Silicon based melting composition and manufacturing method for silicon carbide single crystal using the same

US11873576B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11873576-B2
Application numberUS-201916630952-A
CountryUS
Kind codeB2
Filing dateMay 22, 2019
Priority dateMay 25, 2018
Publication dateJan 16, 2024
Grant dateJan 16, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A silicon-based molten composition according to an exemplary embodiment is used in a solution growing method for forming a silicon carbide single crystal, includes silicon (Si), yttrium (Y), and iron (Fe), and is expressed in Formula 1.SiaYbFec  [Formula 1]In Formula 1, the a is equal to or greater than 0.4 and equal to or less than 0.8,the b is equal to or greater than 0.2 and equal to or less than 0.3, and the c is equal to or greater than 0.1 and equal to or less than 0.2.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for manufacturing a silicon carbide single crystal, comprising: preparing a silicon carbide seed crystal; preparing a silicon-based molten composition including silicon (Si), yttrium (Y), and iron (Fe), and as expressed in Formula 1; forming a molten solution including the silicon-based molten composition and carbon (C); and obtaining the silicon carbide single crystal on the silicon carbide seed crystal from the surface of the molten solution: Si a Y b Fe c   [Formula 1] wherein, in Formula 1, the a is equal to or greater than 0.5 and equal to or less than 0.7, the b is equal to or greater than 0.2 and equal to or less than 0.3, and the c is equal to or greater than 0.1 and equal to or less than 0.2, wherein in the obtaining of the silicon carbide single crystal, a yttrium silicide is not precipitated, and wherein a growing speed of the silicon carbide single crystal is equal to or greater than 0.1 mm/h. 2. The method of claim 1 , wherein the b is equal to or greater than 0.2 and equal to or less than 0.25, and the c is equal to or greater than 0.15 and equal to or less than 0.2. 3. The method of claim 1 , wherein the forming of the molten solution includes inserting the silicon-based molten composition into a crucible and heating the silicon-based molten composition in the crucible. 4. The method of claim 3 , wherein the heating includes heating the molten solution to be 1800 degrees (° C.). 5. The method of claim 3 , wherein a carbon solubility of the molten solution is in a saturated state. 6. The method of claim 5 , wherein a temperature gradient of −20° C./cm is formed in a direction from the inside of the molten solution to the surface of the molten solution, and the silicon carbide seed crystal is allowed to contact the surface of the molten solution. 7. The method of claim 1 , wherein the silicon-based molten composition consists of silicon (Si), yttrium (Y), and iron (Fe), and as expressed in the Formula 1.

Assignees

Inventors

Classifications

  • C30B15/14Primary

    Heating of the melt or the crystallised materials · CPC title

  • C30B19/04Primary

    the solvent being a component of the crystal composition · CPC title

  • C30B29/36Primary

    Carbides · CPC title

  • Vertical dipping system · CPC title

  • characterised by the seed, e.g. its crystallographic orientation · CPC title

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What does patent US11873576B2 cover?
A silicon-based molten composition according to an exemplary embodiment is used in a solution growing method for forming a silicon carbide single crystal, includes silicon (Si), yttrium (Y), and iron (Fe), and is expressed in Formula 1.SiaYbFec  [Formula 1]In Formula 1, the a is equal to or greater than 0.4 and equal to or less than 0.8,the b is equal to or greater than 0.2 and equal to or less…
Who is the assignee on this patent?
Lg Chemical Ltd
What technology area does this patent fall under?
Primary CPC classification C30B15/14. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 16 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 9 related publications on this page (citations in our corpus or others sharing the same primary CPC).