Workpiece placement apparatus and processing apparatus

Patent metadata

Field	Value
Publication number	US-11410871-B2
Application number	US-201916293788-A
Country	US
Kind code	B2
Filing date	Mar 6, 2019
Priority date	Mar 7, 2018
Publication date	Aug 9, 2022
Grant date	Aug 9, 2022

Abstract

A placement apparatus for placing a workpiece is provided. The placement apparatus includes a stage on which a workpiece can be placed in a processing vessel; an edge ring including a locking part which is disposed on the stage so as to surround a periphery of the workpiece; a conductive connecting member connected with the edge ring at the locking part; and a first contacting member configured to cause the edge ring to contact the stage, while the edge ring is connected with the connecting member.

First claim

What is claimed is:

1. A placement apparatus for placing a workpiece in a processing vessel, the placement apparatus comprising:
a base disposed inside the processing vessel;
an electrostatic chuck disposed on the base and on which the workpiece can be placed;
an edge ring disposed on the electrostatic chuck so as to surround a periphery of the workpiece, the edge ring having a contact surface in contact with the electrostatic chuck;
an electrically conductive connecting member having a horizontal portion and electrically connected, at the horizontal portion, with the edge ring;
an insulating member separating the base into an inner portion and an outer portion electrically, wherein the outer portion is configured such that direct current voltage is applied to the outer portion;
a first contacting member being electrically conductive and configured to exert an elastic force; and
a second contacting member being electrically conductive and configured to exert an elastic force,
wherein the edge ring has a locking part on an outer circumferential side situated further out than the contact surface of the edge ring in contact with the electrostatic chuck, the locking part being a recess formed in the edge ring, the recess facing a lateral surface of the electrostatic chuck and housing the horizontal portion,
wherein the horizontal portion has a first recess in an upper surface or lower surface thereof, the first contacting member being disposed in the first recess,
wherein the edge ring and the horizontal portion are electrically connected to each other via the first contacting member,
wherein the electrically conductive connecting member has a vertical portion electrically connected to the horizontal portion and extending downward, and
wherein the vertical portion and the base are electrically connected to each other via the contacting member.

2. A processing apparatus comprising:
a processing vessel including a processing space for applying a process to a workpiece;
a base disposed inside the processing vessel;
an electrostatic chuck disposed on the base and on which the workpiece can be placed;
an edge ring disposed on the electrostatic chuck so as to surround a periphery of the workpiece, the edge ring having a contact surface in contact with the electrostatic chuck;
an electrically conductive connecting member having a horizontal portion and electrically connected, at the horizontal portion, with the edge ring;
a first contacting member being electrically conductive and configured to exert an elastic force; and
a second contacting member being electrically conductive and configured to exert an elastic force,
wherein the edge ring has a locking part on an outer circumferential side situated further out than the contact surface of the edge ring in contact with the electrostatic chuck, the locking part being a recess formed in the edge ring, the recess facing a lateral surface of the electrostatic chuck and housing the horizontal portion,
wherein the horizontal portion has a first recess in an upper surface or lower surface thereof, the first contacting member being disposed in the first recess,
wherein the edge ring and the horizontal portion are electrically connected to each other via the first contacting member,
wherein the electrically conductive connecting member has a vertical portion electrically connected to the horizontal portion and extending downward, and
wherein the vertical portion and the base are electrically connected to each other via the second contacting member.

3. A placement apparatus for placing a workpiece in a processing vessel, the placement apparatus comprising:
a base disposed inside the processing vessel;
an electrostatic chuck disposed on the base and on which the workpiece can be placed;
an edge ring disposed on the electrostatic chuck so as to surround a periphery of the workpiece, the edge ring having a contact surface in contact with the electrostatic chuck;
an electrically conductive connecting member having a horizontal portion and electrically connected, at the horizontal portion, with the edge ring;
a first contacting member being electrically conductive and configured to exert an elastic force; and
a second contacting member being electrically conductive and configured to exert an elastic force,
wherein the edge ring has a locking part on an outer circumferential side situated further out than the contact surface of the edge ring in contact with the electrostatic chuck, the locking part being a recess formed in the edge ring, the recess facing a lateral surface of the electrostatic chuck and housing the horizontal portion,
wherein the horizontal portion has a first recess in an upper surface or lower surface thereof, the first contacting member being disposed in the first recess,
wherein the edge ring and the horizontal portion are electrically connected to each other via the first contacting member,
wherein the electrically conductive connecting member has a vertical portion electrically connected to the horizontal portion and extending downward, and
wherein the vertical portion and the base are electrically connected to each other via the second contacting member.

4. The placement apparatus according to claim 3 , wherein the first contacting member is a ring-shaped member and is provided at an entire circumference of the edge ring.

5. The placement apparatus according to claim 3 , wherein the second contacting member is formed of a plurality of members, each of the plurality of members being provided separately.

6. The placement apparatus according to claim 3 , wherein the second contacting member is housed in a second recess formed in a lateral surface of the base.

7. The placement apparatus according to claim 6 , the locking part is recessed in a direction toward an outer circumference of the edge ring.

8. The placement apparatus according to claim 7 , wherein the locking part is a recess formed along an entire outer circumference of the edge ring and recessed in a direction toward an outer circumference of the edge ring.

9. The placement apparatus according to claim 6 , wherein the electrically conductive connecting member is fixed to the base with a fixing member attached to the vertical portion.

Assignees

• Tokyo Electron Ltd

Inventors

• Uchida Yohei
• Sugawa Naoki
• Abe Katsushi
• Hida Tsuyoshi

Classifications

• H10P72/7624

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P72/0441

  Apparatus for sealing, encapsulating, glassing, decapsulating or the like · CPC title

• H10P72/0434

  mainly by convection · CPC title

• H10P72/0421

  for drying etching · CPC title

• H10P72/72

  using electrostatic chucks · CPC title