Chuck for supporting a wafer

US10446434B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10446434-B2
Application numberUS-201615134306-A
CountryUS
Kind codeB2
Filing dateApr 20, 2016
Priority dateApr 20, 2016
Publication dateOct 15, 2019
Grant dateOct 15, 2019

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

According to an embodiment, a support module is provided for supporting a substrate. The support module may include a chuck and a vertical stage. The chuck may include multiple chuck segments that are independently movable. When the substrate is positioned on the chuck, different chuck segments are positioned under different areas of the substrate. The vertical stage may include multiple piezoelectric motors. Each piezoelectric motor may be configured to perform nanometric scale elevation and lowering movements. The multiple piezoelectric motors may be configured to independently move the multiple chuck segments.

First claim

Opening claim text (preview).

We claim: 1. A support module for supporting a substrate, wherein the support module comprises a chuck and a vertical stage; wherein the chuck comprises multiple chuck segments that are independently movable under different areas of the substrate and with respect to the substrate; wherein when the substrate is positioned on the chuck, different chuck segments are positioned under different areas of the substrate, each chuck segment configured to elevate a corresponding area of the substrate in relation to other areas of the substrate; wherein the vertical stage comprises multiple first piezoelectric motors; wherein each first piezoelectric motor is configured to perform nanometric scale elevation and lowering movements; and wherein each first piezoelectric motor is independently mechanically coupled to a corresponding chuck segment of the multiple chuck segments and is configured to independently move the corresponding chuck segment; and wherein the vertical stage further comprises a frame mechanically coupled to the multiple first piezoelectric motors; wherein the vertical stage further comprises multiple second piezoelectric motors and a load having multiple load segments; wherein the frame is further mechanically coupled to the multiple second piezoelectric motors; and wherein each second piezoelectric motor is independently mechanically coupled to a corresponding load segment of the multiple load segments and is positioned between the corresponding load segment and a corresponding first piezoelectric motor of the multiple first piezoelectric motors and also between the corresponding load segment and the frame. 2. The support module according to claim 1 wherein the chuck further comprises a plurality of vacuum channels. 3. The support module according to claim 1 wherein the chuck comprises an upper layer that is configured to interface with a bottom surface of the substrate; and wherein the upper layer is integrated with each of the multiple chuck segments. 4. The support module according to claim 1 wherein adjacent chuck segments of the multiple chuck segments are spaced apart from each other. 5. The support module according to claim 1 wherein the multiple chuck segments have a length and width of a Centimetric scale. 6. The support module according to claim 1 wherein at least a majority of the multiple chuck segments have same dimensions. 7. The support module according to claim 1 wherein at least two chuck segments of the multiple chuck segments differ from each other by shape. 8. The support module according to claim 1 further comprising a controller for controlling the multiple first piezoelectric motors. 9. The support module according to claim 1 wherein the multiple second piezoelectric motors are configured to counter movements of the multiple first piezoelectric motors. 10. The support module according to claim 1 wherein each load segment is independently movable by a corresponding second piezoelectric motor of the multiple second piezoelectric motors. 11. The support module according to claim 1 wherein the multiple load segments have sizes and weights that are different from sizes and weights of the multiple chuck segments. 12. The support module according to claim 1 wherein the frame is mechanically coupled to an X-Y stage. 13. The support module according to claim 1 further comprising a controller for controlling the multiple first piezoelectric motors and the multiple second piezoelectric motors. 14. The support module according to claim 1 comprising a controller configured for controlling the multiple first piezoelectric motors to compensate for a tilt error of an area of the substrate by adjusting at least one first piezoelectric motor neighboring a particular piezoelectric motor corresponding to the area of the substrate. 15. The support module according to claim 1 wherein at least part of the frame is positioned between the multiple first piezoelectric motors and the multiple second piezoelectric motors; and wherein the multiple second piezoelectric motors are configured to apply countering forces to the frame to reduce forces applied to the frame by the multiple first piezoelectric motors. 16. The support module according to claim 1 wherein the multiple second piezoelectric motors and the load are positioned within an interior space defined by the frame. 17. The support module according to claim 1 wherein the load has substantially a same shape and weight as a combination of the chuck and the substrate. 18. The support module according to claim 1 wherein each of the different areas of the substrate correspond to 0.01% to 10% of the substrate.

Assignees

Inventors

Classifications

  • Apparatus for mechanical treatment or grinding or cutting · CPC title

  • characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

  • characterised by lifting arrangements, e.g. lift pins · CPC title

  • characterised by edge profile or support profile · CPC title

  • Monitoring of warpages, curvatures, damages, defects or the like · CPC title

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Frequently asked questions

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What does patent US10446434B2 cover?
According to an embodiment, a support module is provided for supporting a substrate. The support module may include a chuck and a vertical stage. The chuck may include multiple chuck segments that are independently movable. When the substrate is positioned on the chuck, different chuck segments are positioned under different areas of the substrate. The vertical stage may include multiple piezoe…
Who is the assignee on this patent?
Applied Materials Israel Ltd
What technology area does this patent fall under?
Primary CPC classification H10P72/7624. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 15 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).