Compositions and methods that promote charge complexing copper protection during low pKa driven polymer stripping

US10613442B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10613442-B2
Application numberUS-201615554578-A
CountryUS
Kind codeB2
Filing dateMar 11, 2016
Priority dateMar 12, 2015
Publication dateApr 7, 2020
Grant dateApr 7, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention is a charge complexing chemical composition that protects metal during polymer removal. The polymer coatings include crosslinked systems by chemical-amplification and photoacid generated (PAG) means as in epoxies. The system includes a solvent, a charge complexing additive, and an acid that creates a protective complex for sensitive metals during the dissolving and rinsing practice needed for processing microelectronic parts. The composition can be utilized with a method for removing partial and fully cured crosslinked coatings that originate from chemical amplification or PAG-epoxy photoimageable coatings.

First claim

Opening claim text (preview).

The invention claimed is: 1. A composition that creates a charge complex with metals as a means of protection during a polymer coating removal process, comprising: a solvent; an organic acid having a pKa<3; and an additive exhibiting charge complexing character, wherein said organic acid is one or more substituted or unsubstituted alkylarylsulfonic acids, and wherein said additive exhibiting charge complexing character comprises rosin esters. 2. The composition according to claim 1 , wherein said solvent is tetrahydrofurfuryl alcohol (THFA). 3. The composition according to claim 2 , wherein THFA is present at concentrations of >40% w/w. 4. The composition according to claim 1 , wherein the organic acid includes dodecylbenzenesulfonic acid. 5. The composition according to claim 4 , wherein the dodecylbenzenesulfonic acid is present at concentrations of 0.25-1 molar. 6. The composition according to claim 1 , wherein said additive exhibiting charge complexing character further comprises a dicarboxylic acid. 7. The composition according to claim 6 , wherein said dicarboxylic acid is selected from the group consisting of oxalic acid, maleic acid, succinic acid, fumaric acid, phthalic acid, isopthalic acid, and salicylic acid. 8. The composition according to claim 6 , wherein the dicarboxylic acid is present at 0.1-15% w/w. 9. The composition according to claim 1 , wherein the rosin ester exhibits a total acid number (TAN)≥100. 10. The composition according to claim 1 , wherein said additive exhibiting charge complexing character further comprises one or more of fumaric acid, citraconic acid, mesaconic acid, aconitic acid, itaconic acid, maleic acid anhydride, fumarated rosins, maleated rosins, resin modified phenol rosins, tall oil resins, terpene resins, and resin modified acid phenol resins. 11. The composition according to claim 10 , wherein said additive exhibiting charge complexing character is a fumaric modified rosin ester. 12. The composition according to claim 11 , wherein the fumaric modified rosin ester is present at 0.1-15% w/w. 13. A method for removing polymers which cure by chemically amplified or photoacid generated (PAG) means to produce a coating on a substrate, comprising: applying said composition of claim 1 to said coating utilizing a sprayer, an immersion bath or chamber; exposing said composition directly on said coating for a predetermined period of time at a predetermined temperature; and rinsing and drying said exposed substrate. 14. The method according to claim 13 , wherein said period of time is less than 30 minutes. 15. The method according to claim 13 , wherein said temperature is 20° C. to 100° C. 16. The method according to claim 13 , wherein said coatings are utilized in microelectronics fabrication and semiconductor production.

Assignees

Inventors

Classifications

  • G03F7/426Primary

    containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides · CPC title

  • for coatings strippable as coherent films, e.g. temporary coatings strippable as coherent films · CPC title

  • copper or alloys of copper · CPC title

  • organic inhibitors · CPC title

  • containing oxygen-containing compounds · CPC title

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What does patent US10613442B2 cover?
The present invention is a charge complexing chemical composition that protects metal during polymer removal. The polymer coatings include crosslinked systems by chemical-amplification and photoacid generated (PAG) means as in epoxies. The system includes a solvent, a charge complexing additive, and an acid that creates a protective complex for sensitive metals during the dissolving and rinsing…
Who is the assignee on this patent?
Az Electronic Mat Luxembourg Sarl, Merck Patent Gmbh
What technology area does this patent fall under?
Primary CPC classification G03F7/426. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 07 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).