In-situ optical chamber surface and process sensor

Patent metadata

Field	Value
Publication number	US-11735401-B2
Application number	US-202117466912-A
Country	US
Kind code	B2
Filing date	Sep 3, 2021
Priority date	Apr 8, 2019
Publication date	Aug 22, 2023
Grant date	Aug 22, 2023

Abstract

Embodiments disclosed herein include optical sensor systems and methods of using such systems. In an embodiment, the optical sensor system comprises a housing and an optical path through the housing. In an embodiment, the optical path comprises a first end and a second end. In an embodiment a reflector is at the first end of the optical path, and a lens is between the reflector and the second end of the optical path. In an embodiment, the optical sensor further comprises an opening through the housing between the lens and the reflector.

First claim

What is claimed is:

1. A processing tool, comprising:
a chamber; and
an optical sensor system that passes through a wall of the chamber, wherein the optical sensor system comprises:
a housing;
an optical path through the housing, wherein the optical path comprises a first end in the chamber and a second end outside of the chamber;
a reflector at the first end of the optic al path;
a lens between the reflector and the second end of the optical path; and
an opening through the housing between the lens and the reflector, wherein the opening is within the chamber.

2. The optical sensor system of claim 1 , further comprising:
a light source optically coupled to the lens; and
a sensor optically coupled to the lens.

3. The optical sensor system of claim 2 , wherein the light source is a single wavelength source.

4. The optical sensor system of claim 2 , wherein the light source is a broad band light source.

5. The optical sensor system of claim 2 , wherein the light source and the sensor are optically coupled to the lens by a fiber optic cable.

6. The optical sensor system of claim 5 , wherein the fiber optic cable comprises a splitter.

7. The optical sensor system of claim 2 , further comprising:
a band pass filter at a location along an optical path between the sensor and the opening.

8. The optical sensor system of claim 2 , wherein the sensor is a spectrometer or a photodiode.

9. The optical sensor system of claim 2 , wherein the light source and the sensor are integrated into the housing.

10. The optical sensor system of claim 1 , wherein the housing is transparent.

11. The optical sensor system of claim 1 , wherein the reflector is removable.

12. An optical sensing array for a plasma processing chamber, comprising:
a plurality of optical sensing systems oriented around a perimeter of the processing chamber, wherein the optical sensing systems pass through a wall of the plasma processing chamber, wherein each of the plurality of optical sensing systems comprise:
a housing that passes through the wall of the plasma processing chamber;
an optical path through the housing, wherein the optical path comprises a first end and a second end;
a reflector at the first end of the optical path;
a lens between the reflector and the second end of the optical path; and
an opening through the housing within the plasma processing chamber,

wherein the opening is between the lens and the reflector.

13. The optical sensing array of claim 12 , wherein the plurality of optical sensing systems are configured to provide uniformity data of a plasma condition, a wall condition, or a plasma condition and a wall condition.

14. The optical sensing array of claim 12 , wherein the plurality of optical sensing systems are configured to provide chamber drift monitoring.

Assignees

• Applied Materials Inc

Inventors

• Lin Chuang-Chia
• Ummethala Upendra
• Babayan Steven E
• Lian Lei

Classifications

• H01J2237/24585

  Other variables, e.g. energy, mass, velocity, time, temperature · CPC title

• H01J37/22

  Optical {, image processing} or photographic arrangements associated with the tube · CPC title

• H01J37/32972

  Spectral analysis · CPC title

• H01J37/32917 Primary

  Plasma diagnostics · CPC title

• G01J3/443

  Emission spectrometry · CPC title