Semiconductor memory device
US-2018076261-A1 · Mar 15, 2018 · US
US11264559B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11264559-B2 |
| Application number | US-201916262396-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 30, 2019 |
| Priority date | Jan 30, 2019 |
| Publication date | Mar 1, 2022 |
| Grant date | Mar 1, 2022 |
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A multilayered magnetic free layer structure is provided that includes a first magnetic free layer and a second magnetic free layer separated by a non-magnetic layer in which the second magnetic free layer is composed of a M1/M2 superlattice structure or a M1/M2 multilayer structure, wherein M1 is a first magnetic metal selected from the group consisting of cobalt (Co), iron (Fe) and alloys thereof, and M2 is a second magnetic metal selected from the group consisting of platinum (Pt), palladium (Pd), nickel (Ni), rhodium (Rh), iridium (Jr), rhenium (Re) and alloys thereof.
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What is claimed is: 1. A magnetic tunnel junction pillar for use in spin-transfer torque magnetic random access memory comprising: a multilayered magnetic free layer structure comprising a first magnetic free layer and a second magnetic free layer separated by a non-magnetic layer, wherein the second magnetic free layer is composed of a M 1 /M 2 superlattice structure, wherein M 1 is a first magnetic metal selected from the group consisting of cobalt (Co), iron (Fe) and alloys thereof, and M 2 is a second magnetic metal selected from the group consisting of iridium (Ir), rhenium (Re) and alloys thereof. 2. The magnetic tunnel junction pillar of claim 1 , wherein the second magnetic free layer is present beneath the first magnetic free layer. 3. The magnetic tunnel junction pillar of claim 1 , wherein the non-magnetic layer is composed of an amorphous non-magnetic material. 4. The magnetic tunnel junction pillar of claim 1 , wherein the first magnetic free layer has a BCC 001 texture, and the second magnetic free has a FCC 111 texture. 5. The magnetic tunnel junction pillar of claim 1 , further comprising a tunnel barrier layer located on a surface of the first magnetic free layer opposite a surface of the first magnetic free layer that forms an interface with the non-magnetic layer, and a magnetic reference layer located on a surface of the tunnel barrier layer that is opposite the surface of the tunnel barrier that forms an interface with the first magnetic free layer. 6. The magnetic tunnel junction pillar of claim 5 , further comprising a bottom electrode in direct physical contact with a surface of the second magnetic free layer, and a top electrode located above the magnetic reference layer. 7. A magnetic tunnel junction pillar for use in spin-transfer torque magnetic random access memory comprising: a multilayered magnetic free layer structure comprising a first magnetic free layer and a second magnetic free layer separated by a non-magnetic layer, wherein the second magnetic free layer is composed of a M 1 /M 2 superlattice structure, wherein M 1 is a first magnetic metal selected from the group consisting of iron (Fe) and alloys thereof, and M 2 is a second magnetic metal selected from the group consisting of palladium (Pd), nickel (Ni), iridium (Ir), rhenium (Re) and alloys thereof. 8. A magnetic tunnel junction pillar for use in spin-transfer torque magnetic random access memory comprising: a multilayered magnetic free layer structure comprising a first magnetic free layer and a second magnetic free layer separated by a non-magnetic layer, wherein the second magnetic free layer is composed of a M 1 /M 2 superlattice structure, wherein M 1 is a first magnetic metal selected from the group consisting of cobalt (Co) and alloys thereof, and M 2 is a second magnetic metal selected from the group consisting of rhodium (Rh), iridium (Ir), rhenium (Re) and alloys thereof.
Materials of the active region · CPC title
insulating or semiconductive spacer · CPC title
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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