Coating compositions for use with an overcoated photoresist

Patent metadata

Field	Value
Publication number	US-10203602-B2
Application number	US-201615283248-A
Country	US
Kind code	B2
Filing date	Sep 30, 2016
Priority date	Sep 30, 2016
Publication date	Feb 12, 2019
Grant date	Feb 12, 2019

Abstract

Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more resins and 2) one or more substituted isocyanurate compounds that are distinct from the 1) one or more resins.

First claim

What is claimed is:

1. A method for forming a photoresist relief image, comprising:
a) applying on a substrate a layer of a coating composition comprising:
1) a resin;
2) distinct from the resin, an isocyanurate compound that comprises a structure of the following Formula (I):

1) wherein R 1 , R 2 and R 3 are each independently hydrogen or a substituent that comprises 1) one or more O, S, N or halogen atoms and 2) 6 or more carbon atoms, with at least one of R 1 , R 2 and R 3 not being hydrogen; and

b) applying a layer of a photoresist composition above the coating composition layer; and
c) imaging the photoresist composition layer to patterned radiation and developing the imaged photoresist composition to provide a photoresist relief image.

2. The method of claim 1 wherein one or more of R 1 , R 2 and R 3 comprises 1) one or more oxygen atoms and 2) 6 or more carbon atoms.

3. The method of claim 1 wherein at least two of R 1 , R 2 and R 3 comprises 1) one or more oxygen atoms and 2) 6 or more carbon atoms.

4. The method of claim 1 wherein the isocyanurate compound has a molecular weight of less than 1000 daltons.

5. The method of claim 1 wherein the isocyanurate compound is non-polymeric.

6. The method of claim 1 wherein the resin comprises isocyanurate moieties.

7. The method of claim 1 wherein the coating composition further comprises a crosslinker component that is distinct from the isocyanurate compound and the resin.

8. The method of claim 1 wherein the coating composition layer is thermally treated to cure the coating composition before applying the photoresist composition layer.

9. A coated substrate comprising:
a substrate having thereon:

a) a coating composition comprising:
1) a resin; and
2) distinct from the resin, an isocyanurate compound an isocyanurate compound that comprises a structure of the following Formula (I):

wherein R 1 , R 2 and R 3 are each independently hydrogen or a substituent that comprises 1) one or more O, S, N or halogen atoms and 2) 6 or more carbon atoms, with at least one of R 1 , R 2 and R 3 not being hydrogen; and

b) a layer of a photoresist composition above the coating composition layer.

10. The substrate of claim 9 wherein two or more of R 1 , R 2 and R 3 comprises 1) one or more oxygen atoms and 2) 6 or more carbon atoms.

11. The substrate of claim 9 wherein the isocyanurate compound has a molecular weight of less than 1000 daltons and in non-polymeric.

12. An antireflective coating composition for use with an overcoating photoresist composition, the antireflective coating composition comprising:
1) a resin; and
2) distinct from the resin, an isocyanurate compound that comprises a structure of the following Formula (I):

wherein R 1 , R 2 and R 3 are each independently hydrogen or a substituent that comprises 1) one or more O, S, N or halogen atoms and 2) 6 or more carbon atoms, with at least one of R 1 , R 2 and R 3 not being hydrogen.

13. The antireflective composition of claim 12 wherein one or more of R 1 , R 2 and R 3 comprises 1) one or more oxygen atoms and 2) 6 or more carbon atoms.

14. The antireflective composition of claim 12 wherein at least two of R 1 , R 2 and R 3 comprises 1) one or more oxygen atoms and 2) 6 or more carbon atoms.

15. The antireflective composition of claim 12 wherein at least one of R 1 , R 2 and R 3 comprises a carbonyl or ketoalkyl.

16. The antireflective composition of claim 12 wherein at least one of R 1 , R 2 and R 3 comprises a moiety —(CH 2 ) m (C═O)O((CH 2 ) 2 O) n CH 3 where m is an integer of 1 to 4 and n is an integer of 1 to 12.

17. The antireflective composition of claim 12 wherein the isocyanurate compound has a molecular weight of less than 1000 daltons.

18. The antireflective composition of claim 12 wherein the isocyanurate compound is non-polymeric.

19. The antireflective composition of claim 12 wherein the resin comprises isocyanurate moieties.

20. The antireflective composition of claim 12 further comprising a crosslinker component that is distinct from the isocyanurate compound and the resin.

Assignees

• Rohm & Haas Elect Materials Korea Ltd

Inventors

• Ryu Eui-Hyun
• Kim Myung-Yeol
• Cho EunHye
• Lee Jung-June
• Sim Jae Hwan

Classifications

• H10P76/2043

  using an anti-reflective coating · CPC title

• C09D179/04

  Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors · CPC title

• C09D5/006

  Anti-reflective coatings · CPC title

• G03F7/162

  Coating on a rotating support, e.g. using a whirler or a spinner · CPC title

• C08G73/06

  Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule · CPC title