Apparatus and method for generating extreme ultraviolet radiation

Patent metadata

Field	Value
Publication number	US-12193136-B2
Application number	US-202318224005-A
Country	US
Kind code	B2
Filing date	Jul 19, 2023
Priority date	Nov 15, 2017
Publication date	Jan 7, 2025
Grant date	Jan 7, 2025

Abstract

A target droplet source for an extreme ultraviolet (EUV) source includes a droplet generator configured to generate target droplets of a given material. The droplet generator includes a nozzle configured to supply the target droplets in a space enclosed by a chamber. The target droplet source further includes a sleeve disposed in the chamber distal to the nozzle. The sleeve is configured to provide a path for the target droplets in the chamber.

First claim

What is claimed is:

1. An extreme ultraviolet (EUV) radiation source comprising:
an EUV generation chamber enclosing a space;
a droplet generator configured to generate target droplets of a given material, the droplet generator comprising a nozzle configured to supply the target droplets in the space enclosed by the EUV generation chamber; and
a sleeve disposed in the EUV generation chamber between the nozzle and a focal position, and configured to provide a path for the target droplets between the nozzle and the focal position, wherein the sleeve has a longitudinally tapering cross-section, the sleeve has a cross-section having a closed shape distal to the nozzle and a cross-section having an open shape proximal to the nozzle.

2. The EUV radiation source of claim 1 , further comprising an optical device configured to measure a characteristic of the target droplets.

3. The EUV radiation source of claim 2 , wherein the sleeve is made of a transparent material for allowing metrology analysis of the target droplets using the optical device, and wherein the transparent material includes at least one of fused quartz and diamond.

4. The EUV radiation source of claim 2 , wherein the characteristic of the target droplets is one or more selected from the group consisting of a velocity of the target droplets, a distance between successive target droplets, a frequency of the target droplets, a radius of the target droplets and a shape of the target droplets.

5. The EUV radiation source of claim 1 , wherein the sleeve comprises a tubular body.

6. The EUV radiation source of claim 1 , wherein the closed shape is selected from the group consisting of a circle, an ellipse, a triangle, and a regular or irregular convex polygon.

7. The EUV radiation source of claim 1 , wherein the sleeve is made of a ceramic having an area of enclosed by the cross-section in a range from 5 cm 2 to 25 cm 2 .

8. The EUV radiation source of claim 1 , further comprising an excitation laser configured to heat the target droplets supplied by the nozzle to generate plasma, the excitation laser being focused at the focal position in the space enclosed by the EUV generation chamber.

9. A target droplet generator for an extreme ultraviolet (EUV) source, the target droplet source comprising:
a droplet generator configured to generate target droplets of a given material, the droplet generator comprising a nozzle configured to supply the target droplets in a space enclosed by a chamber; and
a sleeve disposed in the chamber proximal to the nozzle, the sleeve configured to provide a path for the target droplets in the chamber, wherein the sleeve has a longitudinally tapering cross-section, the sleeve has a cross-section having a closed shape distal to the nozzle and a cross-section having an open shape proximal to the nozzle.

10. The target droplet generator of claim 9 , further comprising an optical device embedded within a wall of the sleeve to measure characteristic of the target droplets.

11. The target droplet generator of claim 10 , wherein the sleeve is made of a transparent material including at least one of fused quartz and diamond with the optical device.

12. The target droplet generator of claim 9 , wherein the sleeve comprises a tubular body.

13. The target droplet generator of claim 9 , wherein the closed shape is selected from the group consisting of a circle, an ellipse, a triangle, and a regular or irregular convex polygon.

14. The target droplet generator of claim 9 , wherein the chamber includes an environment therewithin, and wherein properties of the environment comprise one or more selected from the group consisting of a pressure inside the chamber, a temperature inside the chamber, a flow rate of gas inside the chamber, and a local pressure at a portion of a space enclosed by the chamber.

15. A method for operating an extreme ultraviolet (EUV) radiation source, the method comprising:
generating target droplets of a given material in a droplet generator through a nozzle of the droplet generator in a space enclosed by a chamber including an environment; and
providing the target droplets to a zone of excitation through a sleeve disposed in the chamber proximal to the nozzle, wherein the sleeve has a longitudinally tapering cross-section, the sleeve has a cross-section having a closed shape distal to the nozzle and a cross-section having an open shape proximal to the nozzle.

16. The method of claim 15 , further comprising:
monitoring the target droplets by an optical device embedded within a wall of the sleeve to measure a characteristic of the target droplets, wherein the optical device includes one or more optical probes; and
performing a removal of contamination by one or more gas outlets in the chamber.

17. The method of claim 16 , wherein the characteristic of the target droplets is one or more selected from the group consisting of a velocity of the target droplets, a distance between successive target droplets, a frequency of the target droplets, a radius of the target droplets and a shape of the target droplets.

18. The method of claim 16 , wherein the sleeve is made of a transparent material including at least one of fused quartz and diamond with the optical device.

19. The method of claim 15 , wherein the sleeve is configured to provide a path for the target droplets between the nozzle and the zone of excitation, and wherein the sleeve comprises a transparent material including at least one of fused quartz and diamond.

20. The method of claim 15 , wherein the closed shape is selected from the group consisting of a circle, an ellipse, a triangle, and a regular or irregular convex polygon.

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Lai Wei-Chih
• Chang Han-Lung
• Yang Chi
• Chien Shang-Chieh
• Liu Bo-Tsun
• Chen Li-Jui
• Cheng Po-Chung

Classifications

• H05G2/002 Primary

  Supply of the plasma generating material · CPC title

• H05G2/0035

  the material containing metals as principal radiation-generating components · CPC title

• H05G2/0023

  Constructional details of the ejection system · CPC title

• H05G2/005

  Electricity · mapped topic

• H05G2/008

  involving an energy-carrying beam in the process of plasma generation · CPC title