Wavelength selective heat radiation material selectively radiating heat radiation light corresponding to infrared ray transmission wavelength region of resin member and method for manufacturing the same

Patent metadata

Field	Value
Publication number	US-9520335-B2
Application number	US-201515029441-A
Country	US
Kind code	B2
Filing date	Apr 2, 2015
Priority date	Jun 13, 2014
Publication date	Dec 13, 2016
Grant date	Dec 13, 2016

Abstract

An object is to provide a method for manufacturing a wavelength selective heat radiation material in which a surface roughness of an upper portion of a cavity wall defining each microcavity is suppressed or in which microcavities each having an aspect ratio larger than 3.0 are formed. For the wavelength selective heat radiation material, a base material having a mask having predetermined openings tightly adhered to a surface thereof, or a base material in which depressions are previously formed on one surface thereof by pressing a die having projections arrayed so as to correspond to positions of microcavities thereagainst, is subjected to anisotropic etching, thereby providing a wavelength selective heat radiation material in which the surface roughness of the upper portion of the cavity wall defining each of the microcavities is suppressed or a wavelength selective heat radiation material having microcavities whose each aspect ratio is larger than 3.0.

First claim

The invention claimed is:

1. A wavelength selective heat radiation material for selectively radiating heat radiation light corresponding to an infrared ray transmission wavelength region of a resin member, said wavelength selective heat radiation material comprising:
a base material having a heat radiation surface, said heat radiation surface having a multitude of microcavities formed therein, the microcavities having rectangular openings being periodically repeated and being two-dimensionally arrayed in a grating-like manner, and
the microcavities each having an opening ratio a/Λ, wherein a is opening size in μm and Λ is opening period, in a range of 0.5 to 0.9, each having an aspect ratio d/a, wherein d is opening depth in μm and a is opening size in μm, of 3.3 or more, and each having 1 μm or less of a surface roughness Rz of an upper portion of a cavity wall defining each of the microcavities,
wherein said wavelength selective heat radiation material selectively radiates heat radiation light corresponding to an infrared ray transmission wavelength region of a resin member.

2. The wavelength selective heat radiation material according to claim 1 , wherein said openings are each arrayed at the substantially same period as a period of a wavelength in the infrared ray transmission wavelength region of the resin member or at a period that is shorter by 1 μm than the period of the wavelength in the infrared ray transmission wavelength region of the resin member.

3. The wavelength selective heat radiation material according to claim 1 , wherein said the openings are each arrayed at a period of 4 to 7 μm.

4. The wavelength selective heat radiation material according to claim 1 , wherein said base material comprises a metal material whose emissivity in an infrared region of a wavelength of 1 to 10 μm is 0.4 or less.

5. The wavelength selective heat radiation material according to claim 1 , wherein said base material comprises aluminum or an aluminum alloy whose area occupancy ratio of a (100) crystal plane is 93% or more.

6. The wavelength selective heat radiation material according to claim 1 , wherein the heat radiation light selectively radiated by said material is infrared light.

7. An assembly comprising, a resin member, a heat generation source, and said wavelength selective heat radiation material according to claim 1 , wherein said resin member covers said heat generation source, and said wavelength selective heat radiation material is positioned between said heat generation source and said resin member.

8. The wavelength selective heat radiation material according to claim 1 , wherein said base material comprises a metal foil.

9. A method for manufacturing the wavelength selective heat radiation material according to claim 8 , said method comprising:
(a) placing a mask having predetermined openings on one surface of the metal foil and causing the mask to tightly adhere to the one surface;
(b) etching the metal foil at the openings of the mask and forming said microcavities in the metal foil; and
(c) exfoliating the mask from the metal foil.

10. The method according to claim 9 , wherein the mask comprises a flexible polymer.

11. The method according to claim 9 , wherein a load is exerted on a surface of the mask by pressing a stamp having a semi-cylindrical-shaped pressing surface against the surface of the mask.

12. The method according to claim 11 , wherein the pressing surface of the stamp has a curvature of 0.01 to 0.2.

13. The method according to claim 11 , wherein the load exerted on the mask is 10 4 to 10 6 Pa.

14. The method according to claim 9 , further comprising forming a thin film of copper on an upper surface of the mask by evaporation or sputtering, prior to the etching.

15. A method for manufacturing the wavelength selective heat radiation material according to claim 8 , said method comprising:
(a) forming depressions in one surface of the metal foil by pressing a die having projections against the one surface, the projections being arrayed so as to correspond to positions of said microcavities; and
(b) etching the metal foil to form the microcavities in the metal foil.

16. The method according to claim 9 , further comprising subjecting the metal foil to a chemical polishing process or an electrolytic polishing process, prior to causing the mask having the predetermined openings to tightly adhere to the one surface of the metal foil or prior to forming the depressions in the one surface of the metal foil.

17. The method according to claim 16 , wherein the metal foil is subjected to electrolytic polishing process which is conducted by using a mixed solution of perchloric acid and ethanol.

18. The method according to claim 9 , wherein the etching is electrolytic etching.

19. The method according to claim 18 , wherein the electrolytic etching is conducted using an electrolytic bath whose bath composition is a 5M to 7M hydrochloric acid aqueous solution and whose bath temperature is 25° C. to 45° C.; and
wherein the current density upon starting electrolysis is 1500 mA/cm 2 ; and, after decreasing the current density at a current density decrease rate of 150 mA/cm 2 /s to 200 mA/cm 2 , the current density of 200 mA/cm 2 is retained for 5 to 40 seconds.

20. The method according to claim 19 , wherein said bath temperature is 30° C. to 40° C., and the current density of 200 mA/cm 2 is retained for 5 to 15 seconds.

Assignees

• Univ Tokyo Metropolitan
• Okitsumo Inc

Inventors

• Masuda Hideki
• Kondo Toshiaki
• Toyonaga Takashi
• Kimura Naoshi
• Yoshioka Fumitaka

Classifications

• H10W40/25

  characterised by their materials · CPC title

• H10W40/10

  Arrangements for heating · CPC title

• H10W40/22 Primary

  characterised by their shape, e.g. having conical or cylindrical projections · CPC title

• C23C14/205

  by cathodic sputtering · CPC title

• C23C14/34

  Sputtering · CPC title