Cleaning device and roll cleaning member

Patent metadata

Field	Value
Publication number	US-10453708-B2
Application number	US-201515322480-A
Country	US
Kind code	B2
Filing date	Jul 1, 2015
Priority date	Jul 4, 2014
Publication date	Oct 22, 2019
Grant date	Oct 22, 2019

Abstract

The present invention prevents or alleviates cleaning unevenness in cleaning of a substrate with the use of a roll cleaning member having protruding members. The roll cleaning device includes: a substrate support member that supports and rotates a substrate W; and an upper roll cleaning member (52) for scrub cleaning a surface of the substrate W which is rotated by the substrate support member, while rotating. The upper roll cleaning member (52) has a plurality of protruding members provided thereon that are arrayed in the longitudinal direction thereof, and slidably contact the surface of the substrate W. The roll cleaning device cleans the substrate W so that the trajectories of high cleaning force regions out of the parts of the protruding members which slidably contact the substrate W are present without a gap in a radial direction of the substrate W.

First claim

The invention claimed is:

1. A cleaning device comprising:
a substrate support member that supports and rotates a substrate; and
a first roll cleaning member and a second roll cleaning member, each of which is a roll cleaning member for scrub cleaning a surface of the substrate which is rotated by the substrate support member, while rotating, wherein
the roll cleaning member has a plurality of protruding members provided thereon which are arrayed in the longitudinal direction thereof, and slidably contact the surface of the substrate,
cleans the substrate so that the trajectories of high cleaning force regions out of the parts of the protruding members which come in slidable contact with the substrate are present without a gap in a radial direction of the substrate, and
in the first roll cleaning member and the second roll cleaning member, the plurality of protruding members are arranged at even intervals in the longitudinal directions of the roll cleaning members and form a plurality of protruding member rows, and the positions of the plurality of protruding members in the protruding member rows adjacent to each other in the circumferential direction of the roll cleaning member deviate from each other only by a half of the pitch of the protruding members in the protruding member rows, wherein
in the first roll cleaning member and the second roll cleaning member, when the pitches of the protruding members in the protruding member rows are represented by np, the positions of the plurality of protruding members of the first roll cleaning member at the time when cleaning the substrate and the positions of the plurality of protruding members of the second roll cleaning member at the time when cleaning the substrate deviate from each other only by np/4 in the row direction.

2. A cleaning device comprising:
a substrate support member that supports and rotates a substrate; and
a roll cleaning member for scrub cleaning a surface of the substrate which is rotated by the substrate support member, while rotating, wherein
the roll cleaning member has a plurality of protruding members provided thereon which are arrayed in the longitudinal direction thereof, and slidably contact the surface of the substrate, and
cleans the substrate so that the trajectories of high cleaning force regions out of the parts of the protruding members which come in slidable contact with the substrate are present without a gap in a radial direction of the substrate, wherein
the plurality of protruding members include a plurality of protruding members that are aligned at a pitch np in a first row of the longitudinal direction, a plurality of protruding members that are aligned at the pitch np in a second row of the longitudinal direction, a plurality of protruding members that are aligned at the pitch np in a third row of the longitudinal direction, and a plurality of protruding members that are aligned at the pitch np in a fourth row of the longitudinal direction; and
the positions of the plurality of protruding members in the longitudinal direction, which are aligned in the first row, and the positions of the plurality of protruding members in the longitudinal direction, which are aligned in the second row, deviate from each other only by np/4, the positions of the plurality of protruding members in the longitudinal direction, which are aligned in the second row, and the positions of the plurality of protruding members in the longitudinal direction, which are aligned in the third row, deviate from each other only by np/4, and the positions of the plurality of protruding members in the longitudinal direction, which are aligned in the third row, and the positions of the plurality of protruding members in the longitudinal direction, which are aligned in the fourth row, deviate from each other only by np/4.

3. A cleaning device comprising:
a substrate support member that supports and rotates a substrate; and
a roll cleaning member for scrub cleaning a surface of the substrate which is rotated by the substrate support member, while rotating, wherein
the roll cleaning member has a plurality of protruding members provided thereon which are arrayed in the longitudinal direction thereof, and slidably contact the surface of the substrate, and
cleans the substrate so that the trajectories of high cleaning force regions out of the parts of the protruding members which come in slidable contact with the substrate are present without a gap in a radial direction of the substrate, wherein
the roll cleaning member comes in slidable contact with the substrate in a range that passes the rotation center of a rotating substrate and reaches the outer peripheries of the substrate on both sides from the rotation center, and the plurality of protruding members are asymmetrically arranged on both sides with reference to the position corresponding to the rotation center, wherein
as for the plurality of protruding members, distances between the position corresponding to the rotation center and the plurality of protruding members in one side in the longitudinal direction than the position corresponding to the rotation center, and distances between the position corresponding to the rotation center and the plurality of protruding members in the other side in the longitudinal direction than the position corresponding to the rotation center deviate from each other only by np/4.

4. A cleaning device comprising:
a substrate support member that supports and rotates a substrate; and
a roll cleaning member for scrub cleaning a surface of the substrate which is rotated by the substrate support member, while rotating, wherein
the roll cleaning member has a plurality of protruding members provided thereon which are arrayed in the longitudinal direction thereof, and slidably contact the surface of the substrate, and
the plurality of protruding members include a plurality of protruding members that are aligned at a pitch np in a first row of the longitudinal direction, a plurality of protruding members that are aligned at the pitch np in a second row of the longitudinal direction, a plurality of protruding members that are aligned at the pitch np in a third row in the longitudinal direction, and a plurality of protruding members that are aligned at the pitch np in a fourth row of the longitudinal direction, wherein
the positions of the plurality of protruding members in the longitudinal direction, which are aligned in the first row, and the positions of the plurality of protruding members in the longitudinal direction, which are aligned in the second row, deviate from each other only by np/4, the positions of the plurality of protruding members in the longitudinal direction, which are aligned in the second row, and the positions of the plurality of protruding members in the longitudinal direction, which are aligned in the third row, deviate from each other only by np/4, and the positions of the plurality of protruding members in the longitudinal direction, which are aligned in the third row, and the positions of the plurality of protruding members in the longitudinal direction, which are aligned in the fourth row, deviate from each other only by np/4.

5. A cleaning device comprising:
a substrate support member that supports and rotates a substrate; and
a roll cleaning member for scrub cleaning a surface of the substrate which is rotated by the substrate support member, while rotating, wherein
the roll cleaning member has a plurality of protruding members provided thereon which are arrayed in the longitudinal direction thereof, and slidably contact the surface of the substrate, and
the plurality of protruding members are arranged in the longitudinal direction of the roll cleaning member to form a plurality of protruding member rows, and positions of the plurality of protruding me

Assignees

• Ebara Corp

Inventors

• Ishibashi Tomoatsu

Classifications

• H10P70/277

  the processing being a planarisation of conductive layers · CPC title

• H10P70/60 Primary

  Cleaning only by mechanical processes · CPC title

• H10P72/7604

  the wafers being placed on a susceptor, stage or support · CPC title

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/50

  for positioning, orientation or alignment · CPC title