Cu alloy core bonding wire with Pd coating for semiconductor device

US10236272B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10236272-B2
Application numberUS-201515107423-A
CountryUS
Kind codeB2
Filing dateSep 18, 2015
Priority dateMay 26, 2015
Publication dateMar 19, 2019
Grant dateMar 19, 2019

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A bonding wire for a semiconductor device includes a Cu alloy core material and a Pd coating layer formed on a surface thereof, and the boding wire contains one or more elements of As, Te, Sn, Sb, Bi and Se in a total amount of 0.1 to 100 ppm by mass. The bonding longevity of a ball bonded part can increase in a high-temperature and high-humidity environment, improving the bonding reliability. When the Cu alloy core material further contains one or more of Ni, Zn, Rh, In, Ir, Pt, Ga and Ge in an amount, for each, of 0.011 to 1.2% by mass, it is able to increase the reliability of a ball bonded part in a high-temperature environment of 170° C. or more. When an alloy skin layer containing Au and Pd is further formed on a surface of the Pd coating layer, wedge bondability improves.

First claim

Opening claim text (preview).

The invention claimed is: 1. A bonding wire for a semiconductor device comprising: a Cu alloy core; and a Pd coating layer formed on a surface of the Cu alloy core, wherein the bonding wire further contains at least one of As and Te, and a concentration of the at least one of As and Te in total is 0.1 ppm by mass or more and 100 ppm by mass or less relative to the entire wire. 2. The bonding wire for a semiconductor device according to claim 1 , wherein the concentration of the at least one or more elements selected from As and Te in total is 1 ppm by mass or more and 100 ppm by mass or less relative to the entire wire. 3. The bonding wire for a semiconductor device according to claim 1 , wherein a thickness of the Pd coating layer is 0.015 μm or more and 0.150 μm or less. 4. The bonding wire for a semiconductor device according to claim 1 , further comprising an alloy skin layer containing Au and Pd on the Pd coating layer. 5. The bonding wire for a semiconductor device according to claim 4 , wherein a thickness of the alloy skin layer containing Au and Pd is 0.0005 μm or more and 0.050 μm or less. 6. The bonding wire for a semiconductor device according to claim 1 , wherein the bonding wire further contains at least one or more elements selected from Ni, Zn, Rh, In, Ir, Pt, Ga and Ge, and a concentration of each of the elements is 0.011% by mass or more and 1.2% by mass or less relative to the entire wire. 7. The bonding wire for a semiconductor device according to claim 1 , wherein the Cu alloy core contains Pd, and a concentration of Pd contained in the Cu alloy core is 0.05% by mass or more and 1.2% by mass or less. 8. The bonding wire for a semiconductor device according to claim 1 , wherein the bonding wire further contains at least one or more elements selected from B, P, Mg, Ca and La, and a concentration of each of the elements is 1 ppm by mass or more and 100 ppm by mass or less relative to the entire wire. 9. The bonding wire for a semiconductor device according to claim 1 , wherein, in a measurement result when measuring crystal orientations on a surface of the bonding wire, a crystal orientation <111> angled at 15 degrees or less to a longitudinal direction of the bonding wire has a proportion of 30% or more and 100% or less. 10. The bonding wire for a semiconductor device according to claim 1 , wherein Cu is present at an outermost surface of the bonding wire.

Assignees

Inventors

Classifications

  • Multilayered bond wires, e.g. having a coating concentric around a core · CPC title

  • not comprising solid metals or solid metalloids, e.g. polymers, ceramics or liquids · CPC title

  • between a chip and a stacked lead frame, conducting package substrate or heat sink · CPC title

  • changes in materials · CPC title

  • changes in structures or sizes · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10236272B2 cover?
A bonding wire for a semiconductor device includes a Cu alloy core material and a Pd coating layer formed on a surface thereof, and the boding wire contains one or more elements of As, Te, Sn, Sb, Bi and Se in a total amount of 0.1 to 100 ppm by mass. The bonding longevity of a ball bonded part can increase in a high-temperature and high-humidity environment, improving the bonding reliability. …
Who is the assignee on this patent?
Nippon Micrometal Corp, Nippon Steel & Sumikin Mat Co
What technology area does this patent fall under?
Primary CPC classification H10W72/50. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 19 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).