One-piece, hollow micromechanical part with several functional levels formed of a synthetic carbon allotrope based material

Patent metadata

Field	Value
Publication number	US-10106400-B2
Application number	US-201415030710-A
Country	US
Kind code	B2
Filing date	Oct 6, 2014
Priority date	Nov 8, 2013
Publication date	Oct 23, 2018
Grant date	Oct 23, 2018

Abstract

A method for fabrication of a micromechanical part made of a one-piece synthetic carbon allotrope based material, the method including: forming a substrate with a negative cavity of the micromechanical part to be fabricated; coating the negative cavity of the substrate with a layer of the synthetic carbon allotrope based material in a smaller thickness than the depth of the negative cavity; and removing the substrate to release the one-piece micromechanical part formed in the negative cavity.

First claim

The invention claimed is:

1. A method for fabrication of a one-piece micromechanical part made of a synthetic carbon allotrope based material, the method comprising:
a) forming a substrate, the substrate including, on at least three levels, a negative cavity for the one-piece micromechanical part to be fabricated;
b) coating the negative cavity of the substrate with a layer of the synthetic carbon allotrope based material in a smaller thickness than a depth of each of the at least three levels of the negative cavity; and
c) removing the substrate to release the one-piece micromechanical part formed in the negative cavity,
wherein a) comprises:
i) forming a first wafer including at least a first pattern etched through;
ii) forming a second wafer including at least a second pattern etched through;
iii) forming a third wafer with no through pattern; and
iv) bonding the first, second, and third wafers to form the substrate including the negative cavity on the at least three levels.

2. The method according to claim 1 , wherein, the second wafer is formed by including the second pattern etched through and a third etched non-through pattern communicating with the second pattern.

3. The method according to claim 1 , wherein, the third wafer is formed by including an etched non-through pattern.

4. The method according to claim 1 , wherein b) comprises:
b1) forming a sacrificial layer on one portion of the substrate;
b2) depositing particles on the substrate intended to form nucleation sites;
b3) removing the sacrificial layer to selectively leave one portion of the substrate free of any particles; and
b4) chemical vapor phase depositing the layer of the synthetic carbon allotrope based material so that the layer is deposited only where particles remain.

5. The method according to claim 1 , wherein b) comprises:
b5) forming a sacrificial layer on one portion of the substrate;
b6) chemical vapor phase depositing the layer of the synthetic carbon allotrope based material on the substrate; and
b7) removing the sacrificial layer to selectively leave one portion of the substrate free of any layer.

6. The method according to claim 1 , wherein at least one of the at least three levels of the negative cavity includes a wall forming a toothing.

7. The method according to claim 1 , wherein the synthetic carbon allotrope based material is in crystallized form.

8. The method according to claim 1 , wherein the synthetic carbon allotrope based material is in amorphous form.

9. The method according to claim 1 , wherein after b), the method further comprises:
d) removing from the substrate a greater thickness than that of the layer deposited in b), to leave the layer deposited in b) only in the negative cavity.

10. The method according to claim 1 , wherein prior to c), the method further comprises:
e) filling the negative cavity, coated with the synthetic carbon allotrope based material, with a second material so that, after c), obtaining the one-piece micromechanical part formed of the synthetic carbon allotrope based material strengthened by and/or decorated with the second material.

11. The method according to claim 10 , wherein, in e), the second material is formed projecting from the negative cavity to form an additional functional level of the one-piece micromechanical part.

12. The method according to claim 10 , wherein the second material includes a metal or metal alloy.

Assignees

• Nivarox Sa

Inventors

• Dubois Philippe
• Merzaghi Sebastiano
• Charbon Christian

Classifications

• B81C99/00 Primary

  Subject matter not provided for in other groups of this subclass · CPC title

• G04B19/12

  Selection of materials for dials or graduations {markings} · CPC title

• G04B13/02

  Wheels; Pinions; Spindles; Pivots (bearings G04B31/00 {; chain wheels, spindles for chain wheels, also chains and driving weights G04B1/08}) · CPC title

• G04B29/027

  Materials and manufacturing (alloys, in general C22C) · CPC title

• G04B17/063

  Balance construction (balances with frequency adjustment screw G04B18/006; balances with temperature compensation G04B17/222; balancing devices G04B17/28) · CPC title