Substrate drying apparatus, facility of manufacturing semiconductor device, and method of drying substrate

Patent metadata

Field	Value
Publication number	US-10825698-B2
Application number	US-201715845236-A
Country	US
Kind code	B2
Filing date	Dec 18, 2017
Priority date	Jun 15, 2017
Publication date	Nov 3, 2020
Grant date	Nov 3, 2020

Abstract

Disclosed are a substrate drying apparatus, a facility of manufacturing a semiconductor device, and a method of drying a substrate. The substrate drying apparatus includes a chamber that is configured to dry a substrate at a first temperature, a first reservoir that is configured to store a first supercritical fluid at a second temperature that is less than the first temperature, a second reservoir that is configured to store a second supercritical fluid at a third temperature that is greater than the first temperature, and a supply unit connected between the chamber and the first reservoir and/or second reservoir. The supply unit is configured to supply the chamber with the first supercritical fluid and second supercritical fluid.

First claim

What is claimed is:

1. A substrate drying apparatus, comprising:
a chamber configured to dry a substrate at a first temperature;
a first reservoir configured to store a first supercritical fluid having a second temperature that is less than the first temperature;
a second reservoir configured to store a second supercritical fluid having a third temperature that is greater than the first temperature;
a supply unit, connected between the chamber and the first reservoir and/or the second reservoir; and
a third reservoir configured to store a third supercritical fluid at the first temperature,
wherein the supply unit is configured to supply the first supercritical fluid and/or the second supercritical fluid into the chamber.

2. The apparatus of claim 1 , wherein the supply unit is configured to sequentially supply the first and second supercritical fluids to increase a pressure in the chamber.

3. The apparatus of claim 2 , wherein, when the pressure of the chamber reaches a critical point of the first supercritical fluid, the supply unit is configured to provide the chamber with the second supercritical fluid.

4. The apparatus of claim 3 , wherein, when the second temperature is 31.1° C., the critical point is 72 bar.

5. The apparatus of claim 1 , wherein the first temperature is in a range between 40° C. to 80° C.

6. The apparatus of claim 1 , wherein, when the second supercritical fluid reaches a pressure associated with a saturation duration, the supply unit provides the chamber with the third supercritical fluid.

7. The apparatus of claim 6 , wherein the pressure associated with the saturation duration is 150 bar.

8. The apparatus of claim 1 , wherein the supply unit comprises:
supply lines connecting the chamber to the first reservoir and/or second reservoir;
valves engaged with corresponding ones of the supply lines and controlling corresponding supplies of the first supercritical fluid and/or second supercritical fluid; and
filters engaged with corresponding ones of the supply lines, wherein the filters are configured to filter pollutions in the first supercritical fluid and/or second supercritical fluid.

9. The apparatus of claim 8 , wherein one of the filters comprises a metal sintering filter.

10. A facility for manufacturing a semiconductor device, comprising:
a substrate polishing apparatus that is configured to polish a substrate;
a substrate cleaning apparatus that is configured to clean the substrate; and
a substrate drying apparatus that is configured to dry the substrate,
wherein the substrate drying apparatus comprises:
a chamber that is configured to dry the substrate at a first temperature;
a first reservoir that is configured to store a first supercritical fluid at a second temperature that is less than the first temperature;
a second reservoir that is configured to store a second supercritical fluid at a third temperature that is greater than the first temperature;
a supply unit that is connected between the chamber and the first reservoir and/or the second reservoir; and
a third reservoir configured to store a third supercritical fluid at the first temperature,

wherein the supply unit is configured to provide the chamber with the first supercritical fluid and/or the second supercritical fluid.

11. The facility of claim 10 , wherein the substrate cleaning apparatus uses isopropyl alcohol to rinse the substrate,
wherein the first temperature is less than an evaporation temperature of the isopropyl alcohol.

12. The facility of claim 11 , wherein the first temperature is in a range between 40° C. to 80° C.

13. The facility of claim 12 , wherein the second temperature is in a range between 30° C. to 39° C.

14. The facility of claim 12 , wherein the third temperature is in a range between 100° C. to 200° C.

15. A substrate treatment apparatus, comprising:
a process chamber comprising a space where at least one supercritical fluid of a plurality of supercritical fluids is used to treat a substrate; and
a supercritical fluid supply unit that is configured to supply the process chamber with the at least one supercritical fluid,
wherein the supercritical fluid supply unit comprises:
a plurality of supercritical fluid reservoirs that store respective ones of the plurality of supercritical fluids, wherein the plurality of supercritical fluids have different temperatures from each other; and
a supercritical fluid supply line that connects the process chamber to the plurality of supercritical fluid reservoirs,

wherein a first supercritical fluid reservoir of the plurality of supercritical fluid reservoirs comprises:
a supercritical storage tank comprising an embedded heater; and
a detection sensor configured to detect an inner pressure and/or an inner temperature of the supercritical storage tank.

16. The substrate treatment apparatus of claim 15 , wherein the embedded heater comprises:
a first embedded heater embedded in a lateral sidewall of the supercritical storage tank; and
a second embedded heater attached to an inner wall of the supercritical storage tank.

17. The substrate treatment apparatus of claim 15 , wherein the supercritical fluid supply line comprises:
a plurality of front supply lines connected to respective ones of the plurality of supercritical fluid reservoirs;
a connection line commonly connected to each of the plurality of front supply lines; and
a plurality of rear supply lines that are branched from the connection line and are each connected to the process chamber.

18. The substrate treatment apparatus of claim 17 , wherein the supercritical fluid supply unit further comprises:
a plurality of temperature control devices connected to respective ones of the plurality of rear supply lines,
wherein each of the plurality of temperature control devices comprises one or more of a heating device and/or one or more of a cooling device.

Assignees

• Samsung Electronics Co Ltd

Inventors

• Cho Yong-Jhin
• Kim Young-Hoo
• Jeong Jihoon
• Kim Yungjun
• Lee Kuntack

Classifications

• H10P72/0472

  comprising at least one polishing chamber · CPC title

• H10P72/0411

  for wet cleaning or washing · CPC title

• H10P72/0602

  Temperature monitoring · CPC title

• H10P72/0456

  in-line arrangement · CPC title

• H10P72/0434

  mainly by convection · CPC title