Heated substrate support with temperature profile control

US9698074B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9698074-B2
Application numberUS-201414481283-A
CountryUS
Kind codeB2
Filing dateSep 9, 2014
Priority dateSep 16, 2013
Publication dateJul 4, 2017
Grant dateJul 4, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Methods and apparatus of substrate supports having temperature profile control are provided herein. In some embodiments, a substrate support includes: a plate having a substrate receiving surface and an opposite bottom surface; and a shaft having a first end comprising a shaft heater and a second end, wherein the first end is coupled to the bottom surface. Methods of making a substrate support having temperature profile control are also provided.

First claim

Opening claim text (preview).

The invention claimed is: 1. A substrate support, comprising: a plate having a substrate receiving surface and an opposite bottom surface; and a shaft comprising an elongated structure having a first end coupled to the bottom surface of the plate and a second end, wherein a shaft heater is embedded in the first end of the shaft. 2. The substrate support of claim 1 , wherein the first end comprises a flange and the shaft heater is disposed within the flange. 3. The substrate support of claim 1 , wherein the shaft heater is a resistive heater. 4. The substrate support of claim 3 , wherein the shaft heater comprises a conductor embedded in the shaft. 5. The substrate support of claim 4 , wherein the conductor is coupled to a power supply to the shaft heater. 6. The substrate support of claim 1 , further comprising: a power supply coupled to the shaft heater and coupled to a controller; and a shaft temperature sensor disposed at the first end and coupled to the controller, wherein the shaft heater, the power supply, the controller, and the shaft temperature sensor are linked in a first closed loop control circuit. 7. The substrate support of claim 6 , wherein the plate further comprises: a plate heater disposed in the plate; a power supply coupled to the plate heater and coupled to the controller; and a plate temperature sensor disposed in the plate and coupled to the controller, wherein the plate heater, the power supply, the controller, and the plate temperature sensor are linked in a second closed loop control circuit. 8. The substrate support of claim 7 , wherein the controller is configured to independently control the first closed loop control circuit and the second closed loop control circuit to maintain the plate and the shaft at a preselected temperature. 9. The substrate support of claim 1 , wherein the shaft is formed from a layer of ceramic material. 10. The substrate support of claim 9 , wherein the ceramic material comprises one or more of silicon nitride (Si 3 N 4 ), alumina (Al 2 O 3 ), aluminum nitride (AlN), or silicon carbide (SiC). 11. The substrate support of claim 9 , wherein the shaft is formed from two or more layers of ceramic material. 12. The substrate support of claim 9 , wherein the shaft heater is disposed on a layer of ceramic material. 13. The substrate support of claim 9 , wherein the shaft further comprises a conductor disposed on the layer of ceramic material and coupled to the shaft heater. 14. A substrate support, comprising: a plate having a substrate receiving surface and an opposite bottom surface; a plate heater disposed in the plate; a plate temperature sensor disposed in the plate, wherein the plate heater and the plate temperature sensor are coupled to a controller; a shaft comprising an elongated structure having a first end coupled to the bottom surface of the plate and a second end, wherein a shaft heater is embedded in the first end of the shaft; and a shaft temperature sensor disposed at the first end wherein the shaft temperature sensor and the shaft heater are coupled to a controller. 15. A method of making a substrate support, comprising: forming a plate having a substrate receiving surface and an opposite bottom surface; forming a first layer of ceramic material, the first layer comprising a first end and an opposite second end; embedding a heater on the first layer at the first end; disposing a conduit on the first layer such that one end of the conduit is coupled to the heater and a second end of the conduit extends beyond the second end of the ceramic material; forming a second layer of ceramic material atop the first layer such the second layer at least partially covers the heater; processing the first layer and the second layer to form a shaft; and coupling the first end to the bottom surface of the plate. 16. The method of claim 15 , wherein the heater is printed on the first layer of ceramic material. 17. The method of claim 15 , further comprising embedding a plate heater in the plate. 18. The method of claim 15 , wherein the second layer at least partially covers the conduit. 19. The method of claim 15 , wherein the plate is formed from a ceramic material.

Assignees

Inventors

Classifications

  • characterised by the construction of the shaft · CPC title

  • Temperature monitoring · CPC title

  • mainly by conduction · CPC title

  • for supporting or gripping · CPC title

  • H10W40/00Primary

    Arrangements for thermal protection or thermal control (integrated devices comprising arrangements for thermal protection H10D89/60) · CPC title

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What does patent US9698074B2 cover?
Methods and apparatus of substrate supports having temperature profile control are provided herein. In some embodiments, a substrate support includes: a plate having a substrate receiving surface and an opposite bottom surface; and a shaft having a first end comprising a shaft heater and a second end, wherein the first end is coupled to the bottom surface. Methods of making a substrate support …
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H10P72/0432. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jul 04 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).