Method for no-silane electroless metal deposition using high adhesive catalyst and product therefrom

US11098407B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11098407-B2
Application numberUS-201916565824-A
CountryUS
Kind codeB2
Filing dateSep 10, 2019
Priority dateSep 21, 2015
Publication dateAug 24, 2021
Grant dateAug 24, 2021

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Abstract

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A method for electroless metal deposition and an electroless metal layer included substrate are provided. The method for electroless metal deposition includes steps as follows. a) cleaning a substrate, applying a hydrofluoric acid onto the substrate; and then applying a modifying agent onto the substrate to form a chemical oxide layer on the substrate; b) a catalyst layer is formed on the chemical oxide layer, wherein, the catalyst layer includes a plurality of colloidal nanoparticles, and each of the plurality of colloidal nanoparticles includes a palladium nanoparticle and a polymer which encapsulates the palladium nanoparticle, and c) depositing a metal on the catalyst layer through an electroless metal deposition to form an electroless metal layer.

First claim

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What is claimed is: 1. A method for electroless metal deposition, comprising: a) cleaning a substrate, applying a hydrofluoric acid onto the substrate, and then applying a modifying agent onto the substrate to form a chemical oxide layer on the substrate; b) forming a catalyst layer on the chemical oxide layer, wherein the catalyst layer includes a plurality of colloidal nanoparticles, and each of the plurality of colloidal nanoparticles includes a palladium nanoparticle and a polymer which encapsulates the palladium nanoparticle, and c) depositing a metal on the catalyst layer through an electroless metal deposition to form an electroless metal layer; wherein, the polymer and the palladium nanoparticle have a weight ratio of 0.5:1 to 2:1. 2. The method for electroless metal deposition as claimed in claim 1 , wherein in the step a), the modifying agent is selected from the group consisting of: ozone, nitrate, hydrofluoric acid, mixture of sulfuric acid and hydrogen peroxide, and mixture of nitrate and hydrofluoric acid. 3. The method for electroless metal deposition as claimed in claim 1 , wherein the protective agent is the polymer, and the precursor is a palladium ion. 4. The method for electroless metal deposition as claimed in claim 1 , wherein each of the plurality of colloidal nanoparticles has a particle size ranging from 6 nm to 10 nm. 5. The method for electroless metal deposition as claimed in claim 1 , wherein the polymer encapsulating the palladium nanoparticle is a polyvinyl alcohol polymer, a polyvinyl alcohol acid polymer, a poly(vinyl alcohol-co-ethylene) polymer, or a poly(vinyl butyral-co-vinyl alcohol-co-vinyl acetate) polymer. 6. The method for electroless metal deposition as claimed in claim 1 , wherein the polymer is a low-degree-polymerization polyvinyl alcohol polymer with a weight-average molecular weight ranging from 20000 to 30000. 7. The method for electroless metal deposition as claimed in claim 1 , wherein in the step c), the metal deposited on the catalyst layer in the electroless metal deposition is nickel or copper. 8. The method for electroless metal deposition as claimed in claim 1 , wherein the colloidal nanoparticles is formed by reacting a precursor, a protective agent, and a reducing agent in an alkaline environment. 9. The method for electroless metal deposition as claimed in claim 8 , wherein the precursor is a palladium ion, the protective agent is the polymer, and the reducing agent is a formaldehyde solution. 10. The method for electroless metal deposition as claimed in claim 8 , wherein the precursor is at least one palladium nanoparticle, the protective agent is at least one polymer, and the at least one polymer encapsulates the at least one palladium nanoparticle to form at least one colloidal nanoparticle. 11. The method for electroless metal deposition as claimed in claim 10 , wherein the at least one polymer encapsulating the at least one palladium nanoparticle is a polyvinyl alcohol polymer, a polyvinyl alcohol acid polymer, a poly(vinyl alcohol-co-ethylene) polymer, or a poly(vinyl butyral-co-vinyl alcohol-co-vinyl acetate) polymer. 12. A method for metal deposition, comprising: a) cleaning a substrate, applying a hydrofluoric acid onto the substrate, and then applying a modifying agent onto the substrate to form a chemical oxide layer on the substrate; b) forming a catalyst layer on the chemical oxide layer, wherein the catalyst layer includes a plurality of colloidal nanoparticles, and each of the plurality of colloidal nanoparticles includes a palladium nanoparticle and a polymer which encapsulates the palladium nanoparticle, and d) conducting an electroless metal deposition to form a metal layer on the catalyst layer; wherein, the polymer and the palladium nanoparticle have a weight ratio of 0.5:1 to 2:1. 13. The method of claim 12 , wherein the step d) further includes conducting an electro-plating process to increase the thickness of the metal layer. 14. The method of claim 12 , wherein the step b) further includes using the polymer and a palladium ion to form the catalyst layer on the chemical oxide layer. 15. An electroless metal layer included substrate, comprising: a chemical oxide layer formed on a surface of a substrate by cleaning the substrate, applying a hydrofluoric acid onto the substrate, and then applying a modifying agent onto the substrate; a catalyst layer disposed on the chemical oxide layer, and the catalyst layer including a plurality of colloidal nanoparticles, and each of the plurality of colloidal nanoparticles including a palladium nanoparticle and a polymer which encapsulates the palladium nanoparticle, and an electroless metal layer formed by conducting an electroless metal deposition to deposit a metal on the catalyst layer; wherein, the polymer and the palladium nanoparticle have a weight ratio of 0.5:1 to 2:1. 16. The electroless metal layer included substrate as claimed in claim 15 , wherein each of the plurality of colloidal nanoparticles has a particle size ranging from 6 nm to 10 nm. 17. The electroless metal layer included substrate as claimed in claim 15 , wherein the polymer encapsulating the palladium nanoparticle includes a polyvinyl alcohol polymer, a polyvinyl alcohol acid polymer, a poly(vinyl alcohol-co-ethylene) polymer, or a poly(vinyl butyral-co-vinyl alcohol-co-vinyl acetate) polymer. 18. The electroless metal layer included substrate as claimed in claim 15 , wherein the polymer is a low-degree-polymerization polyvinyl alcohol polymer with its weight-average molecular weight ranging from 20,000 to 30,000. 19. The electroless metal layer included substrate as claimed in claim 15 , wherein the metal includes nickel or copper.

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What does patent US11098407B2 cover?
A method for electroless metal deposition and an electroless metal layer included substrate are provided. The method for electroless metal deposition includes steps as follows. a) cleaning a substrate, applying a hydrofluoric acid onto the substrate; and then applying a modifying agent onto the substrate to form a chemical oxide layer on the substrate; b) a catalyst layer is formed on the chemi…
Who is the assignee on this patent?
Univ Nat Tsing Hua
What technology area does this patent fall under?
Primary CPC classification C23C18/1893. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 24 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).