Compositions for removing photoresist
US-2018267409-A1 · Sep 20, 2018 · US
containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F7/426 |
| Official title | {containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides} |
| Display label | containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides |
| Total patents | 233 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 15 |
| 2016 | 21 |
| 2017 | 13 |
| 2018 | 21 |
| 2019 | 18 |
| 2020 | 24 |
| 2021 | 20 |
| 2022 | 34 |
| 2023 | 16 |
| 2024 | 27 |
| 2025 | 18 |
| 2026 | 6 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivation
US-10073351-B2 · Sep 11, 2018 · US
Organic light emitting diode display device
US-10069112-B2 · Sep 4, 2018 · US
Methods of manufacturing semiconductor devices using a composition for removing photoresist and methods of removing photoresist from a semiconductor substrate
US-10025192-B2 · Jul 17, 2018 · US
Composition for removing resist
US-2018195030-A1 · Jul 12, 2018 · US
Fluorinated surfactant containing compositions
US-10017713-B2 · Jul 10, 2018 · US
Cleaning compositions for removing post etch residue
US-2018148669-A1 · May 31, 2018 · US
Stripper composition for removing photoresists and method for stripping photoresists using the same
US-9983481-B2 · May 29, 2018 · US
Resist stripper and resist stripping method
US-2018143531-A1 · May 24, 2018 · US
Cleaning formulations
US-2018105774-A1 · Apr 19, 2018 · US
Metal-compound-removing solvent and method in lithography
US-2018040474-A1 · Feb 8, 2018 · US
Cleaning formulations for removing residues on surfaces
US-9834746-B2 · Dec 5, 2017 · US
Stripping compositions for removing photoresists from semiconductor substrates
US-2017335252-A1 · Nov 23, 2017 · US
Process for producing structured coatings
US-2017305784-A1 · Oct 26, 2017 · US
Fluorinated surfactant containing compositions
US-2017283740-A1 · Oct 5, 2017 · US
Surfactants and methods of making and using same
US-9725683-B2 · Aug 8, 2017 · US
Stripper composition for removing photoresists and method for stripping photoresists using the same
US-2017115573-A1 · Apr 27, 2017 · US
Surfactants and methods of making and using same
US-2017114308-A1 · Apr 27, 2017 · US
Compositions containing chlorofluoroolefins or fluoroolefins
US-2017073558-A1 · Mar 16, 2017 · US
Compositions containing chlorofluoroolefins or fluoroolefins
US-9586071-B2 · Mar 7, 2017 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F7/426?
- CPC G03F7/426 is the Cooperative Patent Classification code for “containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides.”
- How many patents are filed under CPC G03F7/426 (containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides)?
- Our database includes 233 publications tagged with this CPC code.
- Is patent activity under CPC G03F7/426 growing?
- Publication counts under this code: 27 in 2024 vs 18 in 2025 (latest complete years).