Liner assembly for chemical vapor deposition chamber

Patent metadata

Field	Value
Publication number	US-9695508-B2
Application number	US-201514639697-A
Country	US
Kind code	B2
Filing date	Mar 5, 2015
Priority date	Mar 22, 2011
Publication date	Jul 4, 2017
Grant date	Jul 4, 2017

Abstract

Embodiments described herein relate to an apparatus and method for lining a processing region within a chamber. In one embodiment, a modular liner assembly for a substrate processing chamber is provided. The modular liner assembly includes a first liner and a second liner, each of the first liner and second liner comprising an annular body sized to be received in a processing volume of a chamber, and at least a third liner comprising a body that extends through the first liner and the second liner, the third liner having a first end disposed in the process volume and a second end disposed outside of the chamber.

First claim

The invention claimed is:

1. A modular liner assembly for a substrate processing chamber, comprising:
a first liner comprising an annular body sized to be received in a processing volume of a chamber and having a plurality of recessed portions formed therein;
a second liner comprising an annular body sized to be received in the processing volume of the chamber; and
a third liner comprising a body that extends through the first liner and the second liner, the third liner having a first end disposed in the process volume and a second end disposed outside of the chamber, wherein one of the plurality of recessed portions receives a portion of the third liner.

2. The liner assembly of claim 1 , wherein the third liner comprises a gas distribution manifold.

3. The liner assembly of claim 2 , wherein the gas distribution manifold comprises a plurality of first channels and a plurality of second channels.

4. The liner assembly of claim 3 , wherein the plurality of first channels alternate with the plurality of second channels.

5. The liner assembly of claim 3 , wherein the plurality of first channels provide a flow metric that is different than a flow metric provided by the plurality of second channels.

6. The liner assembly of claim 2 , wherein the gas distribution manifold includes a first plurality of outlets and a second plurality of outlets.

7. The liner assembly of claim 6 , wherein the first plurality of outlets are disposed in a first plane and the second plurality of outlets are disposed in a second plane that is different than the first plane.

8. The liner assembly of claim 6 , wherein the first plurality of outlets are formed in a surface of the gas distribution manifold having a first radius and the second plurality of outlets are formed in a surface of the gas distribution manifold having a second radius that is different than the first radius.

9. The liner assembly of claim 1 , wherein the third liner comprises an exhaust liner.

10. A modular liner assembly for a substrate processing chamber, comprising:
a first liner and a second liner, the first liner comprising an annular body having two recessed portions formed between a cut-out portion formed in the annular body; and
a third liner comprising a body that is received in and at least partially contacts a portion of the recessed portions of the first liner.

11. The liner assembly of claim 10 , wherein the third liner comprises one of a gas distribution manifold, a slit valve liner, or an exhaust insert liner assembly.

12. The liner assembly of claim 11 , wherein the gas distribution manifold includes a first plurality of outlets and a second plurality of outlets, wherein the first plurality of outlets are disposed in a first plane and the second plurality of outlets are disposed in a second plane that is different than the first plane.

13. The liner assembly of claim 10 , wherein the first liner and the second liner are disposed in a process volume of a chamber, and the body of the third liner includes a first end disposed in the process volume and a second end disposed outside of the chamber.

14. A process kit for a semiconductor processing chamber, comprising:
a plurality of liners adapted to modularly couple to each other in a processing volume of a chamber, the plurality of liners comprising:
a first liner and a second liner, each of the first liner and second liner comprising an annular body having a plurality of recessed portions formed therein; and
at least a third liner comprising a body that is received in and at least partially contacts a portion of the plurality of recessed portions.

15. The process kit of claim 14 , wherein the plurality of recessed portions comprise a first recessed portion and a second recessed portion.

16. The process kit of claim 15 , wherein the first recessed portion is disposed opposite to the second recessed portion.

17. The process kit of claim 15 , wherein the first recessed portion is disposed normal to the second recessed portion.

18. The process kit of claim 14 , wherein the third liner comprises one of a gas distribution manifold, a slit valve liner, or an exhaust insert liner assembly.

19. The process kit of claim 18 , wherein the gas distribution manifold comprises a plurality of first channels and a plurality of second channels.

20. The process kit of claim 19 , wherein the plurality of first channels alternate with the plurality of second channels.

Assignees

• Applied Materials Inc

Inventors

• Carlson David K
• Samir Mehmet Tugrul
• Myo Nyi O

Classifications

• C23C16/45578

  Elongated nozzles, tubes with holes · CPC title

• C23C16/45574 Primary

  Nozzles for more than one gas · CPC title

• C23C16/4404 Primary

  Coatings or surface treatment on the inside of the reaction chamber or on parts thereof · CPC title