High purity tin and method for producing same
US-2019153607-A1 · May 23, 2019 · US
Oxidation-resistant metallic tin
US12129529B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12129529-B2 |
| Application number | US-202017287205-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 27, 2020 |
| Priority date | Mar 4, 2019 |
| Publication date | Oct 29, 2024 |
| Grant date | Oct 29, 2024 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
In the present invention, a high-purity metallic tin suitable for use in an EUV exposure device is provided through use of an oxidation-resistant metallic tin, the oxidation-resistant metallic tin containing 99.995 mass % or more of tin, and unavoidable impurities, and the thickness of an oxide film being 2.0 nm or less when the surface of a cut face of the oxidation-resistant metallic tin is measured by AES.
First claim
Opening claim text (preview).
The invention claimed is: 1. An oxidation-resistant metallic tin made by steps of an electrolytic refining process, heat treatment and then forging, wherein: the oxidation-resistant metallic tin comprises at least 99.995% by weight of tin, and inevitable impurities, the oxidation-resistant metallic tin has an oxide film on a surface of a cutting face of the oxidation-resistant metallic tin, and after the forging, a thickness of the oxide film on the surface of the cutting face as measured by AES, upon starting the measurement after atmospheric exposure for 72 hours immediately after cutting, is 2.0 nm or less but greater than zero nm. 2. The oxidation-resistant metallic tin according to claim 1 , wherein the thickness of the oxide film as measured by AES is 1.2 nm or less but greater than zero nm. 3. The oxidation-resistant metallic tin according to claim 1 , wherein the oxidation-resistant metallic tin comprises 99.999% by weight of tin, and inevitable impurities. 4. The oxidation-resistant metallic tin according to claim 1 , wherein as the inevitable impurities, the content of Mn is less than 0.005 ppm by weight, the content of Fe is less than 0.005 ppm by weight, the content of Sb is less than 0.5 ppm by weight, and the content of S is less than 0.01 ppm by weight. 5. An oxidation-resistant metallic tin packaging body obtained by vacuum-packing the oxidation-resistant metallic tin according to claim 1 . 6. An oxidation-resistant metallic tin packaging body obtained by vacuum-packing the oxidation-resistant metallic tin according to claim 2 . 7. An oxidation-resistant metallic tin packaging body obtained by vacuum-packing the oxidation-resistant metallic tin according to claim 3 . 8. An oxidation-resistant metallic tin packaging body obtained by vacuum-packing the oxidation-resistant metallic tin according to claim 4 .
Assignees
Inventors
Classifications
under vacuum · CPC title
of tin · CPC title
by dry processes · CPC title
Refining by applying a vacuum · CPC title
- C22C13/00Primary
Alloys based on tin · CPC title
Patent family
Related publications grouped by family.
External sources
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US12129529B2 cover?
- In the present invention, a high-purity metallic tin suitable for use in an EUV exposure device is provided through use of an oxidation-resistant metallic tin, the oxidation-resistant metallic tin containing 99.995 mass % or more of tin, and unavoidable impurities, and the thickness of an oxide film being 2.0 nm or less when the surface of a cut face of the oxidation-resistant metallic tin is m…
- Who is the assignee on this patent?
- Jx Nippon Mining & Metals Corp, Jx Advanced Metals Corp
- What technology area does this patent fall under?
- Primary CPC classification C22C13/00. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Oct 29 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).