1 , wherein exactly one photostrictive component is a contiguous material layer. 6. The optical assembly of claim 1 , wherein the photostrictive component is layer having a thickness between 1 nm and 500 μm. 7. The optical assembly of claim 1 , wherein the photostrictive component comprises a material selected from the group consisting of BiFeO3 or PbTiO3. 8. The optical assembly of claim 1 , wherein the light sources comprises a laser. 9. The optical assembly of claim 1 , wherein the light source is configured to emit light having a wavelength between 100 nm and 1000 nm. 10. The optical assembly of claim 1 , wherein the light source is settable with regard to its emission wavelength, its emission intensity, its emission focus focusing and/or its emission alignment. 11. The optical assembly of claim 1 , wherein the light source comprises an optical device. 12. The optical assembly of claim 1 , further comprising a control device configured to control the light source to illuminate the photostrictive component to achieve an intended deformation of the optical element. 13. The optical assembly of claim 1 , comprising a plurality of independently controllable light sources configured to illuminate the photostrictive component. 14. An apparatus, comprising: an illumination optical unit; a projection optical unit; and an optical assembly according to claim 1 , wherein the apparatus is a projection exposure apparatus, and the optical assembly is in the illumination optical unit or the projection optical unit. 15. A method, comprising: using the optical assembly of claim 1 to deform the optical element. 16. An optical assembly, comprising: an optical element configured to influence a beam path in a projection exposure apparatus; and an actuator device configured to deform the optical element, the actuator device comprising a photostrictive component and a light source, wherein: the photostrictive component is mechanically coupled to the optical element to transmit a tensile force and/or a compressive force to deform the optical element; the light source is configured to targetedly illuminate the photostrictive component to induce the tensile force and/or the compressive force in the photostrictive component; the optical element comprises an optically active front side comprising a reflective layer configured to influence a beam path from a radiation source; the optical element comprises a back side facing away from the front side of the optical elment; and at least one of the following holds: i) the light sources is fixed on the back side of the optical element; and ii) the photostrictive components is in the optical element between the reflective layer and the back side of the optical element, and the light source is in the optical element between the photostrictive component and the back side of the optical element. 17. The optical assembly of claim 16 , wherein the photostrictive component is on the front side of the optical element next to the reflective layer. 18. The optical assembly of claim 16 , wherein the light source is in the optical element between the photostrictive component and the back side of the optical element. 19. The optical assembly of claim 16 , wherein the photostrictive component is mechanically connected to the back side of the optical element. 20. An apparatus, comprising: an illumination optical unit; a projection optical unit; and an optical assembly according to claim 16 , wherein the apparatus is a projection exposure apparatus, and the optical assembly is in the illumination optical unit or the projection optical unit.
the reflecting means being moved or deformed by piezoelectric means · CPC title
with means for adjusting the shape of the mirror surface · CPC title
for optical projection, e.g. combination of mirror and condenser and objective {(photographic, cine and overhead projectors G03B21/00; photographic projection printing G03B27/32; photolithographic projectors G03F7/20; projection television H04N5/74; colour projection television H04N9/31)} · CPC title
Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system · CPC title
Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction · CPC title
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