Oxidation-resistant metallic tin

US2021381082A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2021381082-A1
Application numberUS-202017287205-A
CountryUS
Kind codeA1
Filing dateFeb 27, 2020
Priority dateMar 4, 2019
Publication dateDec 9, 2021
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

In the present invention, a high-purity metallic tin suitable for use in an EUV exposure device is provided through use of an oxidation-resistant metallic tin, the oxidation-resistant metallic tin containing 99.995 mass % or more of tin, and unavoidable impurities, and the thickness of an oxide film being 2.0 nm or less when the surface of a cut face of the oxidation-resistant metallic tin is measured by AES.

First claim

Opening claim text (preview).

1 . An oxidation-resistant metallic tin comprising at least 99.995% by weight of tin, and inevitable impurities, wherein the thickness of an oxide film as measured by AES on a surface of a cutting face is 2.0 nm or less. 2 . The oxidation-resistant metallic tin according to claim 1 , wherein the thickness of the oxide film on the surface of the cutting face as measured by AES upon starting the measurement after atmospheric exposure for 72 hours immediately after cutting is 2.0 nm or less. 3 . The oxidation-resistant metallic tin according to claim 1 , wherein the thickness of the oxide film as measured by AES is 1.2 nm or less. 4 . The oxidation-resistant metallic tin according to claim 1 , wherein the oxidation-resistant metallic tin comprises 99.999% by weight of tin, and inevitable impurities. 5 . The oxidation-resistant metallic tin according to claim 1 , wherein as the inevitable impurities, the content of Mn is less than 0.005 ppm, the content of Fe is less than 0.005 ppm, the content of Sb is less than 0.5 ppm, and the content of S is less than 0.01 ppm. 6 . An oxidation-resistant metallic tin packaging body obtained by vacuum-packing the oxidation-resistant metallic tin according to claim 1 . 7 . An oxidation-resistant metallic tin packaging body obtained by vacuum-packing the oxidation-resistant metallic tin according to claim 2 . 8 . An oxidation-resistant metallic tin packaging body obtained by vacuum-packing the oxidation-resistant metallic tin according to claim 3 . 9 . An oxidation-resistant metallic tin packaging body obtained by vacuum-packing the oxidation-resistant metallic tin according to claim 4 . 10 . An oxidation-resistant metallic tin packaging body obtained by vacuum-packing the oxidation-resistant metallic tin according to claim 5 .

Assignees

Inventors

Classifications

  • Refining by applying a vacuum · CPC title

  • by dry processes · CPC title

  • C22C13/00Primary

    Alloys based on tin · CPC title

  • of tin · CPC title

  • C25C7/04Primary

    Diaphragms; Spacing elements · CPC title

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What does patent US2021381082A1 cover?
In the present invention, a high-purity metallic tin suitable for use in an EUV exposure device is provided through use of an oxidation-resistant metallic tin, the oxidation-resistant metallic tin containing 99.995 mass % or more of tin, and unavoidable impurities, and the thickness of an oxide film being 2.0 nm or less when the surface of a cut face of the oxidation-resistant metallic tin is m…
Who is the assignee on this patent?
Jx Nippon Mining & Metals Corp
What technology area does this patent fall under?
Primary CPC classification C22C13/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Dec 09 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).