Silicon-Based Molten Composition And Method For Manufacturing Silicon Carbide Single Crystal Using The Same
US-2019106806-A1 · Apr 11, 2019 · US
US11873576B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11873576-B2 |
| Application number | US-201916630952-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 22, 2019 |
| Priority date | May 25, 2018 |
| Publication date | Jan 16, 2024 |
| Grant date | Jan 16, 2024 |
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A silicon-based molten composition according to an exemplary embodiment is used in a solution growing method for forming a silicon carbide single crystal, includes silicon (Si), yttrium (Y), and iron (Fe), and is expressed in Formula 1.SiaYbFec [Formula 1]In Formula 1, the a is equal to or greater than 0.4 and equal to or less than 0.8,the b is equal to or greater than 0.2 and equal to or less than 0.3, and the c is equal to or greater than 0.1 and equal to or less than 0.2.
Opening claim text (preview).
What is claimed is: 1. A method for manufacturing a silicon carbide single crystal, comprising: preparing a silicon carbide seed crystal; preparing a silicon-based molten composition including silicon (Si), yttrium (Y), and iron (Fe), and as expressed in Formula 1; forming a molten solution including the silicon-based molten composition and carbon (C); and obtaining the silicon carbide single crystal on the silicon carbide seed crystal from the surface of the molten solution: Si a Y b Fe c [Formula 1] wherein, in Formula 1, the a is equal to or greater than 0.5 and equal to or less than 0.7, the b is equal to or greater than 0.2 and equal to or less than 0.3, and the c is equal to or greater than 0.1 and equal to or less than 0.2, wherein in the obtaining of the silicon carbide single crystal, a yttrium silicide is not precipitated, and wherein a growing speed of the silicon carbide single crystal is equal to or greater than 0.1 mm/h. 2. The method of claim 1 , wherein the b is equal to or greater than 0.2 and equal to or less than 0.25, and the c is equal to or greater than 0.15 and equal to or less than 0.2. 3. The method of claim 1 , wherein the forming of the molten solution includes inserting the silicon-based molten composition into a crucible and heating the silicon-based molten composition in the crucible. 4. The method of claim 3 , wherein the heating includes heating the molten solution to be 1800 degrees (° C.). 5. The method of claim 3 , wherein a carbon solubility of the molten solution is in a saturated state. 6. The method of claim 5 , wherein a temperature gradient of −20° C./cm is formed in a direction from the inside of the molten solution to the surface of the molten solution, and the silicon carbide seed crystal is allowed to contact the surface of the molten solution. 7. The method of claim 1 , wherein the silicon-based molten composition consists of silicon (Si), yttrium (Y), and iron (Fe), and as expressed in the Formula 1.
Heating of the melt or the crystallised materials · CPC title
the solvent being a component of the crystal composition · CPC title
Carbides · CPC title
Vertical dipping system · CPC title
characterised by the seed, e.g. its crystallographic orientation · CPC title
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