Reactant vaporizer and related systems and methods
US-10876205-B2 · Dec 29, 2020 · US
US11926894B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11926894-B2 |
| Application number | US-201715585540-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 3, 2017 |
| Priority date | Sep 30, 2016 |
| Publication date | Mar 12, 2024 |
| Grant date | Mar 12, 2024 |
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Herein disclosed are systems and methods related to solid source chemical vaporizer vessels and multiple chamber deposition modules. In some embodiments, a solid source chemical vaporizer includes a housing base and a housing lid. Some embodiments also include a first and second tray configured to be housed within the housing base, wherein each tray defines a first serpentine path adapted to hold solid source chemical and allow gas flow thereover. In some embodiments, a multiple chamber deposition module includes first and second vapor phase reaction chambers and a solid source chemical vaporizer vessel to supply each of the first and second vapor phase reaction chambers.
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What is claimed is: 1. A solid source chemical vaporizer, comprising: a housing base; a first tray configured to be housed within the housing base, the first tray defining a first serpentine flow path adapted to hold solid source chemical and allow gas flow thereover, the first serpentine flow path comprising a plurality of straight portions and a plurality of path bends, the path bends defining portions of the first serpentine flow path where the first serpentine flow path curves back on itself; a second tray configured to be housed within the housing base, the second tray defining a second serpentine flow path adapted to hold solid source chemical and allow gas flow thereover; a protrusion within at least one straight portion of the plurality of straight portions of the first serpentine flow path, wherein the protrusion is configured to be disposed within solid source chemical within the first serpentine flow path and configured to produce a level of turbulence greater than the level during gas flow along the at least one straight portion without the protrusion; and a housing lid comprising: a first inlet valve mounted on the lid and in fluid communication with the first serpentine flow path; a first outlet valve mounted on the lid and in fluid communication with the first serpentine flow path; a second inlet valve mounted on the lid and in fluid communication with the second serpentine flow path; and a second outlet valve mounted on the lid and in fluid communication with the second serpentine flow path. 2. The solid source chemical vaporizer of claim 1 , wherein the first serpentine flow path comprises a recess formed in a solid metal block. 3. The solid source chemical vaporizer of claim 2 , wherein the recess defines a height : width aspect ratio in a range of about 1.5-5. 4. The solid source chemical vaporizer of claim 1 , wherein the housing lid further comprises a vent valve mounted on the lid and in fluid communication with the first serpentine flow path. 5. The solid source chemical vaporizer of claim 1 , wherein no protrusions are formed or installed in the first serpentine flow path for a distance of between about 50 mm and 300 mm from the outlet valve along the first serpentine flow path. 6. The solid source chemical vaporizer of claim 1 , wherein the protrusion comprises at least one hole. 7. The solid source chemical vaporizer of claim 6 , wherein the at least one hole defines an axis that is angled relative to an axis of the first serpentine flow path at that location. 8. The solid source chemical vaporizer of claim 6 , wherein the at least one hole comprises an array of holes forming a perforation pattern. 9. The solid source chemical vaporizer of claim 1 , wherein the protrusion comprises a hollow structure, the hollow structure comprising openings configured to allow flow of gas therethrough. 10. The solid source chemical vaporizer of claim 1 , wherein the protrusion comprises an integral wall. 11. The solid source chemical vaporizer of claim 1 , wherein the protrusion comprises a pillar-like protrusion. 12. The solid source chemical vaporizer of claim 1 , wherein the protrusion comprises a wall configured to be inserted into the first serpentine flow path. 13. The solid source chemical vaporizer of claim 1 , comprising two or more protrusions, wherein a distance of between about 20 mm and 400 mm along the first serpentine flow path separates two successive protrusions of the two or more protrusions. 14. The solid source chemical vaporizer of claim 1 , comprising two or more protrusions, wherein a frequency of protrusions along straights of the first serpentine flow path is greater than the frequency of protrusions along bends of the first serpentine flow path. 15. The solid source chemical vaporizer of claim 1 , wherein the protrusion comprises a plurality of protrusions disposed within two or more straight portions of the plurality of straight portions. 16. The solid source chemical vaporizer of claim 1 , wherein the first serpentine flow path and the second serpentine flow path are fluidly connected in series. 17. The solid source chemical vaporizer of claim 1 , wherein the first serpentine flow path and the second serpentine flow path are fluidly connected in parallel. 18. The solid source chemical vaporizer of claim 1 , wherein the first serpentine flow path and the second serpentine flow path are not in fluid communication with each other within the solid source chemical vaporizer.
Apparatus for thermal treatment · CPC title
the materials being characterised by the deposition precursor materials · CPC title
Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title
by evaporation using carrier gas in contact with the source material (C23C16/4486 takes precedence) · CPC title
characterized by the apparatus · CPC title
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