Semiconductor package and method of manufacturing a semiconductor package

US11444017B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11444017-B2
Application numberUS-201916560139-A
CountryUS
Kind codeB2
Filing dateSep 4, 2019
Priority dateSep 5, 2018
Publication dateSep 13, 2022
Grant dateSep 13, 2022

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

In an embodiment, a semiconductor package includes a semiconductor device embedded in an insulating layer, a contact pad having an area, and a vertical redistribution structure including substantially parallel vertical paths arranged in the insulating layer and extending perpendicular to the area of the contact pad. The substantially vertical paths are non-uniformly distributed over the area of the contact pad.

First claim

Opening claim text (preview).

What is claimed is: 1. A semiconductor package, comprising: a semiconductor device embedded in an insulating layer; a contact pad having an area that does not overlap the semiconductor device, and a vertical current redistribution structure comprising substantially parallel vertical current paths arranged in the insulating layer and extending perpendicular to the area of the contact pad that does not overlap the semiconductor device, the substantially parallel vertical current paths being non-uniformly distributed over the area of the contact pad that does not overlap the semiconductor device. 2. The semiconductor package of claim 1 , wherein the substantially parallel vertical current paths are arranged in a L-shape, U shape or O-shape on the contact pad. 3. The semiconductor package of claim 1 , further comprising a plurality of via sites forming a two-dimensional array of a first pitch on the area of the contact pad that does not overlap the semiconductor device, wherein the substantially parallel vertical current paths comprise conductive vias extending through the insulating layer and located at a subset of the via sites such that the two-dimensional array includes at least one via-free zone in the two-dimensional array. 4. The semiconductor package of claim 3 , wherein the at least one via-free zone has a lateral shape such that the conductive vias are arranged in a L-shape, U shape, O-shape on the area. 5. The semiconductor package of claim 3 , wherein the via sites are arranged in off-set rows or in rows and columns. 6. The semiconductor package of claim 3 , wherein a first contact pad is arranged on a first major surface of the insulating layer and the conductive vias extend between the first contact pad and a lateral conductive layer positioned on a second major surface of the insulating layer, the second major surface opposing the first major surface. 7. The semiconductor package of claim 6 , wherein the conductive vias are positioned adjacent and spaced apart from a side face of the semiconductor device and the at least one via-free zone is located adjacent an outer edge of the insulating layer. 8. The semiconductor package of claim 6 , wherein the first contact pad is arranged on the insulating layer and the conductive vias extend between the first contact pad and a first device contact pad arranged on a first major surface of the semiconductor device. 9. The semiconductor package of claim 6 , wherein the first contact pad is arranged on the semiconductor device and the conductive vias extend between the first contact pad and the lateral conductive layer positioned on the second major surface of the insulating layer. 10. The semiconductor package of claim 3 , further comprising: a device contact pad on a major surface of the semiconductor device, the device contact pad having a second area, a set of second via sites forming a two-dimensional array of a second pitch on the second area; and conductive vias extending through the insulating layer and located at a subset of the second via sites and such that the two-dimensional array includes at least one via-free zone in the two-dimensional array, the conductive vias extending between the device contact pad and a lateral conductive layer.

Assignees

Inventors

Classifications

  • Dispositions of multiple bond pads · CPC title

  • of bond pads · CPC title

  • Cross-sectional shapes or dispositions of interconnections · CPC title

  • by forming openings in the dielectric parts · CPC title

  • by filling conductive material into holes, grooves or trenches · CPC title

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What does patent US11444017B2 cover?
In an embodiment, a semiconductor package includes a semiconductor device embedded in an insulating layer, a contact pad having an area, and a vertical redistribution structure including substantially parallel vertical paths arranged in the insulating layer and extending perpendicular to the area of the contact pad. The substantially vertical paths are non-uniformly distributed over the area of…
Who is the assignee on this patent?
Infineon Technologies Austria Ag
What technology area does this patent fall under?
Primary CPC classification H10W20/42. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 13 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 7 related publications on this page (citations in our corpus or others sharing the same primary CPC).