Oxidation-resistant metallic tin
US-12129529-B2 · Oct 29, 2024 · US
High purity tin and method for manufacturing same
US11136680B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11136680-B2 |
| Application number | US-201916514554-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 17, 2019 |
| Priority date | Oct 19, 2015 |
| Publication date | Oct 5, 2021 |
| Grant date | Oct 5, 2021 |
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- Title
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Abstract
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Provided is a high purity tin (Sn) having an extremely low oxygen content. A high purity tin having a tin purity of 5N (99.999% by mass, provided that carbon, nitrogen, oxygen and hydrogen are excluded) or more, wherein the high purity tin has an oxygen content of less than 10 ppb by mass, as measured by elemental analysis using Dynamic-SIMS.
First claim
Opening claim text (preview).
What is claimed is: 1. A high purity tin having a tin purity of (99.999% by mass or more, excluding carbon, nitrogen, oxygen and hydrogen, wherein the high purity tin has an oxygen content of less than 10 ppb by mass, as measured by elemental analysis using Dynamic-SIMS. 2. The high purity tin according to claim 1 , wherein the high purity tin has a sulfur content of less than 0.1 ppm by mass, as measured by elemental analysis using GD-MS. 3. The high purity tin according to claim 2 , wherein the sulfur content is less than 0.01 ppm by mass, as measured by elemental analysis using GD-MS. 4. The high purity tin according to claim 1 , wherein the high purity tin has a carbon content of less than 10 ppb by mass, as measured by elemental analysis using Dynamic-SIMS. 5. A tin target material comprising the high purity tin according to claim 1 , used for generating EUV light in a lithographic EUV light source.
Assignees
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Classifications
the material containing metals as principal radiation-generating components · CPC title
- C25C1/14Primary
of tin · CPC title
Production of exposure light, i.e. light sources · CPC title
Refining by applying a vacuum · CPC title
Refining · CPC title
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- What does patent US11136680B2 cover?
- Provided is a high purity tin (Sn) having an extremely low oxygen content. A high purity tin having a tin purity of 5N (99.999% by mass, provided that carbon, nitrogen, oxygen and hydrogen are excluded) or more, wherein the high purity tin has an oxygen content of less than 10 ppb by mass, as measured by elemental analysis using Dynamic-SIMS.
- Who is the assignee on this patent?
- Jx Nippon Mining & Metals Corp
- What technology area does this patent fall under?
- Primary CPC classification C25C1/14. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Oct 05 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).