Vapor deposition mask substrate, vapor deposition mask substrate manufacturing method, vapor deposition mask manufacturing method, and display device manufacturing method

Patent metadata

Field	Value
Publication number	US-2019112699-A1
Application number	US-201815928376-A
Country	US
Kind code	A1
Filing date	Mar 22, 2018
Priority date	Oct 13, 2017
Publication date	Apr 18, 2019
Grant date	—

Abstract

A metal sheet has shapes in a width direction that are taken at different positions in a longitudinal direction of the metal sheet and differ from one another. Each shape includes undulations repeating in the width direction. Each undulation includes a valley at each of two ends of the undulation. Each undulation has a length, which is a length of a straight line in the width direction that connects one of the valleys of the undulation to the other valley. A percentage of a height of each undulation relative to the length of the undulation is a unit steepness. The metal sheet has a unit length in the longitudinal direction of 500 mm. A maximum value of the unit steepnesses of the metal sheet per the unit length is a first steepness. The first steepness is less than or equal to 0.5%.

First claim

1 . A vapor deposition mask substrate, which is a metal sheet that has a shape of a strip and is configured to be etched to include a plurality of holes and used to manufacture a vapor deposition mask, wherein
the metal sheet has a longitudinal direction and a width direction, the metal sheet has shapes in the width direction that are taken at different positions in the longitudinal direction of the metal sheet and differ from one another, each shape includes undulations repeating in the width direction, each undulation includes a valley at each of two ends of the undulation, each undulation has a length, which is a length of a straight line in the width direction that connects one of the valleys of the undulation to the other valley, a percentage of a height of each undulation relative to the length of the undulation is a unit steepness, the metal sheet has a unit length in the longitudinal direction of 500 mm, a maximum value of the unit steepnesses of the metal sheet per the unit length is a first steepness, and the first steepness is less than or equal to 0.5%.

2 . The vapor deposition mask substrate according to claim 1 , wherein
a maximum value of the unit steepnesses of all undulations in the width direction at each position in the longitudinal direction is a second steepness, and an average value of the second steepnesses of the metal sheet per unit length is less than or equal to 0.25%.

3 . The vapor deposition mask substrate according to claim 1 , wherein
a number of undulations in the width direction at each position in the longitudinal direction is an undulation quantity at the position, and a maximum value of the undulation quantities of the metal sheet per the unit length is less than or equal to four.

4 . The vapor deposition mask substrate according to claim 1 , wherein
a number of undulations in the width direction at each position in the longitudinal direction is an undulation quantity at the position, and an average value of the undulation quantities of the metal sheet per the unit length is less than or equal to two.

5 . A method for manufacturing a vapor deposition mask substrate, which is a metal sheet that has a shape of a strip and is configured to be etched to include a plurality of holes and used to manufacture a vapor deposition mask, the method comprising:
obtaining the metal sheet by rolling a base material, wherein the metal sheet has a longitudinal direction and a width direction, the metal sheet has shapes in the width direction that are taken at different positions in the longitudinal direction of the metal sheet and differ from one another, each shape includes undulations repeating in the width direction, each undulation includes a valley at each of two ends of the undulation, each undulation has a length, which is a length of a straight line in the width direction that connects one of the valleys of the undulation to the other valley, a percentage of a height of each undulation relative to the length of the undulation is a unit steepness, the metal sheet has a unit length in the longitudinal direction of 500 mm, a maximum value of the unit steepnesses of the metal sheet per the unit length is a first steepness, and the base material is rolled such that the first steepness is less than or equal to 0.5%.

6 . A method for manufacturing a vapor deposition mask, the method comprising:
forming a resist layer on a metal sheet having a shape of a strip; and forming a plurality of holes in the metal sheet by etching using the resist layer as a mask to form a mask portion, wherein the metal sheet has a longitudinal direction and a width direction, the metal sheet has shapes in the width direction that are taken at different positions in the longitudinal direction of the metal sheet and differ from one another, each shape includes undulations repeating in the width direction, each undulation includes a valley at each of two ends of the undulation, each undulation has a length, which is a length of a straight line in the width direction that connects one of the valleys of the undulation to the other valley, a percentage of a height of each undulation relative to the length of the undulation is a unit steepness, the metal sheet has a unit length in the longitudinal direction of 500 mm, a maximum value of the unit steepnesses of the metal sheet per the unit length is a first steepness, and the first steepness is less than or equal to 0.5%.

7 . The method for manufacturing a vapor deposition mask according to claim 6 , wherein
the mask portion is one of a plurality of mask portions, forming the mask portion includes forming the mask portions in the single metal sheet, the mask portions each include a separate side surface including some of the holes, and the method further comprises joining the side surfaces of the mask portions to a single frame portion such that the single frame portion surrounds the holes of each mask portion.

8 . A method for manufacturing a display device, the method comprising:
preparing a vapor deposition mask manufactured by the method for manufacturing a vapor deposition mask according to claim 6 ; and forming a pattern by vapor deposition using the vapor deposition mask.

Assignees

• Toppan Printing Co Ltd

Inventors

• Shinno Mikio

Classifications

• C23C14/042 Primary

  using masks · CPC title

• B21B1/38

  for rolling sheets of limited length, e.g. folded sheets, superimposed sheets, {pack rolling}(B21B1/40 takes precedence; folding sheets before, or separating layers after, rolling B21B47/00) · CPC title

• C23F1/02

  Local etching · CPC title

• C23C14/24

  Vacuum evaporation · CPC title

• H01L51/0011

  Electricity · mapped topic