Plasma processing apparatus and plasma processing method

Patent metadata

Field	Value
Publication number	US-10847348-B2
Application number	US-201916699953-A
Country	US
Kind code	B2
Filing date	Dec 2, 2019
Priority date	Dec 3, 2018
Publication date	Nov 24, 2020
Grant date	Nov 24, 2020

Abstract

A plasma processing apparatus includes a processing vessel, a lower electrode, an annular member, an inner upper electrode, an outer upper electrode, a processing gas supply, a first high frequency power supply and a first DC power supply. The lower electrode is configured to place a processing target substrate. The annular member is disposed on an outer peripheral portion of the lower electrode. The inner upper electrode is disposed to face the lower electrode. The outer upper electrode is disposed at an outside of the inner upper electrode. The first high frequency power supply applies a first high frequency power. The first DC power supply applies a first variable DC voltage to the outer upper electrode. At least a part of a surface of the outer upper electrode exposed to the processing space is located higher than a surface of the inner upper electrode exposed to the processing space.

First claim

We claim:

1. A plasma processing apparatus, comprising:
a processing vessel configured to be evacuated;
a lower electrode configured to place a processing target substrate within the processing vessel;
an annular member disposed on an outer peripheral portion of the lower electrode;
an inner upper electrode disposed to face the lower electrode within the processing vessel;
an outer upper electrode disposed in a ring shape at an outside of the inner upper electrode in a radial direction thereof within the processing vessel, the outer upper electrode being electrically insulated from the inner upper electrode;
a processing gas supply configured to supply a processing gas into a processing space between the inner upper electrode and the outer upper electrode and the lower electrode;
a first high frequency power supply configured to apply, to the lower electrode or to the inner upper electrode and the outer upper electrode, a first high frequency power for forming plasma from the processing gas by a high frequency discharge;
a first DC power supply configured to apply a first variable DC voltage to the outer upper electrode;
a clamp member configured to hold the outer upper electrode; and
a grounding member disposed closer to the processing space than the clamp member is,
wherein at least a part of a surface of the outer upper electrode exposed to the processing space is located higher than a surface of the inner upper electrode exposed to the processing space.

2. The plasma processing apparatus of claim 1 ,
wherein an outer peripheral portion of the outer upper electrode has a taper shape protruding toward the processing space as it goes outwards in a diametrical direction.

3. The plasma processing apparatus of claim 1 ,
wherein an outer peripheral portion of the inner upper electrode has a taper shape getting farther from the processing space as it goes outwards in a diametrical direction.

4. The plasma processing apparatus of claim 1 ,
wherein an outer diameter of the annular member is in a range from 360 mm to 380 mm.

5. The plasma processing apparatus of claim 1 , further comprising:
a second DC power supply configured to apply a second variable DC voltage to the inner upper electrode.

6. The plasma processing apparatus of claim 1 , further comprising:
a second high frequency power supply configured to apply, to the lower electrode, a second high frequency power for attracting an ion in plasma into the processing target substrate.

7. A plasma processing method performed by a plasma processing apparatus as claimed in claim 1 ,
wherein a peak of an electron density in a plasma processing is formed at a position above an edge of the processing target substrate or a position at an outside of the edge of the processing target substrate in a diametrical direction.

8. The plasma processing apparatus of claim 2 ,
wherein an outer peripheral portion of the inner upper electrode has a taper shape getting farther from the processing space as it goes outwards in a diametrical direction.

9. The plasma processing apparatus of claim 8 ,
wherein the outer upper electrode has a recess having a bottom surface recessed approximately 3 mm from the surface of the inner upper electrode.

10. The plasma processing apparatus of claim 9 ,
wherein an outer diameter of the annular member is in a range from 360 mm to 380 mm.

11. The plasma processing apparatus of claim 10 , further comprising:
a second DC power supply configured to apply a second variable DC voltage to the inner upper electrode.

12. The plasma processing apparatus of claim 11 , further comprising:
a second high frequency power supply configured to apply, to the lower electrode, a second high frequency power for attracting an ion in plasma into the processing target substrate.

13. A plasma processing apparatus, comprising:
a processing vessel configured to be evacuated;
a lower electrode configured to place a processing target substrate within the processing vessel;
an annular member disposed on an outer peripheral portion of the lower electrode;
an inner upper electrode disposed to face the lower electrode within the processing vessel;
an outer upper electrode disposed in a ring shape at an outside of the inner upper electrode in a radial direction thereof within the processing vessel, the outer upper electrode being electrically insulated from the inner upper electrode;
a processing gas supply configured to supply a processing gas into a processing space between the inner upper electrode and the outer upper electrode and the lower electrode;
a first high frequency power supply configured to apply, to the lower electrode or to the inner upper electrode and the outer upper electrode, a first high frequency power for forming plasma from the processing gas by a high frequency discharge; and
a first DC power supply configured to apply a first variable DC voltage to the outer upper electrode,
wherein at least a part of a surface of the outer upper electrode exposed to the processing space is located higher than a surface of the inner upper electrode exposed to the processing space, and
wherein the outer upper electrode has a recess having a bottom surface recessed about approximately 3 mm from the surface of the inner upper electrode.

14. The plasma processing apparatus, comprising:
a plasma processing chamber;
a susceptor disposed in the plasma processing chamber and having a substrate supporting region and an annular region that surrounds the substrate supporting region;
a ring disposed on the annular region of the susceptor;
an upper electrode disposed above the susceptor, a plasma processing space being defined between the susceptor and the upper electrode, the upper electrode including an inner electrode and an outer electrode surrounding the inner electrode, the outer electrode being electrically insulated from the inner electrode, the inner electrode having an inner exposed surface exposed to the plasma processing space, the outer electrode having an outer exposed surface exposed to the plasma processing space, at least a part of the outer exposed surface being disposed above the inner exposed surface;
a first DC power supply configured to apply a first variable DC voltage to the outer electrode;
a clamp holding the outer electrode; and
a grounding block disposed adjacent to a bottom surface and an outer side surface of the clamp.

15. The plasma processing apparatus of claim 14 ,
wherein the outer exposed surface has an outwardly tapering protrusion in a radial direction.

16. The plasma processing apparatus of claim 15 ,
wherein the inner exposed surface has an inwardly tapering protrusion in the radial direction.

17. The plasma processing apparatus of claim 14 ,
wherein the outer exposed surface has an annular surface at a level approximately 3 mm above the inner exposed surface.

Assignees

• Tokyo Electron Ltd

Inventors

• Tsukahara Toshiya
• Yamabe Shuhei
• Yachi Kota
• Sato Tetsuji
• Uchida Yohei
• Suzuki Ayuta
• Tamura Yosuke
• Hanaoka Hidetoshi
• Sasaki Junichi

Classifications

• H10P50/242 Primary

  of Group IV materials · CPC title

• H01J37/32623

  Mechanical discharge control means · CPC title

• H01J37/32541 Primary

  Shape · CPC title

• H01J37/3244

  Gas supply means · CPC title

• H01J37/32577

  Electrical connecting means · CPC title