Adhesion layer forming method, adhesion layer forming system and recording medium

US10354915B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10354915-B2
Application numberUS-201615077988-A
CountryUS
Kind codeB2
Filing dateMar 23, 2016
Priority dateMar 26, 2015
Publication dateJul 16, 2019
Grant dateJul 16, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An adhesion layer formed of a thin film can be formed on a surface of a substrate. An adhesion layer forming method of forming the adhesion layer on the substrate includes supplying a coupling agent onto the substrate 2 while rotating the substrate 2 . The substrate 2 is rotated at a low speed equal to or less than 300 rpm and the coupling agent diluted with IPA is supplied onto the substrate 2.

First claim

Opening claim text (preview).

We claim: 1. An adhesion layer forming method of forming an adhesion layer, for forming an electroless plating layer, on a substrate, comprising: preparing the substrate; and supplying an organic solvent having hydrophilicity from a first nozzle of a common nozzle head onto the substrate while rotating the substrate; and then supplying a coupling agent from a second nozzle of the common nozzle head onto the substrate while rotating the substrate and continuously supplying the organic solvent from the first nozzle onto the substrate, wherein, in the supplying of the coupling agent, the coupling agent is being diluted with the organic solvent that is being supplied onto the substrate while maintaining the substrate in a wet state, and the first nozzle and the second nozzle are adjacently provided to the common nozzle head to supply different solutions toward the substrate. 2. The adhesion layer forming method of claim 1 , wherein, in the supplying of the coupling agent, the substrate is rotated at a rotational number equal to or less than 300 rpm. 3. The adhesion layer forming method of claim 1 , wherein the coupling agent is diluted with isopropyl alcohol. 4. The adhesion layer forming method of claim 3 , wherein the coupling agent is diluted with the isopropyl alcohol by 10 times to 1000 times. 5. The adhesion layer forming method of claim 1 , wherein before the supplying of the coupling agent, the substrate is previously maintained in the wet state by the organic solvent having hydrophilicity. 6. The adhesion layer forming method of claim 1 , wherein after the supplying of the coupling agent, a rinse process is performed on the substrate to remove the coupling agent remaining on the substrate. 7. A non-transitory computer-readable recording medium having stored thereon computer-executable instructions that, in response to execution, cause an adhesion layer forming system to perform an adhesion layer forming method, wherein the adhesion layer forming method comprises: preparing a substrate; supplying an organic solvent having hydrophilicity from a first nozzle of a common nozzle head onto the substrate while rotating the substrate; and supplying a coupling agent from a second nozzle of the common nozzle head onto the substrate while rotating the substrate and continuously supplying the organic solvent from the first nozzle onto the substrate, wherein, in the supplying of the coupling agent, the coupling agent is being diluted with the organic solvent having hydrophilicity that is being supplied onto the substrate while maintaining the substrate in a wet state, and the first nozzle and the second nozzle are adjacently provided to the common nozzle head to supply different solutions toward the substrate.

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Classifications

  • comprising use of blind vias during the manufacture · CPC title

  • characterised by the filling method or the material of the conductive fill · CPC title

  • with alloys based on iron, cobalt or nickel · CPC title

  • Coating with copper · CPC title

  • Coating with nickel, cobalt or mixtures thereof with phosphorus or boron (C23C18/50 takes precedence) · CPC title

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What does patent US10354915B2 cover?
An adhesion layer formed of a thin film can be formed on a surface of a substrate. An adhesion layer forming method of forming the adhesion layer on the substrate includes supplying a coupling agent onto the substrate 2 while rotating the substrate 2 . The substrate 2 is rotated at a low speed equal to or less than 300 rpm and the coupling agent diluted with IPA is supplied onto the substr…
Who is the assignee on this patent?
Tokyo Electron Ltd
What technology area does this patent fall under?
Primary CPC classification C23C18/04. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jul 16 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).