Compositions and methods for making silicon containing films
US-2015014823-A1 · Jan 15, 2015 · US
US12247286B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12247286-B2 |
| Application number | US-202016983364-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 3, 2020 |
| Priority date | Aug 9, 2019 |
| Publication date | Mar 11, 2025 |
| Grant date | Mar 11, 2025 |
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A cooling apparatus and methods for maintaining a precursor source vessel heater at a desired temperature are disclosed. The apparatus and methods can be used to maintain a desired temperature gradient within the precursor source vessel for improved integrity of the precursor source before delivery of the precursor to a reaction chamber. The apparatus and methods can also be used for rapid cooling of a source vessel for maintenance.
Opening claim text (preview).
What is claimed is: 1. An assembly comprising: a precursor source vessel; a heating plate external of and in thermal contact with the precursor source vessel, wherein the heating plate comprises a heating plate top and a heating plate bottom; and a cooling plate external of the precursor source vessel and in thermal contact with the heating plate, wherein the cooling plate comprises a top side and a bottom side and the heating plate bottom is disposed on the top side of the cooling plate, wherein the heating plate heats an interior of the precursor source vessel, and wherein the cooling plate removes heat from the heating plate; and wherein the bottom side is in thermal contact with one or more cooling lines defining a fluid path that runs across a portion of the bottom side of the cooling plate. 2. The assembly of claim 1 , wherein cooling plate is configured to maintain the heating plate within about 5° C. of a running temperature of the heating plate. 3. The assembly of claim 1 , wherein the assembly further comprises a valve configured to control a flow rate of a fluid through the one or more cooling lines. 4. The assembly of claim 3 , wherein the fluid is selected from at least one of: air, water, chilled water, or ethylene glycol. 5. The assembly of claim 4 , wherein the one or more cooling lines comprise at least one of: aluminum, stainless steel, nickel, or hastelloy. 6. The assembly of claim 5 , wherein the cooling plate comprises at least one of: aluminum, stainless steel, nickel, or hastelloy. 7. The assembly of claim 4 , further comprising a control system configured to control one or more of a flow rate of the fluid and a temperature of the fluid. 8. The assembly of claim 7 , wherein the control system communicates with one or more sensors configured to detect the running temperature of the heating plate. 9. The assembly of claim 8 , wherein the cooling lines comprise a serpentine path that is concentrated proximate a center portion of the cooling plate. 10. A reactor system comprising an assembly comprising: a reactor; a precursor source vessel; a heating plate external of and in thermal contact with the precursor source vessel, wherein the heating plate comprises a heating plate top and a heating plate bottom; and a cooling plate external of the precursor source vessel and in thermal contact with the heating plate, wherein the cooling plate comprises a top side and a bottom side and the heating plate bottom is disposed on the top side of the cooling plate, wherein the heating plate heats an interior of the precursor source vessel, and wherein the cooling plate removes heat from the heating element, wherein a temperature gradient forms within the interior from a first temperature at a bottom end of the precursor source vessel and a second temperature near the top end of the precursor source vessel, wherein the first temperature is less than the second temperature, wherein the bottom side is in thermal contact with one or more cooling lines defining a fluid path that runs across a portion of the bottom side of the cooling plate. 11. The assembly of claim 1 , wherein the heating plate is disposed between the precursor source vessel and the cooling plate.
Gas plumbing upstream of the reaction chamber · CPC title
Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)} · CPC title
characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials · CPC title
of refractory metals or yttrium · CPC title
characterized by the apparatus · CPC title
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