Liner assemblies for substrate processing systems

Patent metadata

Field	Value
Publication number	US-10907251-B2
Application number	US-201816235671-A
Country	US
Kind code	B2
Filing date	Dec 28, 2018
Priority date	Feb 11, 2013
Publication date	Feb 2, 2021
Grant date	Feb 2, 2021

Abstract

A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.

First claim

What is claimed is:

1. A liner assembly for a substrate processing system, the liner assembly comprising:
a first liner including an annular body and an outer peripheral surface including a first fluid guide, the first fluid guide including a first portion and a second portion, the first portion has a first portion radius, the second portion has a second portion radius, the first fluid guide is disposed on a removable insert, the annular body of the first liner defines a recess configured to receive the removable insert; and
a second liner including an annular body, a second fluid guide, and a plurality of partition walls extending outwardly from the second fluid guide, the second fluid guide including a third portion and a fourth portion, the third portion has a third portion radius, the fourth portion has a fourth portion radius, wherein the third portion is opposite the first portion and the fourth portion is opposite the second portion such that a rounded fluid guiding channel is defined between the first fluid guide and the second fluid guide, wherein the first fluid guide and the second fluid guide are continuously rounded.

2. A liner assembly as set forth in claim 1 wherein the removable insert includes a bow-shaped body sized and shaped to be received within the recess.

3. A liner assembly as set forth in claim 1 wherein the first portion radius and the second portion radius are selected such that the first portion and the second portion adjoin one another and the first fluid guide is a continuously rounded surface.

4. A liner assembly as set forth in claim 1 wherein the first portion radius is substantially equal to the second portion radius.

5. A liner assembly as set forth in claim 1 wherein the first portion radius is different than the second portion radius.

6. A liner assembly as set forth in claim 1 wherein the third portion radius and the fourth portion radius are selected such that the third portion and the fourth portion adjoin one another and the second fluid guide is a continuously rounded surface.

7. A liner assembly as set forth in claim 1 wherein the third portion radius is substantially equal to the fourth portion radius.

8. A liner assembly as set forth in claim 1 wherein the third portion radius is different than the fourth portion radius.

9. A liner assembly as set forth in claim 1 wherein the removable insert includes an outer peripheral surface and an inner peripheral surface, the first fluid guide extends between the outer peripheral surface and the inner peripheral surface such that the first fluid guide forms a continuously rounded surface between the outer peripheral surface and the inner peripheral surface.

10. A liner assembly as set forth in claim 1 wherein the second liner includes an outer rim and an inner rim, the second fluid guide extends between the outer rim and the inner rim such that the second fluid guide forms a continuously rounded surface between the outer rim and the inner rim.

11. A liner assembly as set forth in claim 1 wherein the second liner includes between three partition walls and twenty-two partition walls.

12. A liner assembly as set forth in claim 1 wherein the second liner includes twenty-two partition walls.

13. A chemical vapor deposition system for processing a substrate, the system comprising:
a processing chamber having a processing volume enclosed therein, the processing chamber including a lower chamber wall and an upper chamber wall;
a first liner disposed between the lower chamber wall and the processing volume, the first liner including an annular body and an outer peripheral surface including a first fluid guide, the first fluid guide including a first portion and a second portion, the first portion has a first portion radius, the second portion has a second portion radius, the first fluid guide is disposed on a removable insert, the annular body of the first liner defines a recess configured to receive the removable insert; and
a second liner disposed between the upper chamber wall and the processing volume, the second liner including an annular body, a second fluid guide, and a plurality of partition walls extending outwardly from the second fluid guide, the second fluid guide including a third portion and a fourth portion, the third portion has a third portion radius, the fourth portion has a fourth portion radius, wherein the third portion is opposite the first portion and the fourth portion is opposite the second portion such that a rounded fluid guiding channel is defined between the first fluid guide and the second fluid guide, wherein the first fluid guide and the second fluid guide are continuously rounded.

14. A chemical vapor deposition system as set forth in claim 13 further comprising an inject insert positioned between the lower chamber wall and the upper chamber wall and positioned adjacent the first liner and the second liner, wherein the inject insert is configured to channel a flow of gas to a channel defined by the first fluid guide and the second fluid guide.

15. A chemical vapor deposition system as set forth in claim 14 wherein the first portion radius is selected such that a surface of the first fluid guide is substantially flush with the inject insert.

16. A chemical vapor deposition system as set forth in claim 14 wherein the third portion radius is selected such that a surface of the second fluid guide is substantially flush with the inject insert.

17. A chemical vapor deposition system as set forth in claim 13 further comprising a preheat ring positioned within the processing chamber, wherein the preheat ring is configured to heat a flow of gas within the processing chamber.

18. A chemical vapor deposition system as set forth in claim 17 wherein the fourth portion radius is selected such that a surface of the first fluid guide is substantially flush with a surface of the preheat ring.

19. A chemical vapor deposition system as set forth in claim 13 wherein the first portion is concave about a circumferential line extending around the first liner and the second portion is convex about the circumferential line.

20. A chemical vapor deposition system as set forth in claim 13 wherein the third portion is convex about a circumferential line extending around the first liner when the first and second liners are positioned within the processing system and the fourth portion is concave about the circumferential line when the first and second liners are positioned within the processing system.

Assignees

• Globalwafers Co Ltd

Inventors

• Abedijaberi Arash
• Thomas Shawn George

Classifications

• H01J37/32477

  characterised by the means for protecting vessels or internal parts, e.g. coatings · CPC title

• H01J37/3244

  Gas supply means · CPC title

• C23C16/45504 Primary

  Laminar flow · CPC title

• C23C16/45563

  Gas nozzles · CPC title