Metallic grating

Patent metadata

Field	Value
Publication number	US-11579344-B2
Application number	US-202016897531-A
Country	US
Kind code	B2
Filing date	Jun 10, 2020
Priority date	Sep 17, 2012
Publication date	Feb 14, 2023
Grant date	Feb 14, 2023

Abstract

A metallic grating includes a substrate; a plurality of high aspect ratio trenches disposed in the substrate such that the high aspect ratio trenches are spaced apart from one another by a field surface of the substrate; a metallic superconformal filling formed and disposed in the high aspect ratio trenches; and a grating including a spatial arrangement of the high aspect ratio trenches that are filled with the metallic superconformal filling such that the metallic superconformal filling is void-free, and the high aspect ratio trenches are bottom-up filled with the metallic superconformal filling, wherein a height of the metallic superconformal filling is less than or equal to the height of the high aspect ratio trenches.

First claim

What is claimed is:

1. A metallic grating comprising:
a substrate;
a plurality of high aspect ratio trenches disposed in the substrate such that the high aspect ratio trenches are spaced apart from one another by a field surface of the substrate;
a metallic superconformal filling formed and disposed in the high aspect ratio trenches; and
a grating comprising a spatial arrangement of the high aspect ratio trenches that are filled with the metallic superconformal filling such that the metallic superconformal filling is void-free, and the high aspect ratio trenches are bottom-up filled with the metallic superconformal filling,
wherein an aspect ratio of the high aspect ratio trenches is from 0.5 to 200, and a height of the high aspect ratio trenches is from 50 nm to 5 mm, and a height of the metallic superconformal filling is less than or equal to the height of the high aspect ratio trenches.

2. The metallic grating of claim 1 , wherein the substrate is electrically conductive.

3. The metallic grating of claim 1 , wherein the substrate comprises silicon and a dopant that provides electrical conductivity to the substrate.

4. The metallic grating of claim 1 , wherein a width of the metallic superconformal filling is from 10 nm to 100 μm.

5. The metallic grating of claim 1 , wherein a length of the metallic superconformal filling is from 0.5 μm to 1 m.

6. The metallic grating of claim 1 , wherein the height of the metallic superconformal filling is from 50 nm to 5 mm.

7. The metallic grating of claim 1 , wherein the metallic superconformal filling consists essentially of gold and bismuth.

Assignees

• Government Of The Us Secretary Of Commerce

Inventors

• Josell Daniel
• Moffat Thomas Polk

Classifications

• G02B5/1857 Primary

  using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams · CPC title

• G02B5/1852 Primary

  using mechanical means, e.g. ruling with diamond tool, moulding · CPC title

• G02B5/1809

  with pitch less than or comparable to the wavelength · CPC title

• G02B5/1861

  Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials (G02B5/1809, G02B5/1828, G02B5/1833, G02B5/1838 and G02B5/1847 take precedence) · CPC title