Magnetized substrate carrier apparatus with shadow mask for deposition

Patent metadata

Field	Value
Publication number	US-11056277-B2
Application number	US-201916289328-A
Country	US
Kind code	B2
Filing date	Feb 28, 2019
Priority date	Dec 28, 2018
Publication date	Jul 6, 2021
Grant date	Jul 6, 2021

Abstract

Methods and apparatus for a magnetized substrate carrier apparatus are described herein. In some embodiments, a substrate carrier apparatus includes: a carrier plate having a support surface to support a substrate, a mask assembly disposed above the support surface, wherein the mask assembly includes an annular frame and a shadow mask disposed within the annular frame, and wherein the shadow mask includes one or more openings arranged in a predetermined pattern and disposed through the shadow mask, and one or more magnets disposed on or embedded within at least one of the carrier plate and the shadow mask to create a magnetic field above the support surface.

First claim

The invention claimed is:

1. A substrate carrier apparatus, comprising:
a carrier plate having a support surface to support a substrate;
a mask assembly disposed above the support surface, wherein the mask assembly includes an annular frame and a shadow mask disposed within the annular frame, wherein the annular frame includes a lip extending radially inwardly and an inner portion of the lip is coupled to an outermost portion of the shadow mask, wherein a radially inner surface of the lip is sloped in a radially inward and downward direction, and wherein the shadow mask includes one or more openings arranged in a predetermined pattern and disposed through the shadow mask; and
one or more magnets disposed on or embedded within at least one of the carrier plate or the shadow mask to create a magnetic field above the support surface.

2. The substrate carrier apparatus of claim 1 , wherein the one or more magnets are disposed on or embedded within the shadow mask.

3. The substrate carrier apparatus of claim 1 , wherein the one or more magnets provide a magnetic field strength at a substrate surface level above the support surface of about 10 Oersteds to about 5000 Oersteds.

4. The substrate carrier apparatus of claim 1 , wherein the carrier plate and the shadow mask are magnetized to opposite poles.

5. The substrate carrier apparatus of claim 1 , further comprising a flexure element including elastomeric members or a plurality of springs and having a first end coupled to the annular frame and a second end coupled to the carrier plate, the flexure element configured to compensate for thickness variations of the substrate.

6. The substrate carrier apparatus of claim 1 , wherein the magnetic field is substantially perpendicular to the support surface at a substrate surface level above the support surface.

7. The substrate carrier apparatus of claim 1 , wherein the support surface is configured to support the substrate having a given diameter and wherein the outermost sidewall of the shadow mask has a diameter less than the given diameter.

8. The substrate carrier apparatus of claim 1 , wherein an upper surface of the carrier plate is substantially planar.

9. The substrate carrier apparatus of claim 1 , wherein a lowermost surface of the annular frame is disposed vertically above the support surface.

10. A process chamber, comprising:
a chamber body covered by a lid;
a target disposed within the chamber body adjacent the lid;
a substrate support disposed within the chamber body opposite the target; and
a substrate carrier apparatus retained on the substrate support, wherein the substrate carrier apparatus includes a carrier plate having a support surface to support a substrate and a shadow mask disposed above the carrier plate and within an annular frame, wherein the annular frame includes a lip extending radially inwardly and an inner portion of the lip is coupled to an outermost portion of the shadow mask, wherein a radially inner surface of the lip is sloped in a radially inward and downward direction, and wherein one or more magnets are disposed on or embedded within the substrate carrier apparatus to create a magnetic field above the support surface.

11. The process chamber of claim 10 , wherein the carrier plate and the shadow mask are magnetized to opposite poles.

12. The process chamber of claim 10 , wherein the one or more magnets provide a magnetic field strength at a substrate surface level above the support surface of about 10 Oersteds to about 5000 Oersteds.

13. The process chamber of claim 10 , wherein the substrate carrier apparatus comprises the annular frame coupled to the carrier plate and the shadow mask.

14. The process chamber of claim 10 , wherein the magnetic field is substantially perpendicular to the support surface at a substrate surface level above the support surface.

15. A substrate carrier apparatus, comprising:
a carrier plate having a support surface to support a substrate, wherein the support surface is textured to minimize the substrate from moving along the support surface;
a mask assembly disposed above the support surface, wherein the mask assembly includes an annular frame and a shadow mask disposed within the annular frame, wherein the annular frame includes a lip extending radially inwardly and an inner portion of the lip is coupled to an outermost portion of the shadow mask, and wherein the shadow mask includes one or more openings arranged in a predetermined pattern and disposed through the shadow mask; and
one or more magnets disposed on or embedded within at least one of the carrier plate or the shadow mask to create a magnetic field above the support surface.

16. The substrate carrier apparatus of claim 15 , wherein a radially inner surface of the lip is sloped in a radially inward and downward direction.

17. The substrate carrier apparatus of claim 15 , wherein the lip of the annular frame and the carrier plate are configured to support the substrate therebetween.

18. The substrate carrier apparatus of claim 15 , wherein the substrate has a given diameter and wherein the shadow mask has an outer diameter less than the given diameter.

19. The substrate carrier apparatus of claim 15 , wherein the carrier plate and the shadow mask are magnetized to opposite poles.

20. The substrate carrier apparatus of claim 15 , further comprising a flexure element including elastomeric members or a plurality of springs and having a first end coupled to the annular frame and a second end coupled to the carrier plate, the flexure element configured to compensate for thickness variations of the substrate.

Assignees

• Applied Materials Inc

Inventors

• Diehl Daniel Lee
• Lerner Alexander
• Shaviv Roey

Classifications

• B32B3/00

  Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form · CPC title

• C23C14/042 Primary

  using masks · CPC title

• H01F41/18

  by cathode sputtering · CPC title

• C23C14/165

  by cathodic sputtering · CPC title

• C23C14/50

  Substrate holders · CPC title