Projection exposure system for semiconductor lithography having an optical arrangement

Patent metadata

Field	Value
Publication number	US-11415894-B2
Application number	US-202117380231-A
Country	US
Kind code	B2
Filing date	Jul 20, 2021
Priority date	Jan 30, 2019
Publication date	Aug 16, 2022
Grant date	Aug 16, 2022

Abstract

A projection exposure apparatus for semiconductor technology includes an optical arrangement with an optical element having an optically effective surface. The optical arrangement also includes an actuator embedded in the optical element. The actuator is outside the optically effective surface and outside the region located behind the optically effective surface. The optical arrangement is set up to deform the optically effective surface.

First claim

What is claimed is:

1. An apparatus, comprising:
an optical arrangement comprising an optical element which comprises an optically effective surface; and
an actuator embedded in the optical element,
wherein:
the actuator is outside the optically effective surface;
the optically effective surface has an outer perimeter;
the actuator is outside a region encompassed by a projection of the outer perimeter of the optically effective surface in a direction perpendicular to the outer perimeter of the optically effective surface;
the actuator is configured to deform the optically effective surface; and
the apparatus is a semiconductor lithography projection exposure apparatus.

2. The apparatus of claim 1 , wherein a portion of the actuator is in direct contact with the optical element.

3. The apparatus of claim 1 , wherein the actuator is embedded in a prestressed state.

4. The apparatus of claim 1 , wherein the actuator is configured to deform the optically effective surface via a laterally acting force of the actuator.

5. The apparatus of claim 1 , wherein the actuator is configured to apply a force to the optical element at a point that is level with a neutral axis of the optical element.

6. The apparatus of claim 1 , wherein the actuator is configured to apply a force to the optical element at a point that is above or below the level of a neutral axis of the optical element.

7. The apparatus of claim 1 , wherein the actuator has a principal direction of motion, and the actuator is configured to expand in its principal direction of motion to deform the optically effective surface.

8. The apparatus of claim 1 , wherein the actuator has a principal direction of motion, and the actuator is configured to expand perpendicular to its principal direction of motion to deform the optically effective surface.

9. The apparatus of claim 1 , wherein the actuator comprises an end surface in contact with the optical element.

10. The apparatus of claim 1 , wherein the actuator comprises a lateral surface, and at least a portion of the lateral surface contacts the optical element.

11. The apparatus of claim 1 , wherein the apparatus comprises a plurality of actuators configured to deform the optically effective surface with a deformation selected from the group consisting of a second harmonic tangential deformation, a third harmonic tangential deformation, and a higher harmonic tangential deformation.

12. The apparatus of claim 1 , wherein the optical element comprises a single lens.

13. The apparatus of claim 1 , wherein the optical element comprises a mirror.

14. The apparatus of claim 1 , wherein the actuator comprises a piezo element.

15. The apparatus of claim 1 , wherein the actuator is integrated into the optical element.

16. The apparatus of claim 1 , wherein the optical element comprises a cutout, and the actuator is in the cutout.

17. The apparatus of claim 1 , wherein:
the optically effective surface defines a first plane;
the optical element comprises a second surface opposite the optically effective surface;
the second surface defines a second plane; and
the actuator is between the first and second planes.

18. The apparatus of claim 1 , further comprising a holder configured to hold the optical element, wherein the actuator is not between the holder and the optical element.

19. The apparatus of claim 1 , further comprising a holder configured to hold the optical element, wherein the actuator is not in the holder.

20. The apparatus of claim 1 , wherein the apparatus comprises a projection optical unit, and the projection optical unit comprises the arrangement.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Fingerhuth Judith
• Wabra Norbert
• Schneider Sonja
• Djuric-Rissner Ferdinand
• Graf Peter
• Finken Reimar

Classifications

• G02B7/185

  with means for adjusting the shape of the mirror surface · CPC title

• G03F7/70266 Primary

  Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction · CPC title

• G03F7/70258

  Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system · CPC title

• G03F7/70191 Primary

  Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like · CPC title

• G02B26/0825

  the reflecting element being a flexible sheet or membrane, e.g. for varying the focus (flexible mirrors for cosmetic use A45D42/24) · CPC title