Bottom layer film-formation composition of self-organizing film containing polycyclic organic vinyl compound
US-2015322219-A1 · Nov 12, 2015 · US
US2016187778A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016187778-A1 |
| Application number | US-201514980222-A |
| Country | US |
| Kind code | A1 |
| Filing date | Dec 28, 2015 |
| Priority date | Dec 30, 2014 |
| Publication date | Jun 30, 2016 |
| Grant date | — |
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Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a surface agent of the Formula (I). where A and B are each independently hydrogen, optionally substituted alkyl or optionally substituted aryl; X and Y are each independently hydrogen, optionally substituted alkyl or optionally substituted carbocyclic aryl; and n is a positive integer. Preferred coating compositions can provide improved pattern collapse margin of an overcoated photoresist layer.
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What is claimed is: 1 . A method for forming a photoresist relief image, comprising: a) applying on a substrate a layer of a coating composition comprising 1) a matrix polymer; and 2) a surface energy control agent; b) applying a layer of a photoresist composition above the coating composition layer, wherein the surface energy control agent comprises a structure corresponding to the following Formula (I): wherein A and B are each independently hydrogen, optionally substituted alkyl or optionally substituted aryl; X and Y are each independently hydrogen, optionally substituted alkyl or optionally substituted carbocyclic aryl; and n is a positive integer. 2 . The method of claim 1 wherein the photoresist composition is imaged with activating radiation and the imaged photoresist composition layer is developed to provide a photoresist relief image. 3 . The method of claim 2 wherein a developer is applied to the imaged photoresist composition layer and unexposed portions of the photoresist layer are removed by the developer. 4 . The method of claim 1 wherein the surface control agent has a number average molecular weight of 300 to 5,000. 5 . The method of claim 1 wherein the coating composition comprises the surface agent in an amount of 1 weight percent to 10 weight percent based on total solid content of the coating composition. 6 . The method of claim 1 wherein the coating composition layer is thermally treated before applying the photoresist composition layer. 7 . A coated substrate comprising: a substrate having thereon: 1) a coating composition comprising a) a matrix polymer; and b) a surface energy control agent; and 2) a layer of a photoresist composition above the coating composition layer, wherein the surface energy control agent comprises a structure corresponding to the following Formula (I): wherein A and B are each independently hydrogen, optionally substituted alkyl or optionally substituted aryl; X and Y are each independently hydrogen, optionally substituted alkyl or optionally substituted carbocyclic aryl; and n is a positive integer. 8 . A coating composition for use with an overcoated photoresist composition layer, the coating composition comprising: 1) a matrix polymer; 2) a surface energy control agent which is distinct from the matrix polymer and comprising a structure corresponding to the following Formula (I): wherein A and B are each independently hydrogen, optionally substituted alkyl or optionally substituted aryl; X and Y are each independently hydrogen, optionally substituted alkyl or optionally substituted carbocyclic aryl; and n is a positive integer. 9 . The coating composition of claim 8 further comprising a crosslinking agent. 10 . The coating composition of claim 8 wherein the coating composition is formulated with a solvent carrier.
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