Methods and systems for semiconductor metrology based on polychromatic soft X-Ray diffraction
US-11333621-B2 · May 17, 2022 · US
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Wack Daniel patents
Wack Daniel is listed as an inventor on 9 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Wack Daniel |
| Total patents | 9 |
| First publication | Oct 6, 2015 |
| Latest publication | May 17, 2022 |
Notable patents
Publications ranked by popularity score, then publication date.
Spectral reflectometry for in-situ process monitoring and control
US-10438825-B2 · Oct 8, 2019 · US
Methods And Systems For Semiconductor Metrology Based On Polychromatic Soft X-Ray Diffraction
US-2019017946-A1 · Jan 17, 2019 · US
Spectral Reflectometry For In-Situ Process Monitoring And Control
US-2018061691-A1 · Mar 1, 2018 · US
Particle and chemical control using tunnel flow
US-9759912-B2 · Sep 12, 2017 · US
Source multiplexing illumination for mask inspection
US-9625810-B2 · Apr 18, 2017 · US
Laser-produced plasma EUV source with reduced debris generation utilizing predetermined non-thermal laser ablation
US-9335637-B2 · May 10, 2016 · US
Temperature control in EUV reticle inspection tool
US-9164388-B2 · Oct 20, 2015 · US
Phase grating for mask inspection system
US-9151881-B2 · Oct 6, 2015 · US
Recent patents
Latest publications not already listed above.
No data yet.
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Kla Tencor Corp | 9 |
| Wack Daniel | 3 |
| Delgado Gildardo | 1 |
| Sandia Corp | 1 |
| Wang Daimian | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P74/203 | 4 |
| H01L22/12 | 3 |
| G03F1/84 | 3 |
| H10P72/0616 | 2 |
| H10P72/0606 | 2 |