Liner assemblies for substrate processing systems

Patent metadata

Field	Value
Publication number	US-12071686-B2
Application number	US-202318307988-A
Country	US
Kind code	B2
Filing date	Apr 27, 2023
Priority date	Feb 11, 2013
Publication date	Aug 27, 2024
Grant date	Aug 27, 2024

Abstract

A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.

First claim

What is claimed is:

1. A chemical vapor deposition system for processing a substrate, the system comprising:
a processing chamber having a processing volume enclosed therein, the processing chamber including a lower chamber wall and an upper chamber wall;
a first liner disposed between the lower chamber wall and the processing volume, the first liner including a first fluid guide including a first portion and a second portion, the first portion has a first portion radius, the second portion has a second portion radius; and
a second liner disposed between the upper chamber wall and the processing volume, the second liner including a second fluid guide including a third portion and a fourth portion, the third portion has a third portion radius, the fourth portion has a fourth portion radius, wherein the third portion is opposite the first portion and the fourth portion is opposite the second portion such that a rounded fluid guiding channel is defined between the first fluid guide and the second fluid guide, wherein the first fluid guide and the second fluid guide are continuously rounded surfaces.

2. A chemical vapor deposition system as set forth in claim 1 , wherein the first portion of the first fluid guide is concave and the second portion of the first fluid guide is convex.

3. A chemical vapor deposition system as set forth in claim 1 , wherein the third portion of the second fluid guide is concave and the fourth portion of the second fluid guide is convex.

4. A chemical vapor deposition system as set forth in claim 1 , wherein the first portion radius, the second portion radius, the third portion radius, and the fourth portion radius are each between 10 millimeters (mm) and 20 mm.

5. A chemical vapor deposition system as set forth in claim 1 further comprising a plurality of partition walls extending outwardly from the second fluid guide.

6. A chemical vapor deposition system as set forth in claim 5 , wherein each partition wall includes a lower surface having a shape complementary to the first fluid guide.

7. A chemical vapor deposition system as set forth in claim 1 , wherein the second fluid guide has a shape complementary to the first fluid guide.

8. A chemical vapor deposition system as set forth in claim 1 , wherein a first portion of the second fluid guide is concave and a second portion of the second fluid guide is convex.

9. A liner assembly for a substrate processing system, the liner assembly comprising:
a first liner including a first fluid guide, the first fluid guide including a first portion and a second portion, the first portion having a first portion radius, the second portion having a second portion radius; and
a second liner including a second fluid guide, the second fluid guide including a third portion and a fourth portion, wherein the third portion is opposite the first portion and the fourth portion is opposite the second portion such that a rounded fluid guiding channel is defined between the first fluid guide and the second fluid guide, wherein the first fluid guide and the second fluid guide are continuously rounded surfaces.

10. A liner assembly as set forth in claim 9 , wherein the second fluid guide has a shape complementary to the first fluid guide.

11. A liner assembly as set forth in claim 9 , wherein the first portion of the first fluid guide is concave and the second portion of the first fluid guide is convex.

12. A liner assembly as set forth in claim 9 , wherein the third portion of the second fluid guide is concave and the fourth portion of the second fluid guide is convex.

13. A liner assembly as set forth in claim 9 , wherein the first liner includes an annular body and an outer peripheral surface including the first fluid guide.

14. A chemical vapor deposition system for processing a substrate, the system comprising:
a processing chamber having a processing volume enclosed therein, the processing chamber including a lower chamber wall and an upper chamber wall;
a first liner disposed between the lower chamber wall and the processing volume, the first liner including a first fluid guide having a first portion and a second portion; and
a second liner disposed between the upper chamber wall and the processing volume, the second liner including a second fluid guide having a third portion and a fourth portion, wherein the third portion is opposite the first portion and the fourth portion is opposite the second portion such that a rounded fluid guiding channel is defined between the first fluid guide and the second fluid guide, wherein the first fluid guide and the second fluid guide are continuously rounded surfaces.

15. A chemical vapor deposition system as set forth in claim 14 , wherein the first portion of the first fluid guide is concave and the second portion of the first fluid guide is convex.

16. A chemical vapor deposition system as set forth in claim 14 , wherein the third portion of the second fluid guide is concave and the fourth portion of the second fluid guide is convex.

17. A chemical vapor deposition system as set forth in claim 14 , wherein a first portion radius, a second portion radius, a third portion radius, a fourth portion radius are each between 10 millimeters (mm) and 20 mm.

18. A chemical vapor deposition system as set forth in claim 14 further comprising a plurality of partition walls extending outwardly from the second fluid guide.

19. A chemical vapor deposition system as set forth in claim 18 , wherein each partition wall includes a lower surface having a shape complementary to the first fluid guide.

Assignees

• Globalwafers Co Ltd

Inventors

• Abedijaberi Arash
• Thomas Shawn George

Classifications

• H01J37/32477

  characterised by the means for protecting vessels or internal parts, e.g. coatings · CPC title

• H01J37/3244

  Gas supply means · CPC title

• C23C16/45563

  Gas nozzles · CPC title

• C23C16/45504 Primary

  Laminar flow · CPC title