Coating compositions for use with an overcoated photoresist

Patent metadata

Field	Value
Publication number	US-9244352-B2
Application number	US-78239710-A
Country	US
Kind code	B2
Filing date	May 18, 2010
Priority date	May 20, 2009
Publication date	Jan 26, 2016
Grant date	Jan 26, 2016

Abstract

Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.

First claim

What is claimed is:

1. A coating composition for use with an overcoated photoresist, the coating composition comprising a resin comprising cyanurate groups and hydrophobic groups,
wherein the resin has halogen substitution.

2. The coating composition of claim 1 wherein the hydrophobic groups are selected from hydroxy and ether.

3. The coating composition of claim 1 wherein the resin is prepared from reagents comprising a cyanurate compound comprising substitution of multiple cyanurate nitrogen ring atoms by distinct carboxy and/or carboxy ester groups.

4. The coating composition of claim 3 wherein the cyanurate compound corresponds to the following Formula I:

wherein at least two of the radicals R 1 OOC(CX 2 ) n —, R 2 — and R 3 OOC(CX 2 ) n — are different acid or ester groups; and
R 1 , R 2 and R 3 and each X are each independently hydrogen or non-hydrogen substituents; and
n and m are the same or different and each a whole number.

5. A coating composition of claim 1 wherein the resin comprises a covalently linked crosslinker group.

6. A coating composition of claim 1 wherein the resin comprises polyester linkages.

7. A coated substrate comprising:
a layer of an antireflective composition of claim 1 ;
a photoresist layer over the coating composition layer.

8. A method of forming a photoresist relief image, comprising:
applying an antireflective coating composition on a substrate, the antireflective coating composition comprising a resin comprising cyanurate groups and hydrophobic groups, wherein the resin has halogen substitution;
applying a photoresist composition above the coating composition layer; and
exposing and developing the photoresist layer to provide a resist relief image.

9. The method of claim 8 wherein the antireflective composition is crosslinked prior to applying the photoresist composition.

10. The coating composition of claim 3 wherein the cyanurate compound corresponds to the following Formula IA:

wherein at least two of the radicals R 1 OOC(CH 2 ) n —, R 2 — and R 3 OOC(CH 2 ) m — are different acid or ester groups;
R 1 , R 2 and R 3 are each independently hydrogen or non-hydrogen substituent; and
n and m are the same or different and each a positive integer.

11. The coating composition of claim 10 wherein in Formula IA:
R 1 , R 2 and R 3 are each optionally substituted C 1-10 alkyl, optionally substituted alkenyl or alkynyl having 2 to 10 carbon atoms, optionally substituted alkanoyl having 1 to 10 carbon atoms;
optionally substituted alkoxy having 1 to 10 carbon atoms; optionally substituted alkylthio having 1 to 10 carbon atoms; optionally substituted alkylsulfinyl 1 to 10 carbon atoms; optionally substituted alkylsulfonyl having 1 to 10 carbon atoms; optionally substituted carboxy have 1 to 10 carbon atoms; optionally substituted alkaryl, optionally substituted carbocyclic aryl; or optionally substituted heteralicyclic or heteroaromatic group; and n and m are each a positive integer.

12. The coating composition of claim 1 wherein the resin has fluorine substitution.

13. The method of claim 8 wherein the resin has fluorine substitution.

14. The method of claim 8 wherein the resin is prepared from reagents comprising a compound corresponding to the following Formula I:

wherein at least two of the radicals R 1 OOC(CX 2 ) n —, R 2 — and R 3 OOC(CX 2 ) n — are different acid or ester groups; and
R 1 , R 2 and R 3 and each X are each independently hydrogen or non-hydrogen substituents; and
n and m are the same or different and each a whole number.

15. The method of claim 8 wherein the resin is prepared from reagents comprising a compound corresponding to the following Formula IA:

wherein at least two of the radicals R 1 OOC(CH 2 ) n —, R 2 — and R 3 OOC(CH 2 ) m — are different acid or ester groups;
R 1 , R 2 and R 3 are each independently hydrogen or non-hydrogen substituent; and
n and m are the same or different and each a positive integer.

16. The method of claim 15 wherein in Formula IA:
R 1 , R 2 and R 3 are each optionally substituted C 1-10 alkyl, optionally substituted alkenyl or alkynyl having 2 to 10 carbon atoms, optionally substituted alkanoyl having 1 to 10 carbon atoms; optionally substituted alkoxy having 1 to 10 carbon atoms; optionally substituted alkylthio having 1 to 10 carbon atoms; optionally substituted alkylsulfinyl 1 to 10 carbon atoms; optionally substituted alkylsulfonyl having 1 to 10 carbon atoms; optionally substituted carboxy have 1 to 10 carbon atoms; optionally substituted alkaryl, optionally substituted carbocyclic aryl; or optionally substituted heteralicyclic or heteroaromatic group; and n and m are each a positive integer.

17. The method of claim 8 wherein the resin comprises polyester linkages.

Assignees

• Zampini Anthony
• Wayton Gerald B
• Jain Vipul
• Liu Cong
• Coley Suzanne
• Ongayi Owendi
• Rohm & Haas Elect Mat

Inventors

• Zampini Anthony
• Wayton Gerald B
• Jain Vipul
• Liu Cong
• Coley Suzanne
• Ongayi Owendi

Classifications

• H10P76/20

  of masks comprising organic materials · CPC title

• C09D167/02 Primary

  Polyesters derived from dicarboxylic acids and dihydroxy compounds (C09D167/06 takes precedence) · CPC title

• H01L21/0271

  Electricity · mapped topic

• G03F7/11 Primary

  having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)} · CPC title

• G03F7/091 Primary

  characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement · CPC title