Photoresist underlayer composition
US-12572076-B2 · Mar 10, 2026 · US
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Sim Jae-Hwan patents
Sim Jae-Hwan is listed as an inventor on 9 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Sim Jae-Hwan |
| Total patents | 9 |
| First publication | Nov 30, 2017 |
| Latest publication | Mar 10, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Photoresist underlayer composition
US-2024201591-A1 · Jun 20, 2024 · US
Underlying coating compositions for use with photoresists
US-11500291-B2 · Nov 15, 2022 · US
Method for forming pattern using antireflective coating composition including photoacid generator
US-11269252-B2 · Mar 8, 2022 · US
Pattern formation methods
US-2021200081-A1 · Jul 1, 2021 · US
Method for forming pattern using antireflective coating composition including photoacid generator
US-2021026242-A1 · Jan 28, 2021 · US
Method and device for acquiring state data indicating state of user
US-10878325-B2 · Dec 29, 2020 · US
Underlying coating compositions for use with photoresists
US-2019129305-A1 · May 2, 2019 · US
Method and device for acquiring state data indicating state of user
US-2017344891-A1 · Nov 30, 2017 · US
Recent patents
Latest publications not already listed above.
No data yet.
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Rohm & Haas Elect Materials Korea Ltd | 7 |
| Rohm & Haas Elect Mat | 3 |
| Samsung Electronics Co Ltd | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/094 | 5 |
| G03F7/004 | 5 |
| G03F7/091 | 4 |
| C08G73/0655 | 4 |
| C09D179/04 | 4 |