Adaptive optical module for a microlithographic projection exposure apparatus
US-2025390024-A1 · Dec 25, 2025 · US
with means for adjusting the shape of the mirror surface
with means for adjusting the shape of the mirror surface · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G02B7/185 |
| Official title | with means for adjusting the shape of the mirror surface |
| Display label | with means for adjusting the shape of the mirror surface |
| Total patents | 65 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 2 |
| 2016 | 4 |
| 2017 | 6 |
| 2018 | 2 |
| 2019 | 9 |
| 2020 | 2 |
| 2021 | 6 |
| 2022 | 8 |
| 2023 | 9 |
| 2024 | 4 |
| 2025 | 10 |
| 2026 | 3 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Liquid mirror
US-2025334773-A1 · Oct 30, 2025 · US
Projection objective including an optical device
US-12411417-B2 · Sep 9, 2025 · US
Projection exposure apparatus for semiconductor lithography
US-12372877-B2 · Jul 29, 2025 · US
Optical assembly, method for deforming an optical element, and projection exposure system
US-12360459-B2 · Jul 15, 2025 · US
Support for an optical element
US-12271117-B2 · Apr 8, 2025 · US
Control device, optical system, lithography installation and method
US-2025021011-A1 · Jan 16, 2025 · US
Drive device, optical system and lithography apparatus
US-2025015772-A1 · Jan 9, 2025 · US
Apparatus and method for generating extreme ultraviolet radiation
US-2024381515-A1 · Nov 14, 2024 · US
Apparatus and method for generating extreme ultraviolet radiation
US-12133319-B2 · Oct 29, 2024 · US
Extreme ultraviolet lithography device and method of operating extreme ultraviolet lithography device
US-11960212-B2 · Apr 16, 2024 · US
Projection exposure apparatus for semiconductor lithography
US-2024012334-A1 · Jan 11, 2024 · US
Optical assembly, method for deforming an optical element, and projection exposure system
US-2023393485-A1 · Dec 7, 2023 · US
Extreme ultraviolet lithography device and method of operating extreme ultraviolet lithography device
US-2023393484-A1 · Dec 7, 2023 · US
Fastening of a mirror to a support
US-11822147-B2 · Nov 21, 2023 · US
Capacitive charge based self-sensing and position observer for electrostatic MEMS mirrors
US-11782263-B2 · Oct 10, 2023 · US
Support for an optical element
US-2023236516-A1 · Jul 27, 2023 · US
Fastening of a mirror to a support
US-2023204905-A1 · Jun 29, 2023 · US
A projection objective including an optical device
US-2023142187-A1 · May 11, 2023 · US
Wavefront correction for aerodynamic and atmospheric effects to an optical sensor on a high-speed flight vehicle
US-2023101430-A1 · Mar 30, 2023 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G02B7/185?
- CPC G02B7/185 is the Cooperative Patent Classification code for “with means for adjusting the shape of the mirror surface.”
- How many patents are filed under CPC G02B7/185 (with means for adjusting the shape of the mirror surface)?
- Our database includes 65 publications tagged with this CPC code.
- Is patent activity under CPC G02B7/185 growing?
- Publication counts under this code: 4 in 2024 vs 10 in 2025 (latest complete years).