Method for producing mold for minute pattern transfer, method for producing diffraction grating using the same, and method for producing organic el element including the diffraction grating

US2016161647A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016161647-A1
Application numberUS-201615041764-A
CountryUS
Kind codeA1
Filing dateFeb 11, 2016
Priority dateJan 14, 2011
Publication dateJun 9, 2016
Grant date

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Abstract

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A method for producing a mold includes: applying a block copolymer solution made of first and second polymers on a base member; performing a first annealing process at a temperature higher than Tg of the block copolymer after drying the coating film; forming a concavity and convexity structure on the base member by removing the second polymer by an etching process; performing a second annealing process of the concavity and convexity structure at a temperature higher than Tg of the first polymer; forming a seed layer on the structure; laminating or stacking a metal layer on the seed layer by an electroforming; and peeling off the metal layer from the base member. The second annealing process enables satisfactory transfer of a concavity and convexity structure on the base member onto the metal layer.

First claim

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What is claimed is: 1 . A mold for minute pattern transfer produced by a producing method, the producing method comprising a step of applying a block copolymer solution made of at least a first polymer and a second polymer on a surface of a base member; a step of drying a coating film on the base member; a first heating step for heating the coating film after the drying at a temperature higher than a glass transition temperature of a block copolymer of the block copolymer solution; an etching step for etching the coating film after the first heating step to remove the second polymer so that a concavity and convexity structure is formed on the base member; a second heating step for heating the concavity and convexity structure at a temperature higher than a glass transition temperature of the first polymer; a step of forming a seed layer on the concavity and convexity structure after the second heating step; a step of or stacking a metal layer on the seed layer by an electroforming; and a step of peeling off the base member having the concavity and convexity structure from the metal layer and the seed layer. 2 . A diffraction grating comprising a concavity and convexity structure on a surface thereof, wherein the diffraction grating is produced by a method comprising: pressing the mold obtained by the method for producing the mold as defined in claim 1 to a transparent substrate to which a curable resin has been applied; curing the curable resin; and detaching the mold from the transparent substrate to obtain a structure having a concavity and convexity structure on the transparent substrate. 3 . The diffraction grating of claim 2 , wherein the diffraction grating is produced by pressing the structure to a substrate to which a sol-gel material has been applied; curing the sol-gel material; and detaching the structure from the substrate to obtain the diffraction grating having a concavity and convexity structure made of the sol-gel material. 4 . The diffraction grating according to claim 2 , wherein a cross-section shape of the concavity and convexity structure has a chevron shape; and in a case that a Fourier-transformed image is obtained by performing a two-dimensional fast Fourier-transform processing on an concavity and convexity analysis image obtained by an analyzing a planar shape of the concavity and convexity structure with an atomic force microscope, the Fourier-transformed image shows an annular pattern substantially centered at an origin at which an absolute value of wavenumber is 0 μm −1 , and the annular pattern is present within a region where the absolute value of wavenumber is within a range of 10 μm −1 or less. 5 . The diffraction grating according to claim 3 , wherein a cross-section shape of the concavity and convexity structure has a chevron shape; and in a case that a Fourier-transformed image is obtained by performing a two-dimensional fast Fourier-transform processing on an concavity and convexity analysis image obtained by an analyzing a planar shape of the concavity and convexity structure with an atomic force microscope, the Fourier-transformed image shows an annular pattern substantially centered at an origin at which an absolute value of wavenumber is 0 μm −1 , and the annular pattern is present within a region where the absolute value of wavenumber is within a range of 10 μm −1 or less. 6 . The diffraction grating according to claim 2 , wherein a kurtosis of the cross-section shape of the concavity and convexity structure is −1.2 or more. 7 . The diffraction grating according to claim 6 , wherein the kurtosis of the cross-section shape of the concavity and convexity structure is −1.2 to 1.2. 8 . The diffraction grating according to claim 2 , wherein an average pitch of a cross-section of the concavity and convexity structure is 10 to 600 nm. 9 . An organic EL element produced by stacking a transparent electrode, an organic layer, a metal electrode in this order on the concavity and convexity structure of the diffraction grating produced by the method for producing the diffraction grating as defined in claim 2 .

Assignees

Inventors

Classifications

  • G02B5/1852Primary

    using mechanical means, e.g. ruling with diamond tool, moulding · CPC title

  • by making impressions of one or more parts of models, e.g. shaped articles and including possible subsequent assembly of the parts · CPC title

  • with pitch less than or comparable to the wavelength · CPC title

  • having a plurality of grooves · CPC title

  • Moulds; Masks; Masterforms · CPC title

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What does patent US2016161647A1 cover?
A method for producing a mold includes: applying a block copolymer solution made of first and second polymers on a base member; performing a first annealing process at a temperature higher than Tg of the block copolymer after drying the coating film; forming a concavity and convexity structure on the base member by removing the second polymer by an etching process; performing a second annealing…
Who is the assignee on this patent?
Jx Nippon Oil & Energy Corp, Tokyo Inst Tech
What technology area does this patent fall under?
Primary CPC classification G02B5/1852. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Jun 09 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).