Surfactants and methods of making and using same

Patent metadata

Field	Value
Publication number	US-2016376533-A1
Application number	US-201615262678-A
Country	US
Kind code	A1
Filing date	Sep 12, 2016
Priority date	Jan 29, 2013
Publication date	Dec 29, 2016
Grant date	—

Abstract

Anionic surfactants have a formula:
R f SO 2 N(H)—CH 2 CH(CH 3 )OH; or R f SO 2 N(H)—(CH 2 CH 2 O) x H, where x is an integer from 2-6. R f is a fluoroalkyl group having 3 to 8 carbon atoms. Neutral surfactants having a formula: (a)R f SO 2 N[CH 2 CH(CH 3 )OH] 2 ; (b)R f SO 2 N[CH 2 CH(CH 3 )OH][(CH 2 CH 2 O) n H], where n is an integer from 1-6; (c)R f SO 2 N(R)[(CH 2 CH 2 O) p H], where p is an integer from 2-6, and R is an alkyl group having 1 to 4 carbon atoms; or (d) R f SO 2 N[(CH 2 CH 2 O) q H][(CH 2 CH 2 O) m H], where q is an integer from 1-6 and m is an integer from 3-6. R f is a fluoroalkyl group having 3 to 8 carbon atoms.

First claim

1 . A fluorinated sulfonamide surfactant composition comprising:
a neutral surfactant according to the formula:
R f SO 2 N[CH 2 CH(CH 3 )OH] 2 ;
R f SO 2 N[CH 2 CH(CH 3 )OH][(CH 2 CH 2 O) n H], where n is an integer from 1-6;
or
R f SO 2 N[(CH 2 CH 2 O) q H][(CH 2 CH 2 O) m H], where q is an integer from 1-6, m is an integer from 1-6, and (q+m)≧3; and a solvent comprising water; wherein R f is a fluoroalkyl group having 3 to 8 carbon atoms.

2 - 4 . (canceled)

5 . A composition according to claim 1 , wherein m is an integer ≦3.

6 . A composition according to claim 1 , wherein m is 3.

7 . A composition according to claim 1 , wherein the fluoroalkyl group is saturated.

8 . A composition according to claim 1 , wherein the fluoroalkyl group is straight chain.

9 . A composition according to claim 1 , wherein the fluoroalkyl group is a perfluoroalkyl group.

10 . A composition according to claim 1 , wherein the fluoroalkyl group has 4 to 6 carbon atoms.

11 . A composition according to claim 1 , wherein the fluoroalkyl group is a saturated perfluoroalkyl group having 4 to 6 carbon atoms.

12 . A composition according to claim 1 , wherein the fluoroalkyl group is a saturated perfluoroalkyl group having 4 carbon atoms.

13 . A composition according to claim 1 , wherein the neutral surfactant includes at least one oligomeric ethylene oxide group bonded to the sulfonamide nitrogen atom, wherein the oligomeric ethylene oxide group has 2-6 ethylene oxide repeat units.

14 . (canceled)

15 . A method of treating a surface of a photoresist material, the method comprising:
exposing the photoresist material to a composition according to claim 1 .

Assignees

• 3M Innovative Properties Co

Inventors

• Lamanna William M
• Savu Patricia M
• Kehren Jason M

Classifications

• G03F7/426

  containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides · CPC title

• C11D1/004 Primary

  Surface-active compounds containing F · CPC title

• C11D11/0047 Primary

  Chemistry & Metallurgy · mapped topic

• C08F14/18

  Monomers containing fluorine · CPC title

• G03F7/42

  Stripping or agents therefor · CPC title