Method for manufacturing deposition mask, method for manufacturing display device and deposition mask

Patent metadata

Field	Value
Publication number	US-11746407-B2
Application number	US-202117510345-A
Country	US
Kind code	B2
Filing date	Oct 25, 2021
Priority date	Sep 15, 2017
Publication date	Sep 5, 2023
Grant date	Sep 5, 2023

Abstract

A method includes: sandwiching a plastic layer between a glass substrate and a metal plate made of an iron-nickel alloy and joining the metal plate to the glass substrate with the plastic layer in between; forming a mask portion including a plurality of mask holes from the metal plate; joining a surface of the mask portion that is opposite to a surface of the mask portion that is in contact with the plastic layer to a mask frame, which has a higher rigidity than the mask portion and is in a shape of a frame surrounding the mask holes of the mask portion; and peeling off the plastic layer and the glass substrate from the mask portion.

First claim

The invention claimed is:

1. A vapor deposition mask comprising:
a sheet-shaped mask portion made of an iron-nickel alloy and having a contact surface, which is configured to be in contact with a vapor deposition target, and a non-contact surface, which is opposite to the contact surface, wherein the mask portion includes a plurality of mask holes each extending from a first opening, which is located in the non-contact surface, to a second opening, which is located in the contact surface, and the second opening is smaller in size than the first opening; and
a mask frame that has a welding mark welded to the non-contact surface, has a higher rigidity than the mask portion, and is in a shape of a frame surrounding the mask holes,
the mask portion is formed by peeling off a plastic layer and a glass substrate from the mask portion after making the welding mark in a state where the glass substrate is joined to the contact surface with the plastic layer,
the welding mark is located on the non-contact surface opposite to the contact surface that follows the surface of the glass substrate.

2. The vapor deposition mask according to claim 1 , wherein
the thickness of the mask portion is between 1 μm and 15 μm inclusive.

3. The vapor deposition mask according to claim 1 , wherein
the vapor deposition mask has a plurality of mask portions,
the mask portion is one of the plurality of mask portions,
each mask portion is welded to the mask frame.

4. A method for manufacturing the vapor deposition mask according to claim 1 , the method comprising:
sandwiching the plastic layer between the glass substrate and a metal plate made of an iron-nickel alloy and joining the metal plate to the glass substrate with the plastic layer in between;
forming the mask portion including the plurality of mask holes from the metal plate joined to the glass substrate;
joining a surface of the mask portion that is opposite to a surface of the mask portion that is in contact with the plastic layer to the mask frame, which has a higher rigidity than the mask portion and is in a shape of a frame surrounding the mask holes of the mask portion by irradiating a portion in the mask portion which is in contact with the mask frame through the glass substrate and the plastic layer with a laser beam to weld the mask frame to the mask portion and make a welding mark; and
peeling off the plastic layer and the glass substrate from the mask portion which is joined to the mask frame.

Assignees

• Toppan Printing Co Ltd

Inventors

• Sato Shunsuke
• Terada Reiji
• Mikami Naoko

Classifications

• C23C14/042 Primary

  using masks · CPC title

• C23C14/588

  by mechanical treatment · CPC title

• C23C14/5813

  using lasers · CPC title

• H10K71/166

  using selective deposition, e.g. using a mask · CPC title

• C23C14/24

  Vacuum evaporation · CPC title