Gas nozzle, plasma apparatus using the same, and method for manufacturing gas nozzle

Patent metadata

Field	Value
Publication number	US-9633822-B2
Application number	US-201214354709-A
Country	US
Kind code	B2
Filing date	Oct 30, 2012
Priority date	Oct 31, 2011
Publication date	Apr 25, 2017
Grant date	Apr 25, 2017

Abstract

[Object] To provide a gas nozzle which meets a requirement to suppress the fall of particles.
[Solution] A gas nozzle 4 according to an aspect of the present invention includes a columnar main body 13 formed of a ceramic sintered body provided with a through-hole 12 formed therein through which a gas flows, an exhaust port 15 of the through-hole 12 for the gas is formed in one end surface S 1 of the main body 13 , and the mean width of the profile elements (Rsm) of the one end surface S 1 is 5 times or more the average crystalline grain diameter of the ceramic sintered body.

First claim

The invention claimed is:

1. A gas nozzle comprising: a columnar main body formed of a ceramic sintered body provided with at least one through-hole formed therein through which a gas flows, wherein the through-hole has an exhaust port for the gas formed in one end surface of the main body, and a mean width of profile elements (Rsm) of the one end surface is 5 times or more the average crystalline grain diameter of the ceramic sintered body.

2. The gas nozzle according to claim 1 ,
wherein the arithmetic average roughness (Ra) of the one end surface is 0.05 μm or less.

3. The gas nozzle according to claim 1 ,
wherein the mean width of the profile elements (Rsm) of the one end surface is 100 times or less the average crystalline grain diameter of the ceramic sintered body.

4. The gas nozzle according to claim 1 ,
wherein the mean width of the profile elements (Rsm) of a side surface of the main body connected to the one end surface is 5 times or more the average crystalline grain diameter of the ceramic sintered body.

5. The gas nozzle according to claim 4 ,
wherein the exhaust ports are formed in the main body, and at least one of the exhaust ports is also formed in the side surface.

6. The gas nozzle according to claim 1 ,
wherein the ceramic sintered body contains yttria as a primary component.

7. The gas nozzle according to claim 1 ,
wherein the ceramic sintered body contains spinel as a primary component.

8. The gas nozzle according to claim 7 ,
wherein the ceramic sintered body contains at least one of calcium and zirconium.

9. A plasma apparatus comprising:
a reaction chamber;
the gas nozzle according to claim 1 which supplies a gas in the reaction chamber; and
a discharge device to plasmatize the gas by discharge.

Assignees

• Kyocera Corp

Inventors

• Tanaka Atsushi

Classifications

• C04B35/505

  based on yttrium oxide · CPC title

• C04B2235/94

  Products characterised by their shape · CPC title

• C04B2235/9669

  Resistance against chemicals, e.g. against molten glass or molten salts · CPC title

• C04B2235/5436

  micrometer sized, i.e. from 1 to 100 micron · CPC title

• C04B35/62655

  Drying, e.g. freeze-drying, spray-drying, microwave or supercritical drying · CPC title