Method of duplicating texture and pattern of natural material using low temperature embossing process

US10500783B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10500783-B2
Application numberUS-201615363700-A
CountryUS
Kind codeB2
Filing dateNov 29, 2016
Priority dateJun 22, 2016
Publication dateDec 10, 2019
Grant dateDec 10, 2019

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  1. Title

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  5. First independent claim

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  7. Citations and related patents

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Abstract

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A method of duplicating texture and pattern of a natural material using a low temperature embossing process is provided. More particularly, in the method of duplicating texture and pattern of a natural material using a low temperature embossing process, a polymer resin having low glass transition temperature is coated on a surface of the natural material and then low temperature embossing process is performed thereon at a specific temperature and a specific pressure to duplicate a distinct texture and a fine pattern of the natural material as they are, thereby improving luxurious and aesthetic properties and achieving a large area and mass production, such that it may be applied to interior and exterior materials of a car, a case of a cellular phone and a laptop, home appliances, or the like.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of duplicating texture and pattern of a natural material using a low temperature embossing process, comprising: (a) forming a first polymer film by coating a first polymer resin having a glass transition temperature of 80 to 90° C. on the natural material; (b) duplicating the texture and pattern of the natural material on the first polymer film by performing first low temperature embossing process on the natural material formed with the first polymer film; (c) separating the natural material and the first polymer film; and (d) forming a metal mold to which the texture and pattern of the first polymer film is duplicated by electroplating metal on the first polymer film to which the texture and pattern are duplicated, wherein the natural material includes natural silk, silk, or leather, wherein the first polymer resin is polyvinylchloride, and wherein the first low temperature embossing process is performed at a temperature of 76 to 84° C. and a pressure of 9.5 to 10.5 atm. 2. The method of claim 1 , wherein the natural material has a one-dimensional shape, a two-dimensional shape, or a three-dimensional shape. 3. The method of claim 1 , wherein in the step (c), cooling is performed from a temperature of 76 to 84° C. to room temperature and then the natural material and the first polymer film are separated from each other. 4. The method of claim 1 , further comprising: (e) forming a second polymer film by coating a second polymer resin on the metal mold after the step (d); (f) performing second low temperature embossing process on a metal mold formed with the second polymer film and then duplicating texture and pattern of the metal mold on the second polymer film; and (g) applying a colorant on the second polymer film to which the texture and pattern are duplicated. 5. The method of claim 4 , wherein the second polymer resin includes any one selected from the group consisting of polyvinyl chloride, polyethylene, polypropylene, polyethylene terephthalate, polymethyl methacrylate, polycarbonate, polystyrene, and polyimide. 6. The method of claim 4 , wherein in the step (f), the second low temperature embossing process is performed at a temperature of 76 to 84° C. and a pressure of 9.5 to 10.5 atm.

Assignees

Inventors

Classifications

  • C25D1/10Primary

    Moulds; Masks; Masterforms · CPC title

  • 3D structures, e.g. superposed patterned layers · CPC title

  • of leather · CPC title

  • Designs imitating natural patterns · CPC title

  • B29C59/02Primary

    by mechanical means, e.g. pressing {(B29C59/007 takes precedence; embossing expanded porous articles B29C44/5627)} · CPC title

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What does patent US10500783B2 cover?
A method of duplicating texture and pattern of a natural material using a low temperature embossing process is provided. More particularly, in the method of duplicating texture and pattern of a natural material using a low temperature embossing process, a polymer resin having low glass transition temperature is coated on a surface of the natural material and then low temperature embossing proce…
Who is the assignee on this patent?
Hyundai Motor Co Ltd, Kia Motors Corp, Univ Korea Res & Bus Found
What technology area does this patent fall under?
Primary CPC classification C25D1/10. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 10 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).